The invention relates to a method for determining the distance to a movable target object and/or the position of said movable target object and comprises the steps of directing a coherent, focused measurement beam at the spherical target object, which has a convex reflective surface, in such a way that the center of the target object lies at the focus of the measurement beam, and determining a distance between the target object and a reference point by interferometrically superposing the measurement beam reflected by the target object with a reference beam.

A compensation optical unit (30) for a measurement system (10) for determining a shape of an optical surface (12) of a test object (14) by interferometry generates a measuring wave (44), directed at the test object, with a wavefront that is at least partly adapted to a target shape of the optical surface from an input wave (18). The unit includes first (32) and second (34) optical elements disposed in a beam path of the input wave. The second optical element is a diffractive optical element configured to split the input wave into the measuring wave and a reference wave (42) following an interaction with the first optical element. At least 20% of a refractive power of the entire compensation optical unit is allotted to the first optical element, and this allotted refractive power has the same sign as the refractive power of the entire compensation optical unit.

A method and apparatus for characterizing the surface form of an optical element, in particular a mirror or a lens element of a microlithographic projection exposure apparatus, includes: carrying out a plurality of interferometric measurements, in each of which an interferogram is recorded between a test wave emanating from a portion of the optical element in each case and a reference wave, the position of the optical element relative to the test wave being altered between these measurements, and calculating the figure of the optical element on the basis of these measurements. This calculation is carried out iteratively in such that, in a plurality of iteration steps, the figure of the optical element is ascertained in each case by carrying out a forward calculation, each of these iteration steps being based in each case on a reference wave that was adapted based on the preceding iteration step.

An image acquisition apparatus includes a light source configured to emit light, a dividing unit configured to divide the light from the light source into reference light and measurement light, an image forming unit configured to form a tomographic image of a subject based on interfered light in which return light from the subject irradiated with the measurement light and the reference light are interfered, a focus adjusting unit configured to adjust a focus of the measurement light, an optical-path-length adjusting unit configured to adjust an optical path length of the reference light, and a control unit configured to adjust the optical path length of the reference light by controlling the optical-path-length adjusting unit according a change in an optical path length of the measurement light caused by adjustment of the focus using the focus adjusting unit.

An interferometer for areally measuring an optically smooth surface is presented, including means for illuminating a surface region with a plurality of discrete object waves from different directions and comprising means which, on a detector, superimpose object waves reflected at the surface onto a reference wave that is coherent with a plurality of object waves in order to form an interferogram. The interferometer is distinguished by virtue of it being configured to illuminate the surface with a plurality of object waves at the same time and produce the reference wave by way of a Fizeau beam splitter plate or a Fizeau objective, and by virtue of the interferometer including an interferometer stop that is arranged in the beam path upstream of the detector, and imaging optics, wherein the interferometer stop is situated within, or slightly outside of, the Fourier plane of the imaging optics and said interferometer stop filters the object waves reflected by the surface.

A measurement method for interferometrically measuring the shape of a surface (112) of a test object (114). A test wave (125-1, 125-2) directed at the test object has a wavefront that is at least partially adapted to the desired shape of the surface, and a reference wave (128-1, 128-2) directed at a reflective optical element (130-1, 130 2) has a propagation direction that deviates from the propagation direction of the test wave (125-1, 125-2) for each of two input waves by diffraction at a diffractive element (124). For each wavelength, the test wave is superimposed after interaction with the test object with the associated reference wave after the back-reflection at the first reflective optical element. The test and reference waves are diffracted again at the diffractive element for superposition. An interferogram produced by the superposition is captured in a capture plane (148-1, 148-2). The interferograms are jointly evaluated.

A measurement apparatus (10) for determining a shape of an optical surface. An illumination module (16) produces an illumination wave (34), an interferometer (18) splits the wave into a test wave (50), which is directed onto the optical surface, and a reference wave (52). The relative tilt between the waves produces a multi-fringe interference pattern (66) in a detection plane (62) of the interferometer when the waves are superposed. A pupil plane (28) of the illumination module is arranged in a Fourier plane of the detection plane and the illumination module is configured to produce the illumination wave so that the intensity distribution thereof in the pupil plane includes at least one spatially isolated and contiguous surface region (38) such that a rectangle (74) with the smallest possible area fitted to the surface region or the totality of surface regions has an aspect ratio of at least 1.5:1.

Methods for characterizing the surface shapes of optical elements include the following steps: carrying out, in an interferometric test arrangement, at least a first interferogram measurement on the optical element by superimposing a test wave, which has been generated by diffraction of electromagnetic radiation on a diffractive element and has been reflected at the optical element, carrying out at least one additional interferogram measurement on in each case one calibrating mirror for determining calibration corrections, and determining the deviation from the target shape of the optical element based on the first interferogram measurement carried out on the optical element and the determined calibration corrections. At least two interferogram measurements are carried out for the at least one calibrating mirror, which differ from one another with regard to the polarization state of the electromagnetic radiation.

A measurement apparatus (10) for interferometrically determining a surface shape of a test object (14). A radiation source provides an input wave (42), a multiply-encoded diffractive optical element (60), which is configured to produce by diffraction from the input wave a test wave (66) that is directed at the test object and has a wavefront in the form of a free-form surface and at least one calibration wave (70), and a capture device (46). The calibration wave has a wavefront with a non-rotationally symmetric shape (68f), wherein cross sections through the wavefront of the calibration wave along cross-sectional surfaces each aligned transversely to one another have a curved shape. The curved shapes in the different cross-sectional surfaces differ in terms of an opening parameter. The capture device (46) captures a calibration interferogram formed by superimposing a reference wave (40) with the calibration wave after interaction with a calibration object (74).

A method for adjusting a measuring device having an interferometer unit with an optical axis, an optical distance measuring device with a measuring axis and a support slide that is moveable along a slide axis. The measuring axis is first aligned parallel to the slide axis. An adjustment body with a first spherical reflection and/or diffraction surface and a retro reflector at the back side is arranged at the support slide. It is brought into a first confocal position, in which a first center point of the first spherical reflection/diffraction surface coincides with the focus of the spherical wavefront that is emitted from the interferometer unit. The retro reflector defines a vertex that is located close to the first center point, such that the measuring axis of the distance measuring device extends close to the focus of the emitted spherical wavefront. In doing so, Abbe-faults can be reduced or eliminated.