A device for measuring a large-area and massive scattered field in nanoscale. The device includes a polarization state generator disposed on an output optical path of a laser source, a polarization state analyzer operating to demodulate a polarized light beam emitted thereon, a first objective lens and a first lens disposed on an optical path of a sample stage, and a scanning mirror disposed on an optical path in front of or at the rear of the polarization state generator.

In the embodiment in association with the present disclosure, an apparatus and method for multilayer thin film thickness measurement using single-shot angle-resolved spectral reflectometry are provided which allow simultaneously obtaining the absolute reflectance and phase data of a measurement object over a broad wavelength range and wide incident angle according to various polarization states by a single-shot measurement.

A method of authenticating a polymer film comprises measuring the thickness of a layer therein by white light interferometry and/or measuring the birefringence of a layer therein. The method, and devices to carry out the method, may be used in security applications, for example to test for counterfeit bank notes.

A method of performing surface profilometry includes receiving one or more polarization raw frames of a printed layer of a physical object undergoing additive manufacturing, the one or more polarization raw frames being captured at different polarizations by one or more polarization cameras, extracting one or more polarization feature maps in one or more polarization representation spaces from the one or more polarization raw frames, obtaining a coarse layer depth map of the printed layer, generating one or more surface-normal images based on the coarse layer depth map and the one or more polarization feature maps, and generating a 3D reconstruction of the printed layer based on the one or more surface-normal images.

A method and device of thin film spectroellipsometric imaging are disclosed. The device comprises an illuminator to direct light through a polarization generator system toward an extended area of a sample; an imaging system to form images; a detection system to record in a plurality of spectral channels; a computer to display and analyze the recorded images; and at least one reference phantom with known optical properties to replace the sample for calibration. The method comprises directing light from an illuminator through a polarization generator system toward an extended area of a sample having a geometrical shape; forming images with an imaging system; adjusting a polarization generator system and a polarization analyzer system to obtain a series of polarimetric setups; recording the images with a detection system in a plurality of spectral channels; replacing the sample with at least one reference phantom; and analyzing the recorded images with a computer.

Method of predicting a distribution of light in an illumination pupil of an illumination system includes identifying component(s) of the illumination system the adjustment of which affects this distribution and simulating the distribution based on a point spread function defined in part by the identified components. The point spread function has functional relationship with configurable setting of the illumination settings.

Full wafer in-situ metrology chambers and methods of use are described. The metrology chambers include a substrate support and a sensor bar that are rotatable relative to each other. The sensor bar includes a plurality of sensors at different radii from a central axis.

Provided are an apparatus and method for measuring the shape and thickness of a transparent object. A light projecting section that outputs beams of light to a transparent object, a light receiving sensor that receives the beams of light that have passed through the transparent object, and a data processing section that analyzes a received light signal in each light receiving element of the light receiving sensor are included. The light projecting section outputs, in parallel, output beams of light from a plurality of light sources, and the data processing section analyzes the received light signal in each light receiving element of the light receiving sensor and identifies a light source of any beam of light input into one light receiving element by using light source combination information that is stored in a storage section and that corresponds to a value of the received light signal.

Provided is an ellipsometer including a polarizing optical device configured to separate light, reflected from a sample that is irradiated with illumination light comprising a linearly polarized light, into a first linearly polarized light in a first polarization direction and a second linearly polarized light in a second polarization direction that is orthogonal to the first polarization direction, and a light-receiving optical system configured to calculate an Ψ and Δ, an amplitude ratio and a phase difference of the two polarized light respectively, from an interference fringe formed by interference between the first linearly polarized light and the second linearly polarized light after passing through an analyzing device with transmission axis different from the first polarization direction and the second polarization direction.

The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system. The focusing system uses an image of the light reflected from the measurement spot to determine a best focal position at a desired position of the sample. The focusing system selects a characteristic of reflected light, such as polarization state or wavelengths, to use for focusing. The characteristic of the reflected light that is selected for use in determining focal position is affected different by different portions of the sample. For example, light reflected from a top surface of a sample may have a different characteristic than light reflected by an underlying layer. The selected characteristic of the reflected light is used by the focusing system to focus the measurement spot at the top surface or an underlying layer of the sample.