A disclosed control system for a gas assisted plunger lift (GAPL) system includes a sensor and a processor circuit. The sensor is configured to measure a plunger speed and/or velocity and the processor circuit is configured to control various parameters of the GAPL based on the measured plunger speed and/or velocity. The processor circuit may be configured to adjust a gas injection rate parameter based on the measured plunger speed and/or velocity, and/or may adjust one or more parameters including: a close time, an afterflow time, a flow rate, a load factor, a tubing pressure, a casing pressure, and a tubing/casing differential pressure. The controller may be further configured to adjust all parameters simultaneously or may sequentially adjust a first sub-set of parameters and then adjust a second sub-set of parameters. The first sub-set may include a gas injection flow rate and the second sub-set may include after-flow and close time parameters.

A pilot-operated relief valve assembly can include a relief valve, and a pressure detection assembly. A valve lift factor or indicator of relief flow can be determined based on pressure measurements gathered by the pressure detection assembly.

A vortex flowmeter for measuring a flow rate of a fluid. The meter includes a flowtube, a bluff body, and a vortex sensor. The bluff body, which is positioned in the flowtube, sheds vortices in the fluid when the fluid flows through the flowtube and the vortex sensor detects the vortices and generates a vortex signal representing the detected vortices. A pressure sensor arrangement is configured to detect a differential pressure in the fluid between a first location upstream of at least a portion of the bluff body and a second location downstream of at least a portion of the bluff body and generate a differential pressure signal representing the pressure differential between the two locations. The flowmeter determines the fluid flow rate based on the pressure differential.

A vortex flowmeter for measuring a flow rate of a fluid. The meter includes a flowtube, a bluff body, and a vortex sensor. The bluff body, which is positioned in the flowtube, sheds vortices in the fluid when the fluid flows through the flowtube and the vortex sensor detects the vortices and generates a vortex signal representing the detected vortices. A pressure sensor arrangement is configured to detect a differential pressure in the fluid between a first location upstream of at least a portion of the bluff body and a second location downstream of at least a portion of the bluff body and generate a differential pressure signal representing the pressure differential between the two locations. The flowmeter determines the fluid flow rate based on the pressure differential.

A flow measurement assembly that includes a production string and a flow meter fluidically coupled to the production string. The flow meter includes a variable Venturi tube attached to and configured to flow production fluid received from the production string. The variable Venturi tube includes an end fixed to the production string and at least one Venturi throat. The flow meter also includes an actuator configured to move the variable Venturi tube with respect to the fixed end. The flow meter includes a processor communicatively coupled sensors coupled to the variable Venturi tube. The processor determines, based on a first fluid parameter and the second fluid parameter received from the sensors, at least one of a mass flow rate of the production fluid, a density of the production fluid, a viscosity of the production fluid, or a coefficient of discharge of the production fluid.

A flow measurement assembly that includes a production string and a flow meter fluidically coupled to the production string. The flow meter includes a variable Venturi tube attached to and configured to flow production fluid received from the production string. The variable Venturi tube includes an end fixed to the production string and at least one Venturi throat. The flow meter also includes an actuator configured to move the variable Venturi tube with respect to the fixed end. The flow meter includes a processor communicatively coupled sensors coupled to the variable Venturi tube. The processor determines, based on a first fluid parameter and the second fluid parameter received from the sensors, at least one of a mass flow rate of the production fluid, a density of the production fluid, a viscosity of the production fluid, or a coefficient of discharge of the production fluid.

Included are mass flow controllers and methods of use. An example mass flow controller comprises a flow pathway through the mass flow controller; the flow pathway comprising a first cavity and a second cavity. The mass flow controller further comprises a laminar flow element. The mass flow controller additionally comprises a combination absolute and differential pressure transducer assembly comprising: a third cavity in fluid communication with the first cavity, an absolute pressure transducer exposed to absolute pressure in the third cavity, and a differential pressure transducer exposed to differential pressure between the third cavity and the second cavity. The mass flow controller also comprises a flow control valve assembly downstream of the laminar flow element and the combination absolute and differential pressure transducer assembly.

Vaporizer devices are disclosed. In one exemplary embodiment, a vaporizer device can include a vaporizer body including a first airflow path extending at least partially therethrough, and a sensor assembly residing at least partially within the vaporizer body. The sensor assembly includes a flexible sensor that is in communication with the first airflow path. The flexible sensor is configured to reversibly deflect from an initial state to a first state in response to a first user-activated force representing air being drawn through the first airflow path, and configured to reversibly deflect from the initial state to a second state in response to a second user-activated force representing an acceleration of the vaporizer body. Sensor assemblies for a vaporizer device are also provided.

A flow-rate sensor is provided with a lead frame, a semiconductor chip that is disposed on one surface of the lead frame, and in which a diaphragm including a void portion on the lead frame side is formed, a flow rate detecting unit that is formed on the one surface including the diaphragm of the semiconductor chip, and resin that includes a flow passage opening portion exposing at least a portion of the flow rate detecting unit formed on the diaphragm, and covers the lead frame and the semiconductor chip. A lower side resin portion of the resin covering another surface side of the lead frame, on an opposite side to the one surface side thereof, has a thinned portion that is thinner than a periphery thereof in a region facing a peripheral edge portion of the diaphragm.

A flow-rate sensor is provided with a lead frame, a semiconductor chip that is disposed on one surface of the lead frame, and in which a diaphragm including a void portion on the lead frame side is formed, a flow rate detecting unit that is formed on the one surface including the diaphragm of the semiconductor chip, and resin that includes a flow passage opening portion exposing at least a portion of the flow rate detecting unit formed on the diaphragm, and covers the lead frame and the semiconductor chip. A lower side resin portion of the resin covering another surface side of the lead frame, on an opposite side to the one surface side thereof, has a thinned portion that is thinner than a periphery thereof in a region facing a peripheral edge portion of the diaphragm.