G01N2021/9511

Wafer level testing of optical components

A system may include a wafer that includes ICs and defines cavities. Each cavity may be formed in a BEOL layer of the wafer and proximate a different IC. The system may also include an interposer that includes a transparent layer configured to permit optical signals to pass through. The interposer may also include at least one waveguide located proximate the transparent layer. The at least one waveguide may be configured to adiabatically couple at least one optical signal out of the multiple ICs. Further, the interposer may include a redirecting element optically coupled to the at least one the waveguide. The redirecting element may be located proximate the transparent layer and may be configured to receive the at least one optical signal from the at least one waveguide. The redirecting element may also be configured to vertically redirect the at least one optical signal towards the transparent layer.

Device Of Detection Of Surface Defects On At Least One Terminal Surface Of At Least One Optical Fiber
20210286133 · 2021-09-16 · ·

A device for detection of surface defects on a terminal surface of an optical fiber. The device includes a digital microscope configured to capture an image of a terminal surface; and a mechanism for analyzing the image configured to detect surface defects present on the terminal surface, the analysis mechanism integrating a “U-Net”-type neural network having had its training phase carried out via an enhancer. The enhancer is configured to create training images, intended to train the neural network, based on reference images. The training images are obtained from the reference images by only applying flips, rotations and/or luminosity, contrast, or shade variations to the reference images.

Method for testing curved reflective surfaces

Methods and systems for calculating a reflectance value of a reflective coating on a curved surface of an optical element include calculating the reflectance value by taking a series of photon count measurements of an extended radiation source over a range of values of emitted radiation reflected from the curved surface into a detector. A combination of the measurements and a known value of accepted or conforming reflectance for the reflective coating is used to calculate the reflectance value of the reflective coating on the curved surface.

Method and apparatus for inspection of spherical surfaces
11047675 · 2021-06-29 ·

Disclosed are a method and an apparatus for inspection of workpieces and products having curved and, in particular, spherical surfaces. The method is based on scanning inspected objects with a narrow probing beam of electromagnetic radiation and concurrently measuring the radiation scattered on the surface. The method and apparatus improve the detectability of features and imperfections on inspected surfaces by providing invariable parameters and conditions of scanning, robust mechanical stability of scanning systems, high positioning accuracy of the probing electromagnetic beam and efficient collection of the scattered radiation. The apparatus allows surface defect classification, determining defect dimensions and convenient automation of inspection.

Reflected light measurement device
11016036 · 2021-05-25 · ·

To provide a reflected light measurement device capable of efficiently performing disconnection inspection on an optical connector, and a plurality of optical fibers. The reflected light measurement device 1 includes a laser light source 2, a beam splitter 3 that branches measurement laser light L into measurement laser light L1 to be transmitted and reference laser light L2 to be reflected, a reference mirror 4 including an optical path length varying mechanism capable of adjusting an optical path length of the reference laser light L2, an optical path length switching unit 5, and switches the optical path length of the reference laser light L2 to a plurality of fixed lengths, and a photometer 6 that receives measurement laser light L1′ reflected at defect sites D1 and D2 such as disconnection inside connectors C1 and C2, and reference laser light L2′ reflected by the reference mirror 4.

Flaw detecting apparatus, method for detecting flaw of plane mirror based on line scanning and ring band stitching

A flaw detecting apparatus and a method for a plane mirror based on line scanning and ring band stitching are provided. The flaw detecting apparatus comprises: a line scanning detector, an annular illumination source, a rotary table rotatable about a Z axis, a translation table translatable along an X axis and a processor. By translating and rotating the plane mirror to be detected, an entire surface of the plane mirror to be detected can be detected by the line scanning detector, and the flaw of the entire plane mirror to be detected is obtained by a ring band stitching method. The method of line scanning and ring band stitching reduces the imaging distortion, the intermediate data amount, the difficulty in the distortion correction and difficulty in stitching, and improves the detection speed and the detection quality.

QUALITY CONTROL OF AN ELECTROCHROMIC DEVICE

Quality control of an electrochromic device is described. A method may be subsequent to a stage of manufacturing of an electrochromic device. The method may include directing a current tinting state of the electrochromic device to correspond to a first tinting state and receiving sensor data associated with the directing of the current tinting state of the electrochromic device to correspond to the first tinting state. The method may further include determining, based on the sensor data, whether a corrective action is to be performed for the electrochromic device and, responsive to determining the corrective action is to be performed, cause the corrective action to be performed.

DEVICE FOR OPTICAL INSPECTION OF EMPTY AND LIQUID-FILLED CONTAINERS
20200408702 · 2020-12-31 ·

The invention relates to a device for optically inspecting a container that is empty or filled with liquid, comprising an illumination unit and a recording apparatus. The illumination unit comprises an illumination surface, by means of which a two-dimensional light pattern consisting of at least two regions of different light intensities can be produced and the container can be irradiated with light from the light pattern, in particular said light can shine therethrough. According to the invention, a mirror system is further provided which is arranged in the beam path between the illumination unit and the container and comprises at least one concave mirror. The mirror system images the light pattern produced by the illumination unit onto the plane of the entrance pupil of the recording apparatus.

METHOD AND APPARATUS FOR INSPECTION OF SPHERICAL SURFACES
20200378755 · 2020-12-03 ·

Disclosed are a method and an apparatus for inspection of workpieces and products having curved and, in particular, spherical surfaces. The method is based on scanning inspected objects with a narrow probing beam of electromagnetic radiation and concurrently measuring the radiation scattered on the surface. The method and apparatus improve the detectability of features and imperfections on inspected surfaces by providing invariable parameters and conditions of scanning, robust mechanical stability of scanning systems, high positioning accuracy of the probing electromagnetic beam and efficient collection of the scattered radiation. The apparatus allows surface defect classification, determining defect dimensions and convenient automation of inspection.

Measurement system and a method of diffracting light

Embodiments of the present disclosure relate to measurement systems and methods for diffracting light. The measurement system includes a stage, an optical arm, and one or more detector arms. The method of diffracting light includes a method of diffracting light is provided, including projecting light beams having wavelength .sub.laser to a first zone of a first substrate at the fixed beam angle .sub.0 and the maximum orientation angle .sub.max, obtaining a displacement angle , determining a target maximum beam angle .sub.t-max, wherein .sub.t-max=.sub.0+, and determining a test grating pitch P.sub.t-grating by a modified grating pitch equation P.sub.t-grating=.sub.laser/(sin .sub.t-max+sin .sub.0). The measurement system and method allow for measurement of nonuniform properties of regions of an optical device, such as grating pitches and grating orientations.