A method for inspecting a sample by means of a multi-beam charged particle inspection apparatus, and an apparatus for performing this method are provided. The multi-beam charged particle inspection apparatus is configured to project an array of charged particle beamlets within an exposure area on the sample. The apparatus includes a detection system for detecting X-Rays and/or cathodoluminescent light from the exposure area emitted by the sample due to an interaction of the array of charged particle beamlets with the sample. The method includes the steps of projecting the array of charged particle beamlets within the exposure area on the sample, and monitoring a combined emission of X-Rays and/or cathodoluminescent light from the interaction of substantially all charged particle beamlets of the array of charged particle beamlets with the sample.

Method and system are disclosed for determining sample composition from spectral data acquired by a charged particle microscopy system. Chemical elements in a sample are identified by processing the spectral data with a trained neural network (NN). If the identified chemical elements not matching with a known elemental composition of the sample, the trained NN is retrained with the spectral data and the known elemental composition of the sample. The retrained NN can then be used to identify chemical elements within other samples.

Method and system are disclosed for determining sample composition from spectral data acquired by a charged particle microscopy system. Chemical elements in a sample are identified by processing the spectral data with a trained neural network (NN). If the identified chemical elements not matching with a known elemental composition of the sample, the trained NN is retrained with the spectral data and the known elemental composition of the sample. The retrained NN can then be used to identify chemical elements within other samples.

A mask member is provided at an entrance opening of a mirror unit. Of a first diffraction grating and a second diffraction grating, when the second diffraction grating is used, the mask member masks preceding mirrors. With this process, aberration caused by reflective X-ray is suppressed. When the first diffraction grating is used, the mask member does not function. Alternatively, the mask member and another mask member may be selectively used.

Method and system are disclosed for determining sample composition from spectral data acquired by a charged particle microscopy system. Chemical elements in a sample are identified by processing the spectral data with a trained neural network (NN). If the identified chemical elements not matching with a known elemental composition of the sample, the trained NN is retrained with the spectral data and the known elemental composition of the sample. The retrained NN can then be used to identify chemical elements within other samples.

Method and system are disclosed for determining sample composition from spectral data acquired by a charged particle microscopy system. Chemical elements in a sample are identified by processing the spectral data with a trained neural network (NN). If the identified chemical elements not matching with a known elemental composition of the sample, the trained NN is retrained with the spectral data and the known elemental composition of the sample. The retrained NN can then be used to identify chemical elements within other samples.

A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

There is provided an analytical method capable of generating a high resolution spectrum of X-rays with an intended energy. The analytical method is for use in an analytical apparatus having a diffraction grating for spectrally dispersing X-rays emanating from a sample, an image sensor for detecting the spectrally dispersed X-rays, and an incident angle control mechanism for controlling the incident angle of X-rays impinging on the diffraction grating. The image sensor has a plurality of photosensitive elements arranged in the direction of energy dispersion. The analytical method starts with specifying an energy of X-rays to be acquired. The incident angle is adjusted based on the specified energy to bring the focal plane of the diffraction grating into positional coincidence with those one or ones of the photosensitive elements which detect X-rays having the specified energy.

There is provided an analytical method capable of generating a high resolution spectrum of X-rays with an intended energy. The analytical method is for use in an analytical apparatus having a diffraction grating for spectrally dispersing X-rays emanating from a sample, an image sensor for detecting the spectrally dispersed X-rays, and an incident angle control mechanism for controlling the incident angle of X-rays impinging on the diffraction grating. The image sensor has a plurality of photosensitive elements arranged in the direction of energy dispersion. The analytical method starts with specifying an energy of X-rays to be acquired. The incident angle is adjusted based on the specified energy to bring the focal plane of the diffraction grating into positional coincidence with those one or ones of the photosensitive elements which detect X-rays having the specified energy.