A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.

A system and method are described for performing tear film structure measurement. A broadband light source illuminates the tear film. A spectrometer measures respective spectra of reflected light from at least one point of the tear film. A color camera performs large field of view imaging of the tear film, so as to obtain color information for all points of the tear film imaged by the color camera. A processing unit calibrates the camera at the point measured by the spectrometer so that the color obtained by the camera at the point matches the color of the spectrometer at the same point. The processing unit determines, from the color of respective points of the calibrated camera, thicknesses of one or more layers of the tear film at the respective points. Other applications are also described.

A method for optical inspection includes illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths, measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths, and based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.

A fluorescence measurement apparatus includes a fluorescence image acquisition unit that acquires a fluorescence image containing an object, an interference image acquisition unit that acquires an interference image containing the object, and an operation unit. The operation unit determines an optical thickness image based on the interference image acquired by the interference image acquisition unit, and determines, in a region of interest set in common in both of the fluorescence image acquired by the fluorescence image acquisition unit and the optical thickness image, a fluorescence expression rate of the object based on an integrated value of a fluorescence intensity in the fluorescence image and an integrated value of an optical thickness in the optical thickness image.

Provided is an ellipsometer including a polarizing optical device configured to separate light, reflected from a sample that is irradiated with illumination light comprising a linearly polarized light, into a first linearly polarized light in a first polarization direction and a second linearly polarized light in a second polarization direction that is orthogonal to the first polarization direction, and a light-receiving optical system configured to calculate an Ψ and Δ, an amplitude ratio and a phase difference of the two polarized light respectively, from an interference fringe formed by interference between the first linearly polarized light and the second linearly polarized light after passing through an analyzing device with transmission axis different from the first polarization direction and the second polarization direction.

The magnetic tape includes a non-magnetic support; and a magnetic layer in which the magnetic layer has a timing-based servo pattern, an edge shape of the timing-based servo pattern, specified by magnetic force microscopy is a shape in which a difference between a value L.sub.99.9 of a cumulative distribution function of 99.9% and a value L.sub.0.1 of a cumulative distribution function of 0.1% in a position deviation width from an ideal shape of the magnetic tape in a longitudinal direction is 180 nm or less, and a difference between a spacing S.sub.after measured on a surface of the magnetic layer by an optical interferometry after methyl-ethyl-ketone cleaning and a spacing S.sub.before measured on the surface of the magnetic layer by an optical interferometry before methyl-ethyl-ketone cleaning is greater than 0 nm and 15.0 nm or less.

The present disclosure is a sheet producing device for producing a multi-layer sheet by applying a coating material to a sheet material. The sheet producing device includes a radiation light source that emits radiation light, a division part that divides the radiation light into measurement light to be incident on the multi-layer sheet and reference light with which a reference surface is to be irradiated, and an optical member that emits the measurement light onto the multi-layer sheet and receives the measurement light reflected by the multi-layer sheet. An interference detector that detects interference light between the measurement light reflected by the multi-layer sheet and the reference light reflected by the reference surface, and a thickness calculator that calculates a thickness of the sheet material and a thickness of the coating material of the multi-layer sheet based on the detected interference light are further included. As a result, the tact time from the production of the multi-layer sheet to the calculation of the thickness can be shortened.

According to aspects of the embodiments, there is provided a method of measuring the amount of fountain solution employed in a digital offset lithography printing system. Fountain solution thickness is measured by using phase shifted monochromic light to produce optical path differences through the fountain solution film. The intensity of the reflected light through the fountain solution film is very sensitive due to the phase shifted light so interference fringes are easier to delineate and fountain solution thickness measurement more reliable.

According to aspects of the embodiments, there is provided a method of measuring the amount of fountain solution employed in a digital offset lithography printing system. Fountain solution thickness is measured using a diffractive optical element (DOE) configured with grating surfaces varying in a periodic fashion to hold an amount of fountain solution. When radiated with a light source the combination of the grating surface and the fountain solution therein reduces the scattering of the surface structure (“contrast”) that gives rise to a diffraction pattern. The diffractive optical element can be placed on the printing blanket of the lithography printing system or on a separate substrate.

Described herein is a method for examining a coating of a probe surface, including the steps of providing sensing data indicative of a depth of the coating at each of a predetermined subset of probe surface points, determining a depth representation of the coating from the sensing data, and deriving a coating property based on the depth representation. The coating property carries objective information about a geometric constitution or structure of the coating, which can be used for assessing the coating with respect to a functionality that is due to its geometric constitution or structure.