The particle size distribution measuring apparatus includes a centrifugal sedimentation measuring mechanism and a dynamic light scattering measuring mechanism. The centrifugal sedimentation measuring mechanism causes particles to settle out by rotating a measurement cell accommodating particles dispersed in a dispersion medium and detects transmitted light by irradiating light to the measurement cell to measure a first particle size distribution on a basis of a change of transmitted light intensity of the transmitted light. The dynamic light scattering measuring mechanism detects scattered light occurred upon irradiation of light to particles so as to measure a second particle size distribution based on a change of scattered light intensity of the scattered light occurred due to Brownian motion of particles. After the centrifugal sedimentation measuring mechanism detects the transmitted light, the dynamic light scattering measuring mechanism measures the second particle size distribution by irradiating light onto the measurement cell.

Provided herein are particle detection systems, and related methods configured to characterize a liquid sample, comprising: a first probe configured to determine a first parameter set of a plurality of first particles in a liquid sample, the first particles characterized by a size characteristic selected from a first size range; wherein the first parameter set comprises a first size distribution and a first concentration; and a second probe configured to determine a second parameter set of one or more second particles in the liquid sample, the second particles being characterized by a size characteristic selected from a second size range; wherein the second parameter set comprises a second size distribution and a second concentration.

According to one embodiment, a particle measuring method is disclosed. The method includes irradiating a detection liquid with light. The detection liquid contains methyl salicylate. The method further includes converting scattered light from the detection liquid into an electric signal by using photoelectric conversion after irradiating the detection liquid with the light. The method further includes performing a particle measurement on the detection liquid by using the electric signal.

An image pickup apparatus includes a signal acquisition unit and a rotation unit. The signal acquisition unit includes an illumination unit including a light source and configured to irradiate a sample with a light beam, a photodetector including a plurality of light-receiving portions two-dimensionally arranged, and a detection optical system configured to guide light having been irradiated from the illumination unit to the sample and passed through the sample, to the photodetector. The rotation unit rotates the sample and the signal acquisition unit relative to each other, about a first axis intersecting an optical axis of the detection optical system in the sample. The illumination unit irradiates the sample with light beams at two or more incident angles in a plane including the optical axis and the first axis.

The present disclosure describes an apparatus and method of improving temperature uniformity and suppressing well plate warping. In an embodiment, the apparatus includes a barrier configured to be positioned above at least one well configured to contain a liquid sample, where a vessel includes the at least one well, where the vessel is transparent and is configured to be placed within a measurement chamber, where a light measurement apparatus includes the measurement chamber, where the light measurement apparatus is configured to measure light scattered from the liquid sample, where the barrier is configured to seal the at least one well from the measurement chamber, and a weighted lid configured to press a bottom surface of the vessel against a well plate retainer of the measurement chamber, thereby spreading heat among the at least one well and preventing the vessel from warping.

A glittery ink contains glittery pigment particles, resin particles, and an organic solvent, wherein the following relationships are satisfied: a≤c≤b and a<b, where a represents the particle diameter of the resin particles corresponding to the minimum of two or more peaks in a particle size distribution as measured by a dynamic light scattering particle size distribution measuring device, b represents the particle diameter of the resin particles corresponding to the maximum of the two or more peaks in the particle size distribution, and c represents the particle diameter of the glittery pigment corresponding to a maximum number of particles in a particle size distribution as measured by the dynamic light scattering particle size distribution measuring device.

A cuvette carrier comprising: a plurality of walls defining a holding volume for a cuvette; a first and second transmissive region included in the plurality of walls; and a first optical polariser arranged to polarise light passing through the first transmissive region.

A method of determining particle size distribution from multi-angle dynamic light scattering data, comprising: obtaining a series of measured correlation functions g(.sub.i) at scattering angles .sub.i; and solving an equation comprising

[00001]$\left[\begin{array}{c}g\left({}_1\right)\\ \mathrm{.Math.}\\ g\left({}_n\right)\end{array}\right]=\left[\begin{array}{c}{}_1.Math.K\left({}_1\right)\\ \mathrm{.Math.}\\ {}_n.Math.K\left({}_n\right)\end{array}\right].Math.x,$

wherein: K(.sub.i) is the instrument scattering matrix computed for angle i, x is the particle size distribution, and .sub.i is the scaling coefficient for angle i. The method comprises using the steps: a) providing initial estimates for scaling factors .sub.2 to .sub.n, and defining .sub.1=1; b) iterating scaling factors .sub.2 to .sub.n using a non-linear solver; c) solving for x using a linear solver; d) calculate residual; e) repeat steps b) to d) while the residual is greater than a predefined exit tolerance.

A method includes performing Chemical Mechanical Polish (CMP) on a wafer, placing the wafer on a chuck, performing a post-CMP cleaning on the wafer, and determining cleanness of the wafer when the wafer is located on the chuck.

The invention relates to a device and method for measuring the concentration, size and zeta potential of nanoparticles in liquids in scattered light mode and fluorescence mode, comprising the following features: a) a sample (28) is irradiated from above by a laser (1) via a beamsplitter (14) and an adjustable-focus liquid lens (9), and the reflected beam of light is deflected by the same beamsplitter (14) and a further liquid lens (8) onto a detector (5), and analysed; b) to observe the fluorescent light, a fluorescence filter (19) is connected in the convergent beam path between the liquid lens (8) and the detector (5), to increase the distance between the scattered light plane (31) and the fluorescence plane (30); and c) to control the measurement process, a particle tracking program, an optical control unit (15) and a display (2) with a touch screen are used.