G01N2021/9511

SINGLE-BEAM PHOTOTHERMAL MEASUREMENT APPARATUS AND MEASUREMENT METHOD FOR ABSORPTIVE DEFECTS

A single-beam photothermal measurement apparatus and a measurement method for absorptive defects. The apparatus comprises a common-path-type structure and a non-common-path-type structure. The present invention is simple in optical structure and convenient to align and adjustment. The measurement result is stable, and measurement signal anomalies caused by environmental vibration and sample tilt are avoided. By detecting a power change on the edge of a beam spot, the measurement sensitivity of a system is remarkably improved.

Method and device determining soiling of a shield

A device comprises a housing, a detector for receiving solar irradiance and for providing a detector signal providing an indication of an amount of solar irradiance received by the detector and a shield transparent to at least part of the solar irradiance to be detected, the shield and the housing providing a detector space for housing at least part of the detector. The device further comprises a first light source for emitting light to the shield and a first light sensor arranged to receive light from the first light source, arranged to provide a first signal providing an indication for an amount of light received by the first light sensor. Particles will and reflect light back to the detector space. The reflected light is received by the light sensor. Hence, a signal generated by the sensor is an indication for pollution of the shield.

Passivation of nonlinear optical crystals

A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

METHOD AND SYSTEM FOR CHARACTERIZING SURFACE UNIFORMITY

A method includes emitting light from a light source (12) onto an at least partially reflective surface (24). The reflected light (30) is collected from the surface at a screen (32) to capture the intensity distribution (34) of the reflected light with a camera (40) in a first image (42). The intensity distribution of the first image of the reflected light is processed (50) by performing suitable filtering of a Fourier transform of the intensity distribution of the reflected light so as to emphasize features having an intensity variation of interest. The features of the intensity distribution of the reflected light having the variation of interest are analyzed to determine a uniformity value for the surface.

Body-worn device with tamper detection, dirt alerting and dirt compensation
11169096 · 2021-11-09 · ·

A system and method for detecting degradation of a fiber optic in a strap of a body-worn device that is removably attached to an appendage or other location of a person or animal. A fiber optic is embedded within the strap. A light source emits light energy through the optical interface and into the fiber optic and a light sensor receives and detects light energy from the fiber optic. If the light energy is not received and detected from the fiber optic, the light energy is increased until the light energy is received and detected or reaches a maximum light energy at which time tampering is declared. If the light energy reaches a pre-determined threshold which is less than the maximum light energy, it is declared that the body-worn device requires servicing.

WAFER LEVEL TESTING OF OPTICAL COMPONENTS
20230282527 · 2023-09-07 ·

A system may include a wafer that includes ICs and defines cavities. Each cavity may be formed in a BEOL layer of the wafer and proximate a different IC. The system may also include an interposer that includes a transparent layer configured to permit optical signals to pass through. The interposer may also include at least one waveguide located proximate the transparent layer. The at least one waveguide may be configured to adiabatically couple at least one optical signal out of the multiple ICs. Further, the interposer may include a redirecting element optically coupled to the at least one the waveguide. The redirecting element may be located proximate the transparent layer and may be configured to receive the at least one optical signal from the at least one waveguide. The redirecting element may also be configured to vertically redirect the at least one optical signal towards the transparent layer.

Optical-based validation of orientations of internal facets
11747137 · 2023-09-05 · ·

Disclosed herein is a method including: providing a light guiding arrangement (LGA) configured to redirect light, incident thereon in a direction perpendicular to an external surface of the sample, into or onto the sample, such that light impinges on an internal facet of the sample nominally normally thereto; generating a first incident light beam (LB), directed at the external surface normally thereto, and a second incident LB, parallel to the first incident LB and directed at the LGA; obtaining a first returned LB by reflection of the first incident LB off the external surface, and a second returned LB by redirection by the LGA of the second incident LB into or onto the sample, reflection thereof off the internal facet, and inverse redirection by the LGA; measuring an angular deviation between the returned LBs and deducing therefrom an actual inclination angle of the internal facet relative to the external surface.

Device of detection of surface defects on at least one terminal surface of at least one optical fiber
11808991 · 2023-11-07 · ·

A device for detection of surface defects on a terminal surface of an optical fiber. The device includes a digital microscope configured to capture an image of a terminal surface; and a mechanism for analyzing the image configured to detect surface defects present on the terminal surface, the analysis mechanism integrating a “U-Net”-type neural network having had its training phase carried out via an enhancer. The enhancer is configured to create training images, intended to train the neural network, based on reference images. The training images are obtained from the reference images by only applying flips, rotations and/or luminosity, contrast, or shade variations to the reference images.

OPTICAL-BASED VALIDATION OF ORIENTATIONS OF INTERNAL FACETS
20230366675 · 2023-11-16 ·

Disclosed herein is a method including: providing a light guiding arrangement (LGA) configured to redirect light, incident thereon in a direction perpendicular to an external surface of the sample, into or onto the sample, such that light impinges on an internal facet of the sample nominally normally thereto; generating a first incident light beam (LB), directed at the external surface normally thereto, and a second incident LB, parallel to the first incident LB and directed at the LGA; obtaining a first returned LB by reflection of the first incident LB off the external surface, and a second returned LB by redirection by the LGA of the second incident LB into or onto the sample, reflection thereof off the internal facet, and inverse redirection by the LGA; measuring an angular deviation between the returned LBs and deducing therefrom an actual inclination angle of the internal facet relative to the external surface.

MEASUREMENT OF THICK FILMS AND HIGH ASPECT RATIO STRUCTURES
20230341337 · 2023-10-26 ·

The system includes a light source configured to emit light along an illumination path; a projection optical assembly disposed in the illumination path; a target disposed in the illumination path and configured to reflect the light along a collection path; a collection optical assembly disposed in the collection path; a detector disposed in the collection path and configured to detect the light reflected from the target and generate an output signal based on the detected light; and a processor in electronic communication with the detector and configured to generate a measurement of the target based on the output signal. The projection optical assembly defines a first numerical aperture at the target and the collection optical assembly defines a second numerical aperture at the target, and the first numerical aperture is slightly larger than the second numerical aperture for measurements of thick films and high aspect ratio structures.