A low-jitter digital clock signal generating system which uses optical pulses output from a pulse laser includes a first balanced photodetector that converts first and second optical pulses with a delayed time interval into first and second electrical pulses through first and second photodiodes and outputs first and second modulated pulses generated by allowing the first and second electrical pulses to partially overlap each other, a second balanced photodetector that converts third and fourth optical pulses with the delayed time interval into third and fourth electrical pulses through third and fourth photodiodes, and outputs a second modulated pulse generated by allowing the third and fourth electrical pulses to partially overlap each other, and a capacitor. The capacitor is charged by the first modulated pulse, is discharged by the second modulated pulse, and outputs a voltage according to the charging and discharging as a clock signal.

A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled from the excitation laser beam after a reflection on the target material. Each of the first beam analysis system and the second beam analysis system has at least one wavefront sensor system.

A system includes a first tube of a plurality of tubes, the first tube having a first end and a second end. The system further includes a light detector positioned at the second end of the first tube. The light detector is configured to detect an incoming light and determine light intensity information of the incoming light. The system further includes a material coupled to the first end of the first tube. The material is configured to change in transparency. The system further comprises a processor coupled to the light detector and the material. The processor is configured to receive the light intensity information from the light detector. The processor is further configured to determine that an intensity of the incoming light is above a threshold, and, in response to determining that the intensity is above the threshold, cause a change in transparency of the material.

An image processing method includes the steps of lighting up at least a part of light emitting units of a light emitting device; capturing a plurality of detection images corresponding to a plurality of sections of the light emitting device respectively, wherein each section includes a plurality of lighted-up light emitting units, each detection image includes a plurality of light spots respectively corresponding to the light emitting units of the associated section, and every two adjacent sections have an overlap area including at least one lighted-up light emitting unit; and stitching the detection images of the adjacent sections together by taking the light spots corresponding to at least one lighted-up light emitting unit of the overlap area as alignment reference spots, so that the light emitting statuses of all the light emitting units are presented by a single image.

A combination sensor may include a first infrared light sensor and a second infrared light sensor. The first infrared light sensor may be configured to sense light in a first wavelength within an infrared wavelength spectrum. The second infrared light sensor may be configured to sense light in a second wavelength that is different from the first wavelength within the infrared wavelength spectrum. The first infrared light sensor and the second infrared light sensor may be stacked in relation to each other.

An illuminance calibrating device includes a reference light source and an illuminance detection device. The reference light source, which generates light with a specific wavelength and a source illuminance, adjusts the source illuminance to be a first illuminance according to a control signal. The illuminance detection device includes a shading plate, an illuminance detector, and a controller. The shading plate is configured to lower the first illuminance to a first shading illuminance. The illuminance detector detects the first shading illuminance to generate a detection signal. The controller generates the control signal and calculates a ratio of the first illuminance to the first shading illuminance according to the detection signal.

A method for producing a hermetically gastight optoelectronic or electro-optical component with great robustness to heat and moisture is described. A housing cap is connected to a carrier in a hermetically gastight manner. Orifices in the housing cap are closed in a hermetically gastight manner by a window element. An electronic component with a housing has a housing cap, a carrier as base plate of the housing, and an interior space enclosed by the housing cap and the carrier. An optoelectronic or electro-optical converter element is arranged in the interior space. The housing cap is closed in a hermetically gastight manner by the carrier through a bonding connection of fused metal. The orifice is connected to the housing cap in a hermetically gastight manner by a window element along an edge metallization of the window element by a circumferential first seam of a fused metallic material.

A method and an apparatus for beam analysis in an optical system are disclosed, wherein a plurality of beam parameters of a beam propagating along an optical axis are ascertained. The method includes: splitting the beam into a plurality of partial beams which have a focus offset in the longitudinal direction in relation to the optical axis; recording a measurement image produced by these partial beams; carrying out a forward simulation of the beam in the optical system on the basis of estimated initial values for the beam parameters in order to obtain a simulated image; and calculating a set of values for the beam parameters on the basis of the comparison between the simulated image and the measurement image.

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

The present application discloses a nano-textured attenuator which includes a body defining in in the aperture, a measurement aperture, at least one beam dump aperture, at least one coupling fixture may be formed on or positioned on the body, a first nano-textured beamsplitter is positioned within the body and configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one partially attenuated signal, at least a second nano-textured beamsplitter is positioned within the body and is configured to transmit 85% to 99.9999% of an input signal therethrough while reflecting 0.0001% to form at least one attenuated measurement signal, and at least one camera is communication with the measurement aperture be configured to measure at least one optical characteristic of the attenuated measurement signal.