Patent classifications
G01B9/02019
Heterodyne Laser Interferometer Based on Integrated Secondary Beam Splitting Component
Disclosed is a heterodyne laser interferometer based on an integrated secondary beam splitting component, which belongs to the technical field of laser application; the disclosure inputs two beams that are spatially separated and have different frequencies to the heterodyne laser interferometer based on the integrated secondary beam splitting component, wherein the integrated secondary beam splitting component includes two beam splitting surfaces that are spatially perpendicular to each other; and the two beam splitting surfaces are plated with a polarizing beam splitting film or a non-polarizing beam splitting film, and a measurement beam and a reference beam are the same in travel path length in the integrated secondary beam splitting component. The heterodyne laser interferometer of the disclosure significantly reduces periodic nonlinear errors, has the advantages of simple structure, good thermal stability, large tolerance angle and easy integration and assembly compared with other existing heterodyne laser interferometers with spatially separated optical paths, and meets the high-precision and high-resolution requirements of high-end equipment on heterodyne laser interferometry.
Method and instrument for measuring etch depth by differential polarimetric interferometry and glow discharge spectrometry apparatus comprising such a measuring instrument
Disclosed is a method for measuring etch depth including the following steps: splitting a light beam into a first, and respectively second, incident beam directed towards a first, respectively second, area of a sample exposed to an etching treatment to form a first, and respectively second, reflected beam, recombining the first reflected beam and the second reflected beam to form an interferometric beam; detecting a first, and respectively second, interferometric intensity signal relative to a first, respectively second, polarisation component; calculating a lower envelope function and an upper envelope function of a differential polarimetric interferometry signal; determining an offset function and a normalisation function from the first lower envelope function and the first upper envelope function; and calculating a differential polarimetric interferometry function normalised locally at each time instant.
OPTICAL ANGLE SENSOR
The optical angle sensor comprises a diffraction unit, a light source, a light receiving unit, and a plurality of reflection units. The diffraction unit includes a first diffraction part for generating combined light and a second diffraction part for diffracting a first light and a second light a plurality of times. The plurality of reflection units includes a first reflection unit, a second reflection unit, a third reflection unit that reflects the first light and the second light through the second diffraction part toward the second diffraction part, fourth reflection unit, and fifth reflection unit. The calculating unit, with the rotation of the diffraction unit, calculates the amount of change in the angle based on the change in the interference signal caused by the combined light generated on the light receiving surface.
Wear amount measuring apparatus and method, temperature measuring apparatus and method and substrate processing system
A wear amount measuring apparatus includes a light source, a light transmission unit, a first and a second irradiation unit, a spectroscope and an analysis unit. The light transmission unit splits a low-coherence light from the light source into a first and a second low-coherence light. The first and the second irradiation units irradiate the first and the second low-coherence light to the component to receive reflected lights from the component. The light transmission unit transmits the reflected lights received by the first irradiation unit and the second irradiation unit to the spectroscope. The spectroscope configured to detect intensity distribution of the reflected lights from the first and the second irradiation unit. The analysis unit calculates a thickness difference between a thickness of the component at the first measuring point and that at the second measuring point by performing Fourier transform on the intensity distribution.
Micro-refractive element stabilized resonators, lasers and multiple beam lasing
A resonator is provided that includes opposing mirrors arranged substantially parallel to each other and separated to confine reflections for gain. A gain medium is between the opposing mirrors. A pump pumps the gain medium. At least one microrefractive element, or tens, hundreds, thousands, millions or more, stabilizes the resonator. The refractive element is disposed between the opposing mirrors and is configured to support a laser beam at a position of the refractive element. A method for producing laser light directs pump light onto one or a plurality of microrefractive elements. Reflections from the one or a plurality of microrefractive elements are confined in a resonator volume. Gain is provided in the resonator volume. Laser energy is emitted from the resonator volume.
SPACE DIVISION MULTIPLEXING OPTICAL COHERENCE TOMOGRAPHY USING AN INTEGRATED PHOTONIC DEVICE
Integrated photonic chips and related systems and methods suitable for space-division multiplexing optical coherence tomography scanning are disclosed. In one embodiment, the photonic chip comprises a substrate, an optical input port which receives an incident sampling beam from an external light source, a plurality of optical output ports configured to transmit a plurality of sampling beams from the chip to a sample to capture scanned images of the sample, and a plurality of interconnected and branched waveguide channels formed in the substrate. Waveguide channels in a splitter region divide the sampling beam into the plurality of sampling beams at the output ports. Terminal portions of the waveguide channels in a time delay region associated with each output port have different predetermined lengths to create an optical time delay between the sampling beams. In some embodiments, the chip further comprises an interferometer region to create interference patterns.
Laser interferometer system for measuring six degrees of freedom with respect to a linear axis
A laser interferometer system includes a beam splitter to split a laser beam into first and second beam sets, a first retroreflector mounted to an object to reflect the first beam set, a first detecting device for detecting movements of the object in x-, y- and z-axis directions based on the reflected first beam set, a second retroreflector mounted to the object to reflect the second beam set, and a second detecting device for detecting rotations and movements of the object with respect to the y- and z-axis directions based on the reflected second beam set. The movements of the object in the z-axis direction obtained by the first and second detecting devices are used to obtain a rotation of the object with respect to the x-axis direction.
OCT System
The invention relates to an OCT system comprising an OCT light source, an OCT evaluation unit, a first OCT light guide, a second OCT light guide and a changeover module. The light from the OCT light source passes through the changeover module. In a first state of the changeover module, the OCT light is passed to an entry end of the first OCT light guide. In a second state of the changeover module, the OCT light is passed to an entry end of the second OCT light guide. A scanning device assigned to the first OCT light guide is arranged between the changeover module and the object plane. The OCT system according to the invention can be used in a flexible manner.
METHOD AND INSTRUMENT FOR MEASURING ETCH DEPTH BY DIFFERENTIAL POLARIMETRIC INTERFEROMETRY AND GLOW DISCHARGE SPECTROMETRY APPARATUS COMPRISING SUCH A MEASURING INSTRUMENT
Disclosed is a method for measuring etch depth including the following steps: splitting a light beam into a first, and respectively second, incident beam directed towards a first, respectively second, area of a sample exposed to an etching treatment to form a first, and respectively second, reflected beam, recombining the first reflected beam and the second reflected beam to form an interferometric beam; detecting a first, and respectively second, interferometric intensity signal relative to a first, respectively second, polarisation component; calculating a lower envelope function and an upper envelope function of a differential polarimetric interferometry signal; determining an offset function and a normalisation function from the first lower envelope function and the first upper envelope function; and calculating a differential polarimetric interferometry function normalised locally at each time instant.
OPTICAL COHERENCE TOMOGRAPHY WITH DISPERSED STRUCTURED ILLUMINATION
Apparatus and methods are presented for enhancing the acquisition speed or performance of Fourier domain optical coherence tomography. In preferred embodiments a plurality of wavelength combs containing interleaved selections of wavelengths from a multi-wavelength optical source are generated and projected onto a sample. In certain embodiments the wavelength combs are projected simultaneously onto a plurality of regions of the sample, while in other embodiments the wavelength combs are projected sequentially onto the sample. Light in the wavelength combs reflected or scattered from the sample is detected in a single frame of a sensor array, and the detected light processed to obtain a tomographic profile of the sample. In preferred embodiments the wavelength comb generator comprises a wavelength interleaver in the form of a retro-reflective prism array for imparting different displacements to different selections of wavelengths from the optical source.