Patent classifications
G01N2021/215
MUELLER MATRIX ELLIPSOMETER
Embodiments of the present invention relate to an ellipsometer that includes a combination of a plurality of reflective devices to measure a Mueller matrix reflectance of a material in the VUV and EUV region. Ellipsometer in accordance with embodiments of the present invention relate to an ellipsometer that includes a multi-mirror polarization state generator combined with a multi-mirror polarization state analyzer and a detector to realize a Mueller matrix ellipsometer. Embodiments of the present invention utilize two rotating assemblies with each assembly including multiple mirrors that combine to act as amplitude and phase retarders.
Scattered radiation optical scanner
An optical scanning system includes a radiating source capable of outputting a light beam, a time varying beam reflector that is configured to reflect the light beam through a scan lens towards a transparent sample at an incident angle that is not more than one degree greater or less than Brewster's angle of the transparent sample, and a focusing lens configured to be irradiated by light scattered from the transparent sample at an angle that is normal to the plane of incidence of the moving irradiated spot on the transparent sample. A first portion of the light beam is scattered from a first surface of the transparent sample and a second portion of the light beam is scattered from a second surface of the transparent sample. A spatial filter is configured to block the second portion of the light beam scattered from the second surface of the transparent sample.
Reflectometer, spectrophotometer, ellipsometer or polarimeter system including sample imaging system that simultaneously meet the scheimpflug condition and overcomes keystone error
An imaging system, and method of its use, for viewing a sample surface at an inclined angle, preferably in functional combination with a sample investigating reflectometer, spectrophotometer, ellipsometer or polarimeter system; wherein the imaging system provides that a sample surface and multi-element imaging detector surface are oriented with respect to one another to meet the Scheimpflug condition, and wherein a telecentric lens system is simultaneously positioned between the sample surface and the input surface of the multi-element imaging detector such that an image of the sample surface produced by said multi-element imaging detector is both substantially in focus over the extent thereof, and such that substantially no keystone error is demonstrated in said image.
BIOMARKER DETECTION APPARATUS
An analyzing system is provided. The analyzing system includes a fluid container defining a sample chamber where a sample is contained in the sample chamber, and a sensor including a transparent body with a reverse face and an obverse face where the obverse face having a nanostructured surface. The nanostructured surface includes a plurality of elongate nanostructures having a respective longitudinal axis that is disposed substantially perpendicularly to the obverse face. The analyzing system includes an excitation and detection apparatus that includes an excitation source for generating a beam of polarized radiation and a corresponding radiation detector where the sensor is coupled to the fluid container such that the nanostructured surface is exposed to the sample chamber, to the sample located therein.
METHOD AND APPARATUS FOR MEASURING THE WATER CONCENTRATION IN A LIGHT-DIFFUSING MATERIAL
A method for measuring the water concentration in a light-diffusing material, includes the following steps: an emission by N light sources of beams with wavelengths; an acquisition by M sensors, sensitive in at least one portion of the wavelengths; wherein M+N>3. The method also includes the steps of: calculating a first piece of information representing the diffusion, and a second piece of information representing the absorption, as a function of the signals and a piece of digital information representing the diffusing material as well as the sources and the sensors; calculating the water concentration in the sample as a function of the second piece of information.
Angle independent optical surface inspector
An angle independent optical surface inspector capable of generating a light beam, directing the light beam to a sample, and de-scanning a reflected light beam that is reflected from the sample, thereby generating a first de-scanned light beam. The de-scanning is performed at approximately one focal length of a de-scanning lens from an irradiation location where the light beam irradiates the sample. The optical inspector also capable of focusing the first de-scanned light beam, thereby generating a focused light beam, and measuring the location of the focused light beam. The measuring of the location is performed at approximately one focal length of a focusing lens from the focusing lens. The incident angle of the light beam is within ten degrees of Brewster's angle. The focusing is performed by an achromatic lens.
SAMPLE ANALYSIS TOOL EMPLOYING A BROADBAND ANGLE-SELECTIVE FILTER
A sample analysis tool includes a sample chamber to hold a sample. The tool also includes a broadband angle-selective filter arranged along an optical path with the sample chamber. The tool also includes an electromagnetic radiation (ER) transducer that outputs a signal in response to electromagnetic radiation that passes through the broadband angle-selective filter. The tool also includes a storage device that stores data corresponding to the signal output from the ER transducer, wherein the data indicates a property of the sample.
OPTICAL ELEMENT TESTING METHODS AND SYSTEMS EMPLOYING A BROADBAND ANGLE-SELECTIVE FILTER
An optical element testing system includes a broadband angle-selective filter arranged along an optical path with an optical element to be tested. The system also includes a electromagnetic radiation transducer that outputs a signal in response to electromagnetic radiation that passes through the broadband angle-selective filter. The system also includes a storage device that stores data corresponding to the signal output from the electromagnetic radiation transducer, wherein the data indicates a property of the optical element in response to a test.
Concentration measuring method of optically active substance and concentration measuring device of optically active substance
Provided are a concentration measuring method of an optically active substance and a concentration measuring device of an optically active substance, which can easily and accurately measure a concentration of the optically active substance in aqueous humor. The concentration measuring method of an optically active substance includes: a first step of measuring a polarization state of a first reflected light that is obtained by irradiating an aqueous humor in an eye with an incidence light which is polarized and reflecting the incidence light at an interface between the aqueous humor and a lens, in which the polarization state of the first reflected light is measured by irradiating a first incidence light such that an angle between a normal line to a point where the incidence light intersects a surface of the lens, and the incidence light is equal to or smaller than a Brewster angle; a second step of measuring a polarization state of a second reflected light by irradiating with a second incidence light such that an angle of the incidence light is equal to or larger than the Brewster angle; a third step of calculating an optical rotation of the aqueous humor with information on the polarization state of the first reflected light and information on the polarization state of the second reflected light; and a fourth step of calculating a concentration of an optically active substance in the aqueous humor from the optical rotation of the aqueous humor.
Ellipsometer and apparatus for inspecting semiconductor device including the ellipsometer
An ellipsometer capable of improving a throughput calculating ellipsometry coefficients (, ) even when performing measurement with a combination of a light source having a wide wavelength band and a spectrometer, and an apparatus for inspecting a semiconductor device is e hid g the ellipsometer may be provided. The ellipsometer includes a polarizing optical element unit for separating reflected light into two polarization components having polarization directions that are orthogonal to each other in a radial direction with respect to an optical axis of an optical system of the reflected light, an analyzer unit for transmitting components of a direction different from the polarization directions of the two polarization components to make the two polarization components interfere with each other, and to form an interference fringe in a form of a concentric circle, an image detector for detecting the interference fringe, and processing circuitry for calculating ellipsometry coefficients from the interference fringe.