To perform measurement based on polarization anisotropy in which a reaction between a target substance and a luminescent reagent is performed within a short period of time, and in which high-sensitivity measurement can be performed, provided is an analysis method including measuring a value (R) for polarization anisotropy through use of a luminescent reagent that reacts with a target substance, to thereby determine at least any one of the presence or absence of the target substance and a concentration of the target substance, the analysis method including: a reaction step of mixing a sample containing the target substance with the luminescent reagent, and subjecting the mixture to a reaction to obtain a reaction liquid; a dilution step of diluting the reaction liquid to obtain a diluted liquid; and a measurement step of measuring the R of the diluted liquid, the luminescent reagent including luminescent particles.

An analyzing system includes a fluidic stream that guides an analyte in a detection area where the analyte emits or transmits light. One or more polarizing elements polarize the light into respective two or more different polarization components. One or more optical detectors receive the respective two or more polarization components and generate respective at least two signals in response. A processor is coupled to the optical detectors and configured to determine the polarization status of the light from the object based on the signals.

Analyte collection and testing systems and methods, and more particularly to disposable oral fluid collection and testing systems and methods. Described herein are methods and apparatuses to achieve significant improvements in the detection of fluorescence signals in the reader.

A sample imaging device includes a side illumination unit, a two window sample chamber, and refractive index matching. An optically transparent sample holder is in the sample well as is sample immersion fluid. The refractive index matching includes matching of the refractive index of material of a sample to be imaged.

Provided is a support for fluorescence polarization immunoassay of which reaction parts are loaded with an antibody and a fluorescent labeling substance. The plurality of reaction parts may be loaded with different concentrations of an antibody and a fluorescent labeling substance. Further, antibodies having different binding affinities for a target substance may be loaded. With such a support, fluorescence polarizations can be measured simply by adding a sample solution containing a target substance to the reaction parts, and a wide measurement range of the concentration the target substance can be secured.

A sample detection device includes a first polarizer configured to allow part of incident light to pass therethrough by polarizing the incident light, a stage disposed on a path of light having passed the first polarizer, the stage allowing a sample to be seated thereon, a second polarizer configured to polarize light and a detection unit configured to detect light having passed the second polarizer and to generate a detection signal. The first polarizer allows first polarized light oscillating in a first direction to proceed toward the sample when the incident light reaches the first polarizer. Emission light is emitted by an excitation of the sample when the first polarized light reaches the sample. The second polarizer allows second polarized light oscillating in a second direction to proceed toward the detection unit when the emission light reaches the second polarizer.

An orientation characteristic measurement system (1) includes an irradiation optical system (5), a detection optical system (11), a light detector (13), a rotation mechanism (9) changing an angle (ϕ) between a surface of the sample and an optical axis (L2) of the detection optical system (11), and a computer (15), and the computer (15) includes a rotation mechanism control unit (32) controlling the rotation mechanism (9), a distribution acquisition unit (34) normalizing an angle-dependent distribution of light intensity to acquire an angle-dependent distribution of light intensity, an area specifying unit (35) specifying light intensity in a maximum area on the basis of the angle-dependent distribution of the light intensity, and a parameter calculation unit (36) calculating the orientation parameter (S) on the basis of a linear relationship determined using the film thickness and refractive index of the sample and the light intensity in the maximum area.

The invention generally relates to methods for quantifying an amount of enzyme molecules. Systems and methods of the invention are provided for measuring an amount of target by forming a plurality of fluid partitions, a subset of which include the target, performing an enzyme-catalyzed reaction in the subset, and detecting the number of partitions in the subset. The amount of target can be determined based on the detected number.

A sample solution preparation method, a measurement cell, a measurement kit, and a sample solution preparation device for measuring a target compound contained in food by an immunity analysis method using fluorescence. The present disclosure features including a dialysis step for bringing a target compound-containing solution that includes the target compound into contact with a dialysis fluid through a dialysis membrane to transfer the target compound to the dialysis fluid, in which the molecular weight cut-off of the dialysis membrane is within a range of 2×10.sup.2 to 2×10.sup.5, and the volume of the dialysis fluid is relatively smaller than the volume of the target compound-containing solution.

Disclosed is a lithography process on a sample including at least one structure and covered by at least a lower layer of resist and a upper layer of resist the process including: using an optical device to image or determine, in reference to the optical device, a position of the selected structure and positions of markers integral with the sample; using an electron-beam device, imaging or determining the position of each marker in reference to the electron-beam device; deducing the position of the selected structure in reference to the electron-beam device; exposing to an electron beam the upper layer of resist above the position of the selected structure to remove all the thickness of the upper layer of resist above the position of the selected structure but none or only part of the thickness of the lower layer of resist above the position of the selected structure.