An inspection system for detecting defects in a workpiece can include an illumination source for illuminating a first section of the workpiece with a patterned light, wherein the illumination source does not illuminate a second section of the workpiece. The inspection system further includes a feedback camera for imaging the first section and producing a first output, and a background camera for imaging the second section and producing a second output. A processor compares the first output with the second output, and a controller alters the patterned light that is output by the illumination source based on the comparison. This feedback control continues until the background is suitably homogeneous or camouflaged compared to the defect, such that the visibility and/or detectability of the defect is increased.

An inspection system and a method for analyzing defects in a product, in particular a printed circuit board product, a semiconductor wafer or the like, the inspection system includes a projection device , an optical detection device , and a processing device, the projection device having an illuminating unit and a spectrometer member configured to split white light into its spectral components and project a multichromatic light beam thus formed from monochromatic light beams onto a product at an angle of incidence , the optical detection device having a detection unit comprising a camera and an objective , the camera being configured to detect the multichromatic light beam reflected on the product in a detection plane of the detection unit, the detection plane being perpendicular, preferably orthogonal, to a product surface of the product, the illuminating unit having at least two light-emitting diodes disposed in a row and an exit aperture extending along the row.

A determination device includes an irradiator, an extractor, an imager, and a determiner, The irradiator irradiates an object including a food or a plant with a light. The extractor extracts a predetermined fluorescence emission having a predetermined wavelength out of fluorescence emissions generated from a surface of the object irradiated with the light. The imager captures a fluorescence image indicating the predetermined fluorescence emission. The determiner determines a state of the object based on an index indicating a fluorescence intensity of the fluorescence image.

An inspection system for detecting defects in a workpiece can include an illumination source for illuminating a first section of the workpiece with a patterned light, wherein the illumination source does not illuminate a second section of the workpiece. The inspection system further includes a feedback camera for imaging the first section and producing a first output, and a background camera for imaging the second section and producing a second output. A processor compares the first output with the second output, and a controller alters the patterned light that is output by the illumination source based on the comparison. This feedback control continues until the background is suitably homogeneous or camouflaged compared to the defect, such that the visibility and/or detectability of the defect is increased.

Systems and methods for increasing the accuracy of a turbidity sensor are disclosed. The systems include a turbidity sensor and a flow module with a specialized flow path, with the turbidity sensor engaging with the flow module such that a measurement zone of the turbidity sensor is disposed within a flow path of the flow module and a bypass path of the flow module does not pass through the measurement zone. The methods include flowing a fluid containing bubbles into a system that separates the fluid in the flow module into a first stream of fluid containing relatively more bubbles and a second stream of fluid containing relatively fewer bubbles, the first stream flowing through a bypass path that does not pass through the measurement zone, and the second stream flowing through the measurement zone of the turbidity sensor.

A device for optical detection of analytes in a sample includes at least two optoelectronic components. The optoelectronic components include at least one optical detector configured to receive a photon and at least one optical emitter configured to emit a photon. The at least one optical emitter includes at least three optical emitters disposed in a flat, non-linear arrangement, and the at least one optical detector includes at least three optical detectors disposed in a flat, non-linear arrangement. The at least three optical emitters and the at least three optical detectors include at least three different wavelength characteristics.

An illumination system, an inspection tool and a method for inspecting an object are disclosed. A configurable area light source is arranged in an illumination optical axis of an illumination beam path, wherein the configurable area light source is configured such that different beam diameters are settable. At least one illumination lens is positioned in the illumination beam path for directing a collimated beam at least onto a field of view on a surface of the object, wherein a value of an angle of incidence of the illumination optical axis of the illumination beam path equals a value of an angle of reflectance of the imaging optical axis of the imaging beam path. The invention allows the combination of the functionality of a wide angle coaxial illumination and a collimated coaxial illumination in one illumination system.

A daylight hand-lamp for checking painted surfaces, in particular in the field of paint repair work on motor vehicles. The light spectrum is formed homogenously such that at a distance of between 30 cm0.5 cm in a spectral range having a wavelength of 400 to 700 nm, a daylight deviation average value in a central area and an inner periphery is less than 20%, or the average value of a spectral stability factor is less than 10% with respect to the beam center in the central area and inner periphery.

Aspects of inventive concepts described herein relate to an interferometric reflectance imaging system. The system can include an imaging sensor including pixels that are preferentially sensitive to a plurality of light components; an illumination source configured to emit illumination light along an illumination path, the illumination light including the plurality of light components; and a target including a target substrate configured to support one or more nanoparticles on a surface of the target substrate. The system may be configured to, at a nominal focus position: generate an image at the imaging sensor based, at least in part, on the light reflected from the target interfering with light scattered from nanoparticles on the target substrate; and process the image to detect the nanoparticles on the target substrate.

A light, in particular for testing workpiece surfaces using a fluorescent marking device, which light has at least two lighting elements that emit electromagnetic radiation with different wavelength ranges. The intensity with which the lighting element irradiates can be adjusted separately for at least one of the lighting elements. Expediently, the light is configured to increase or reduce the intensity of at least one of the lighting elements and at the same time to keep the intensity of at least one other of the lighting elements constant, or to reduce it or increase it in the opposite way to the first-mentioned lighting element. The light is configured to adjust the intensity at such a speed that the human eye can adapt to a change in the intensity during the adjustment without adverse effects on the person's sight.