Patent classifications
G01B9/02057
PRECISION POSITIONING SYSTEM USING A WAVELENGTH TUNABLE LASER
A method for determining characteristics of a test cavity, the method includes for each of a plurality of optical frequencies within a bandwidth of a tunable laser, measuring interference signals from the test cavity and a reference cavity having a known characteristic. The method includes determining values for the plurality of optical frequencies from the measured interference signals from the reference cavity and the known characteristic of the reference cavity, and determining the characteristic of the test cavity using the determined values of the plurality of optical frequencies.
Optical interference imaging device and its application
Provided herein are devices and systems comprising an illumination module configured to provide a source light to an optical interference module, which converts the source light to a line of light and processes light signal; an interference objective module, which handles light from the optical interference module and processes light signal generated from a sample; a two-dimensional camera configured to receive a backscattered interference signal from the sample, and a data processing module which processes the interference signal into an image.
On-axis dynamic interferometer and optical imaging systems employing the same
An optical device for characterizing a workpiece combines an interferometer with a polarization rotation pellicle, installed in a stand-alone fashion in a spatial gap between the mirrors of the interferometer, and a polarization based phase-shift sensor.
REMOTE PROBE FOR OPTICAL MEASURING MACHINE
A probe for an optical measurement system includes a probe body arranged to be adjustably mounted in a measuring machine for optically measuring a test object. A single mode fiber optically coupled within the probe body transmits a source beam having an instantaneous or sequentially established bandwidth spanning a range of wavelengths to the probe body and also transmits a measurement beam from the probe body toward a detector. An adjustable beam manipulator within the probe body spatially excludes portions of the reference beam over a progression of different size portions from being focused within the acceptance cone of the single mode fiber to more closely balance the intensities of the reflected object beam and the reflected reference beam within the measurement beam.
Optical coherence microscopy system having a filter for suppressing a specular light contribution
The invention relates to an optical coherence microscopy system for fast, phase resolved imaging by means of optical coherence microscopy with decoupled illumination and detection apertures, producing a dark-field effect with an enhanced optical contrast. The setup uses a light source with an appropriate temporal coherence, an interferometer and an array detector combined with a spectrometer. The dark-field effect is produced by optical filter means in the illumination and detection paths, positioned in conjugated planes of the sample microscope objective. These optical means comprise for example refractive or diffractive elements, amplitude or phase masks, or programmable spatial light modulators. The object is scanned via a scanning unit allowing a point scan of the object.
Interferometric distance sensing device and method with less dependency on environment disturbances on a fiber
Distance to a target is sensed using a common path interferometer, wherein a first fraction of light from a light source is collected after reflection by a partially reflective element together with reflection from a target of a second fraction of light from the light source that has been transmitted by the partially reflective element. The collected light is split in two parts, both containing a part of the first fraction and part of the reflection from the target. The parts are fed through a first and second optical branch path to an input side of a three-way optical coupler respectively. Light from at three terminals on a second side of the N way coupler is fed to respective light intensity detectors. Information representing an excess distance traveled by the first fraction from detection signals determined by the least three light intensity detectors.
Phase cancellation microscopy
Our high phase sensitivity wide-field phase cancellation interferometry system allows single-shot, label-free optical sensing of neural action potentials via imaging of optical path length changes. Single-shot sensing and monitoring of single neurons within a neural network should lead to a more comprehensive understanding neural network processing, which is beneficial for the advancement in the field of neuroscience as well as its biomedical applications and impact. Our system cancels the phase profile of the resting neuron from the phase profile of the spiking neuron, improving the sensitivity by two orders of magnitude. Using a detector with an extremely large well depth and an appropriately biased interferometer increases the sensitivity by another order of magnitude, yielding a measurement that is three orders of magnitude more sensitive than those possible with other microscopes.
Systems and methods for semiconductor chip surface topography metrology
Embodiments of systems and methods for measuring a surface topography of a semiconductor chip are disclosed. In an example, a method for measuring a surface topography of a semiconductor chip is disclosed. A plurality of interference signals each corresponding to a respective one of a plurality of positions on a surface of the semiconductor chip are received by at least one processor. The plurality of interference signals are transformed by the at least one processor into a plurality of spectrum signals each corresponding to the respective one of the positions on the surface of the semiconductor chip. The spectrum signals are classified by the at least one processor into a plurality of categories using a model. Each of the categories corresponds to a region having a same material on the surface of the semiconductor chip. A surface height offset between a surface baseline and at least one of the categories is determined by the at least one processor based, at least in part, on a calibration signal associated with the region corresponding to the at least one of the categories. The surface topography of the semiconductor chip is characterized by the at least one processor based, at least in part, on the surface height offset and the interference signals.
Testing apparatus and testing method
Disclosed are a testing apparatus and a testing method. When the testing apparatus is used to test a sample (11) to be tested, a first detection apparatus (21) and a second detection apparatus (22) can be switched by means of an objective lens switching apparatus (20), so as to acquire height information and structure information of the sample (11) to be tested. In the process, the sample (11) to be tested does not need to be transferred between testing apparatuses, thus, not only is pollution potentially created in the process of transferring the sample (11) to be tested avoided, and the probability of the sample (11) to be tested being polluted in the testing process reduced, but also a region to be tested of the sample (11) to be tested does not need to be determined repeatedly, improving the testing speed for the sample (11) to be tested.
Measuring method and measuring apparatus
The present invention provides a method of measuring a shape of a surface of an object, the method including obtaining shape data for each of a plurality of regions on the surface by a surface measurement for each of the plurality of regions, each of the plurality of regions having a region overlapping another of the plurality of regions, obtaining an error of the surface measurements so as to minimize a difference in shape with respect to the overlapping regions based on the obtained shape data, and obtaining the shape of the surface based on the obtained shape data and the obtained error, wherein the shape data is obtained so as not to include a component having a spatial frequency higher than a threshold determined based on a required precision.