A method for determining properties of a sample (12) by ellipsometry includes positioning the sample (12) in an ellipsometer (10) so that a surface normal (n) of a measurement region of the sample surface is tilted relative to a reference axis (z) of the ellipsometer (10) and measuring a Mueller matrix for the measurement region. The method then includes creating an equation system by equating the measured Mueller matrix and a matrix product formed of: a rotation matrix about an input rotation angle (γ); an isotropic Mueller matrix in normalized NCS form and a rotation matrix about an output rotation angle (−δ). The method then solves the equation system for the parameters representing the sample properties to be determined. The input rotation angle (γ) and the output rotation angle (—δ) are set as parameters independent of one another when setting up the equation system.

Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

A monitoring system and method are presented for use in monitoring a target. The monitoring system comprises: an input utility for receiving input data comprising measured data indicative of optical response of the target measured under predetermined conditions and comprising phase data indicative of a two-dimensional profile of full phase of the optical response of the target in a predetermined two-dimensional parametric space including a two-dimensional range in which said target exhibits phase singularity; an analyzer module for processing said measured data and extracting at least one phase singularity signature of the target characterizing the target status, the phase singularity signature being formed by a number N of phase singularity points, each corresponding to a condition that the physical phase continuously accumulates a nonzero integer multiple m of 2 around said point.

Embodiments of the present invention relate to an ellipsometer that includes a combination of a plurality of reflective devices to measure a Mueller matrix reflectance of a material in the VUV and EUV region. Ellipsometer in accordance with embodiments of the present invention relate to an ellipsometer that includes a multi-mirror polarization state generator combined with a multi-mirror polarization state analyzer and a detector to realize a Mueller matrix ellipsometer. Embodiments of the present invention utilize two rotating assemblies with each assembly including multiple mirrors that combine to act as amplitude and phase retarders.

System and method for use in optical monitoring of a sample. The system comprising: a light source unit (140) for providing collimated illumination; polarization modulation unit (160) located in optical path of light propagating from the light source unit; a lens unit (120) for focusing light onto an illumination spot on a surface of a sample, and for collection of light components returning from the sample; a light collection unit configured for collecting light returning from the sample and generate output image data associated with Fourier plane imaging with respect to surface of the sample; and a control unit (500) configured processing said data in accordance with said system calibration. The method provides calibration data, and comprising: providing reference data indicative of complex refractive index of the reference samples on at least two reference samples; collecting ellipsometry data for said at least two reference samples using the ellipsometry system, generating output data having a plurality of data pieces, each associated with unknown angular direction; and for each data piece corresponding to an unknown angular direction, determining simultaneously system parameters and angle of incidence in accordance with corresponding parameters of the reference data to thereby determine calibration data.

A microscope, a method, and a system are provided. A system includes a first optical system, a second optical system, and one or more processors. The first optical system is configured to generate an optical phase signal associated with a first image of a sample in a first field of view. The second optical system is configured to generate a polarized signal associated with a second image of the sample in a second field of view. The one or more processors is configured to generate a co-registered phase and polarization information map based on the optical phase signal and the polarized signal. The first field of view is the same as the second field of view. The first image and the second image are captured sequentially.

Automatic determination of Fourier harmonic order for computation of spectral information for diffraction structures described. An embodiment of a method includes automatically determining a Fourier harmonic order for computation of spectral information for periodic structures, wherein the determination of the Fourier harmonic order is based at least in part on the pitches in each of multiple directions of the periodic structures, material properties of the periodic structures, and characteristics of the periodic structures in which the materials are contained; and computing the spectral information for the periodic structures based at least in part on the determined Fourier harmonic order.

A method for determining properties of a sample (12) by ellipsometry includes positioning the sample (12) in an ellipsometer (10) so that a surface normal (n) of a measurement region of the sample surface is tilted relative to a reference axis (z) of the ellipsometer (10) and measuring a Mueller matrix for the measurement region. The method then includes creating an equation system by equating the measured Mueller matrix and a matrix product formed of: a rotation matrix about an input rotation angle (?); an isotropic Mueller matrix in normalized NCS form and a rotation matrix about an output rotation angle (??). The method then solves the equation system for the parameters representing the sample properties to be determined. The input rotation angle (?) and the output rotation angle (??) are set as parameters independent of one another when setting up the equation system.

Methodology of characterizing surface properties and determining refractive index and extinction coefficient of a prism shaped material, including simultaneously for a multiplicity of wavelengths, using an easy to practice technique.

Systems, methods, apparatuses, and articles of manufacture are provided for recovering a digitized spectrum and may comprise: an optical system configured to transform rays, the optical system including a diffraction grating, a steering mirror, a stage, and an actuator configured to move one of the stage, diffraction grating, or steering mirror according to a movement regime to vary an incidence of the rays on the stage; a sensor array disposed on the stage configured to receive the rays incident from the optical system at a plurality of measurement locations to obtain a plurality of ray spectra; and a processor electrically connected to the sensor array configured to receive the ray spectra, interleave the ray spectra to yield an interleaved spectrum, and deconvolve a point spread function corresponding to the optical system from the interleaved spectrum to yield a recovered digitized spectrum.