G01N2021/213

Liquid immersion micro-channel measurement device and measurement method which are based on trapezoidal incident structure prism incident-type silicon

The present invention relates to a liquid immersion micro-channel measurement device and measurement method which are based on trapezoidal incident structure prism incident-type silicon, and according to one embodiment of the present invention, the liquid immersion micro-channel measurement device based on trapezoidal incident structure prism incident-type silicon comprises: a micro-channel structure including a support and at least one micro-channel, which is formed on the support and has a sample detection layer to which a first bioadhesive material for detecting a first sample is fixed; a quadrangular pyramid-shaped prism formed on the upper part of the micro-channel structure; a sample injection unit for injecting, into the micro-channel, a buffer solution containing the first sample; a polarized light generation unit for emitting incident light polarized through the prism on the micro-channel at an incident angle that satisfies a p-wave non-reflection condition; and a polarized light detection unit for detecting, from the polarized incident light, a polarization change in a first refection light reflected from the sample detection layer, wherein the prism completely reflects, from the polarized incident light incident on the prism, on an upper boundary surface of the prism, second reflection light reflected from a lower boundary surface of the prism and a boundary surface of the buffer solution injected into the micro-channel.

EUV spectroscopic polarimeter

We have invented an EUV spectroscopic polarimeter including a light receiving element, a first polarizing modulation element, a second polarizing modulation element, an energy splitting element and a light detecting and analyzing apparatus. The light receiving element is for receiving a target light. The first polarizing modulation element is rotatably connected to the light receiving element for generating a first polarized light. The second polarizing modulation element is rotatably connected to the first polarizing modulation element for generating a second polarized light. The energy splitting element receives the second polarized light so as to generate a modulated-polarization and energy-resolved light. The light detecting and analyzing apparatus receiving the polarization-modulated and energy-resolved light and providing a spectrum information by an analyzing algorithm which is able to retrieve the helicity, ellipticity, tilt angle and the degree of polarization for the whole spectrum of the target light.

OPTICAL PROPERTY EVALUATION APPARATUS AND OPTICAL PROPERTY EVALUATION METHOD

An optical property evaluation apparatus evaluates an optical property of an evaluation object, and includes a light source, a polarization beam splitter, a polarization adjuster, a first detector, a second detector, and an analyzer. The analyzer obtains a reflectance when linearly polarized light in a specific direction is incident on the evaluation object based on the detection result by the first detector when the light with which the evaluation object is irradiated is set to be the linearly polarized light in the specific direction. The analyzer obtains a phase property at the reflection of the evaluation object based on the detection result by the first detector or the second detector when the light with which the evaluation object is irradiated is set to have a polarization state different from the linearly polarized light in the specific direction, and a Jones matrix.

INFRARED MEASUREMENT METHOD AND APPARATUS, COMPUTER DEVICE AND STORAGE MEDIUM
20230304921 · 2023-09-28 ·

The disclosure relates to an infrared measurement method and apparatus, a computer device, a storage medium, and a computer program product. The method includes: detecting intensity information of sum-frequency mixing light projected on different polarization bases in a to-be-measured scene, the sum-frequency mixing light is generated in a sum-frequency mixing process of infrared signal light and pump light; determining polarization information of the sum-frequency mixing light according to the intensity information of the sum-frequency mixing light projected on the different polarization bases; determining polarization information of the infrared signal light according to the polarization information of the sum-frequency mixing light and a Mueller matrix, the Mueller matrix is constructed based on a second-order nonlinear polarizability corresponding to a sum-frequency mixing device and the polarization information of the pump light; determining detection information of a to-be-measured target in the to-be-measured scene according to the polarization information of the infrared signal light.

SUBSTRATE MEASUREMENT SUBSYSTEM

A method for a substrate measurement subsystem is provided. An indication is received that a substrate being processed at a manufacturing system has been loaded into a substrate measurement subsystem. First positional data of the substrate within the substrate measurement subsystem is determined. One or more portions of the substrate to be measured by one or more sensing components of the substrate measurement subsystem are determined based on the first positional data of the substrate and a process recipe for the substrate. Measurements of each of the determined portions of the substrate are obtained by one or more sensing components of the substrate measurement subsystem. The obtained measurements of each of the determined portions of the substrate are transmitted to a system controller.

Multi-environment polarized infrared reflectometer for semiconductor metrology

A system includes a light source, a Fourier transform infrared reflectometer (FTIR) spectrometer, and broadband reflectometer optics. The system is configured to measure polarized light and unpolarized reflectivities in a wavelength range from 2 μm to 20 μm. The light source can be a laser-driven light source. The spectroscopic reflectometer can include a single channel or two channels.

MEASUREMENT SYSTEM CAPABLE OF ADJUSTING AOI, AOI SPREAD AND AZIMUTH OF INCIDENT LIGHT

A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.

Spectroscopic analysis device

A spectroscopic analysis device includes a light source configured to emit light including a plurality of wavelength components, a polarizer configured to convert the light emitted from the light source to a light of linearly polarized light to be radiated to a sample, a polarizing diffraction element configured to diffract and spectrally disperse a first polarization component included in the light having passed through the sample in a first direction, the polarizing diffraction element being configured to diffract and spectrally disperse a second polarization component included in the light in a second direction different from the first direction, a prism which is disposed on an exit side of the polarizing diffraction element and which has a first exit surface crossing the first direction and a second exit surface crossing the second direction, and in which angles of the first exit surface and the second exit surface with respect to a reference plane including the first direction and the second direction are different, an imaging element configured to capture an image of the first polarization component emitted from the first exit surface of the prism and an image of the second polarization component emitted from the second exit surface, and a processor configured to analyze the sample based on an imaging result of the imaging element.

Instantaneous ellipsometer or scatterometer and associated measuring method

Disclosed is an ellipsometer or scatterometer including a light source, a polarizer, an optical illumination system suitable for directing an incident polarized light beam towards a sample, a wavefront-division optical beam splitter arranged to receive a secondary light beam produced by reflection, transmission or diffraction, the wavefront-division optical beam splitter being oriented to form three collimated split beams, an optical polarization modification device and an optical polarization splitting device to form six angularly split beams, a detection system suitable for detecting the six split beams, and a processing system suitable for deducing therefrom an ellipsometric or scatterometric measurement.

ELLIPSOMETER AND INSPECTION DEVICE FOR INSPECTING SEMICONDUCTOR DEVICE HAVING THE SAME
20220003538 · 2022-01-06 · ·

An ellipsometer is provided. The ellipsometer includes: a polarizing optical element, comprising a prism, that is configured to split reflected light into two linearly polarized components of light having polarization directions orthogonal to each other, the reflected light generated by reflecting illuminated light, including linearly polarized light that is polarized in one direction, from a measurement surface of a sample; an interference member, comprising at least one body, that is configured to form at least one interference fringe in which the two linearly polarized components of light interfere with each other in directions different from the polarization directions; an image detector configured to detect the at least one interference fringe; and an analysis device including at least one processor, the analysis device configured to calculate ellipsometry coefficients Ψ and Δ based on the at least one interference fringe that is detected.