A method comprises: patterning a substrate, including a conductive region, with photoresist exposed by lithography, where the substrate is mounted on a handle substrate; forming a comb structure with conductive fingers on the substrate by at least removing a portion of the conductive region of the substrate; removing the photoresist; forming, one atomic layer at a time, at least one atomic layer of at least one conductor over at least one sidewall of each conductive finger; attaching at least one insulator layer to the comb structure, and the substrate from which the comb structure is formed; and removing the handle substrate.

A method comprises: patterning a substrate, including a conductive region, with photoresist exposed by lithography, where the substrate is mounted on a handle substrate; forming a comb structure with conductive fingers on the substrate by at least removing a portion of the conductive region of the substrate; removing the photoresist; forming, one atomic layer at a time, at least one atomic layer of at least one conductor over at least one sidewall of each conductive finger; attaching at least one insulator layer to the comb structure, and the substrate from which the comb structure is formed; and removing the handle substrate.

The present disclosure provides a differential resonator and a MEMS sensor. The differential resonator includes a substrate, a first resonator, a second resonator and a coupling mechanism. The first resonator is connected with the second resonator, and the first resonator and the second resonator are movably connected with the substrate. The coupling mechanism includes a first guide beam, a second guide beam, a first coupling beam, a second coupling beam, a first connecting piece and a second connecting piece. The first guide beam and the second guide beam are arranged on two opposite sides of a direction perpendicular to a vibration direction of the first resonator or the second resonator. The first coupling beam is connected with the first guide beam, the second guide beam and the first resonator. The second coupling beam is connected with the first guide beam, the second guide beam and the second resonator.

A MEMS angular rate sensor is presented with two pairs of suspended masses that are micromachined on a semiconductor layer. A first pair includes two masses opposite to and in mirror image of each other. The first pair of masses has driving structures to generate a mechanical oscillation in a linear direction. A second pair of masses includes two masses opposite to and in mirror image of each other. The second pair of masses is coupled to the first pair of driving masses with coupling elements. The two pairs of masses are coupled to a central bridge. The central bridge has a differential configuration to reject any external disturbances. Each of the masses of the two pairs of masses includes different portions to detect different linear and angular movements.

Columnar multi-axis microelectromechanical systems (MEMS) devices (such as gyroscopes) balanced against undesired linear and angular vibration are described herein. In some embodiments, the columnar MEMS device may comprise at least two multiple-mass columns, each having at least three proof masses and being configured to sense rotation about a respective axis. The motion and mass of the proof masses may be controlled to achieve linear and rotational balancing of the MEMS device. The columnar MEMS device may further comprise one or more modular drive structures disposed alongside each multiple-mass column to facilitate displacement of the proof masses of a respective column. The MEMS devices described herein may be used to sense roll, yaw, and pitch angular rates.

Columnar multi-axis microelectromechanical systems (MEMS) devices (such as gyroscopes) balanced against undesired linear and angular vibration are described herein. In some embodiments, the columnar MEMS device may comprise at least two multiple-mass columns, each having at least three proof masses and being configured to sense rotation about a respective axis. The motion and mass of the proof masses may be controlled to achieve linear and rotational balancing of the MEMS device. The columnar MEMS device may further comprise one or more modular drive structures disposed alongside each multiple-mass column to facilitate displacement of the proof masses of a respective column. The MEMS devices described herein may be used to sense roll, yaw, and pitch angular rates.

A frequency modulation MEMS triaxial gyroscope, having two mobile masses; a first and a second driving body coupled to the mobile masses through elastic elements rigid in a first direction and compliant in a second direction transverse to the first direction; and a third and a fourth driving body coupled to the mobile masses through elastic elements rigid in the second direction and compliant in the first direction. A first and a second driving element are coupled to the first and second driving bodies for causing the mobile masses to translate in the first direction in phase opposition. A third and a fourth driving element are coupled to the third and fourth driving bodies for causing the mobile masses to translate in the second direction and in phase opposition. An out-of-plane driving element is coupled to the first and second mobile masses for causing a translation in a third direction, in phase opposition. Movement-sensing electrodes generate frequency signals as a function of external angular velocities.

A frequency modulation MEMS triaxial gyroscope, having two mobile masses; a first and a second driving body coupled to the mobile masses through elastic elements rigid in a first direction and compliant in a second direction transverse to the first direction; and a third and a fourth driving body coupled to the mobile masses through elastic elements rigid in the second direction and compliant in the first direction. A first and a second driving element are coupled to the first and second driving bodies for causing the mobile masses to translate in the first direction in phase opposition. A third and a fourth driving element are coupled to the third and fourth driving bodies for causing the mobile masses to translate in the second direction and in phase opposition. An out-of-plane driving element is coupled to the first and second mobile masses for causing a translation in a third direction, in phase opposition. Movement-sensing electrodes generate frequency signals as a function of external angular velocities.

A method for calibrating the stiffness mismatch ΔK or quadrature Kxy of a vibrating angular sensor includes a resonator extending about two axes x and y defining a sensor frame xy, comprising a vibrating proof mass comprising two parts configured to vibrate in phase opposition with respect to each other in a direction x′ defining a wave frame x′y′, the direction x′ making an electrical angle to the axis x; and detection, excitation, quadrature compensation and stiffness adjustment transducers; the resonator having a stiffness matrix K.sub.C in the sensor frame and a stiffness matrix K.sub.O in the wave frame; the method comprising steps of: A determining the electrical angle; B recovering a quadrature or stiffness term of the stiffness matrix K.sub.O in the wave frame, the term being a sum of functions in cos(iθ) and sin(iθ); steps A and B being reiterated either for a plurality of electrical angles (θ.sub.k), or for a duration during which the vibration wave continuously rotates through an electrical angle (θ(t)) varying as a function of time; C determining the amplitudes of the functions in cos(iθ) and sin(iθ); then D determining the stiffness mismatch ΔK or the quadrature Kxy, on the basis of the amplitudes.

A method for calibrating the stiffness mismatch ΔK or quadrature Kxy of a vibrating angular sensor includes a resonator extending about two axes x and y defining a sensor frame xy, comprising a vibrating proof mass comprising two parts configured to vibrate in phase opposition with respect to each other in a direction x′ defining a wave frame x′y′, the direction x′ making an electrical angle to the axis x; and detection, excitation, quadrature compensation and stiffness adjustment transducers; the resonator having a stiffness matrix K.sub.C in the sensor frame and a stiffness matrix K.sub.O in the wave frame; the method comprising steps of: A determining the electrical angle; B recovering a quadrature or stiffness term of the stiffness matrix K.sub.O in the wave frame, the term being a sum of functions in cos(iθ) and sin(iθ); steps A and B being reiterated either for a plurality of electrical angles (θ.sub.k), or for a duration during which the vibration wave continuously rotates through an electrical angle (θ(t)) varying as a function of time; C determining the amplitudes of the functions in cos(iθ) and sin(iθ); then D determining the stiffness mismatch ΔK or the quadrature Kxy, on the basis of the amplitudes.