Practical implementation of Particle-Induced X-ray Emission (PIXE) on a focused ion beam apparatus or on a dual-beam apparatus comprising both focused-ion beam and scanning microscopy capabilities is described. Accordingly, an analytical method comprises: directing and focusing a beam of ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.

A spectroscopy method and system, the method comprising irradiating an object with a laser-accelerated particle beam and detecting photons emitted by the object as a result of the interaction between the laser-accelerated particle beam and the object. The system comprises a laser; a particle source, positioned at a distance from the object; and a spectrometer and a detector; wherein the particle source generates a laser-accelerated particle beam under irradiation by the laser; and the spectrometer and the detector detect photons emitted from the object under irradiation by the laser-accelerated particle beam.

A spectroscopy method and system, the method comprising irradiating an object with a laser-accelerated particle beam and detecting photons emitted by the object as a result of the interaction between the laser-accelerated particle beam and the object. The system comprises a laser; a particle source, positioned at a distance from the object; and a spectrometer and a detector; wherein the particle source generates a laser-accelerated particle beam under irradiation by the laser; and the spectrometer and the detector detect photons emitted from the object under irradiation by the laser-accelerated particle beam.

A system and method of characterizing a work piece, comprising: scanning an ion beam across an exposed surface of a work piece, the ion beam causing the emission of secondary electrons at multiple imaging points of the scan, the number of secondary electrons emitted varying at different ones of the multiple imaging points; detecting the emitted secondary electrons at each of the multiple imaging point to form an image, the brightness of each point in the image being determined by the number of secondary electrons detected at a corresponding imaging point on the work piece; determining grain boundaries in the work piece using the differences in brightness at different points in the image, the grain boundaries defining multiple grains; directing a charged particle beam toward one or more analysis points within one or more of the grains, the number of the one or more analysis points within each grain being less than the number of imaging points within the same grain; and detecting emissions from the work piece sample at each analysis point;
and determining the composition or crystal structure of one or more grains based on the detected secondary emissions.

A system and method of characterizing a work piece, comprising: scanning an ion beam across an exposed surface of a work piece, the ion beam causing the emission of secondary electrons at multiple imaging points of the scan, the number of secondary electrons emitted varying at different ones of the multiple imaging points; detecting the emitted secondary electrons at each of the multiple imaging point to form an image, the brightness of each point in the image being determined by the number of secondary electrons detected at a corresponding imaging point on the work piece; determining grain boundaries in the work piece using the differences in brightness at different points in the image, the grain boundaries defining multiple grains; directing a charged particle beam toward one or more analysis points within one or more of the grains, the number of the one or more analysis points within each grain being less than the number of imaging points within the same grain; and detecting emissions from the work piece sample at each analysis point; and determining the composition or crystal structure of one or more grains based on the detected secondary emissions.

A composition analysis method includes iteratively irradiating a sample with an ion beam, irradiating a specific portion of the sample that is thinned by the irradiation of the ion beam with an electron beam, and detecting an intensity of an X-ray generated from the sample by the irradiation of the electron beam. The method further includes determining an identity of an element included in the sample based on at least one detection result obtained in the iterative process.

An apparatus comprises: a focused ion beam (FIB) column within a vacuum chamber configured to direct ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and an X-ray detector configured to detect and measure X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample. The apparatus may further comprise an electron microscope column within the vacuum chamber configured to direct and focus a beam of electrons onto the sample and to detect secondary electrons or backscattered electrons that are emitted from the sample in response to the impingement of the beam of electrons onto the sample. The electron microscope may generate an image of a sample area that is milled by the FIB column.

An apparatus comprises: a focused ion beam (FIB) column within a vacuum chamber configured to direct ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and an X-ray detector configured to detect and measure X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample. The apparatus may further comprise an electron microscope column within the vacuum chamber configured to direct and focus a beam of electrons onto the sample and to detect secondary electrons or backscattered electrons that are emitted from the sample in response to the impingement of the beam of electrons onto the sample. The electron microscope may generate an image of a sample area that is milled by the FIB column.

Various examples are provided related to magnetic deflectors and their use in, e.g., proton-induced X-ray emission (PIXE) spectroscopy. In one example, a magnetic deflector includes first and second magnets separated by a gap; a ferromagnetic yoke surrounding the magnets, the yoke extending between a ferromagnetic front cover and rear cover, each including a canal extending through the cover; and a removable entrance aperture detachably attached to the front cover. The entrance aperture includes an opening aligned with the canal of the front cover to limit ions entering the magnetic deflector through the entrance aperture to a specified conical region. A direction of trajectory of an ion entering the magnetic deflector is altered by the magnetic field as it travels through the gap. The magnetic deflector can be used in a PIXE spectroscopy system to enable detection of low energy x-rays emitted from low-Z elements.

Various examples are provided related to magnetic deflectors and their use in, e.g., proton-induced X-ray emission (PIXE) spectroscopy. In one example, a magnetic deflector includes first and second magnets separated by a gap; a ferromagnetic yoke surrounding the magnets, the yoke extending between a ferromagnetic front cover and rear cover, each including a canal extending through the cover; and a removable entrance aperture detachably attached to the front cover. The entrance aperture includes an opening aligned with the canal of the front cover to limit ions entering the magnetic deflector through the entrance aperture to a specified conical region. A direction of trajectory of an ion entering the magnetic deflector is altered by the magnetic field as it travels through the gap. The magnetic deflector can be used in a PIXE spectroscopy system to enable detection of low energy x-rays emitted from low-Z elements.