A lens includes a lens unit, an uneven layer formed on at least a portion of a surface of the lens unit, a buffer layer covering the uneven layer and having a shape conforming to an uneven surface of the uneven layer, and a water-repellent layer covering the buffer layer.

A lens includes a lens unit, an uneven layer formed on at least a portion of a surface of the lens unit, a buffer layer covering the uneven layer and having a shape conforming to an uneven surface of the uneven layer, and a water-repellent layer covering the buffer layer.

An optical device includes, in sequence, a surface formed of a metal oxide, a samarium oxide-containing layer in contact with the surface formed of a metal oxide, and a magnesium fluoride-containing layer in contact with the samarium oxide-containing layer so as to suppress optical absorption resulting from high-rate sputter deposition of a magnesium fluoride-containing layer on a surface formed of a metal oxide.

An optical device includes, in sequence, a surface formed of a metal oxide, a samarium oxide-containing layer in contact with the surface formed of a metal oxide, and a magnesium fluoride-containing layer in contact with the samarium oxide-containing layer so as to suppress optical absorption resulting from high-rate sputter deposition of a magnesium fluoride-containing layer on a surface formed of a metal oxide.

To appropriately transmit far-infrared rays while ensuring design. A far-infrared ray transmission member (20) includes a base material (30) configured to transmit far-infrared rays, and a functional film (31) formed on the base material (30). Dispersion of reflectances with respect to pieces of light at a wavelength of 360 nm to 830 nm in increments of 1 nm is equal to or smaller than 30, a reflectance with respect to visible light defined by JIS R3106 is equal to or lower than 25%, and an average transmittance with respect to light at a wavelength of 8 μm to 12 μm is equal to or higher than 50%.

This optical laminate includes a transparent substrate; an adhesion layer provided on at least one surface of the transparent substrate; and an optical layer provided on a surface of the adhesion layer on a side opposite to the transparent substrate, wherein the adhesion layer is formed of a metal material, and the metal material has a melting point in a range of 100° C. or more and 700° C. or less.

This optical laminate includes a transparent substrate; an adhesion layer provided on at least one surface of the transparent substrate; and an optical layer provided on a surface of the adhesion layer on a side opposite to the transparent substrate, wherein the adhesion layer is formed of a metal material, and the metal material has a melting point in a range of 100° C. or more and 700° C. or less.

An anti-reflective film-attached transparent substrate includes: a transparent substrate including two major surfaces; and a diffusion layer and an anti-reflective film on one major surface of the transparent substrate, which are provided in this order. (A) A luminous reflectance SCI Y of an outermost surface of the anti-reflective film-attached transparent substrate is 1% or lower. (B) The anti-reflective film has a lamination structure in which at least two dielectric layers having different refractive indices are laminated. (C) A ratio (SCE Y)/(SCI Y) of a diffuse reflectance SCE Y of the outermost surface of the anti-reflective film-attached transparent substrate to the luminous reflectance SCI Y of the outermost surface of the anti-reflective film-attached transparent substrate is 0.15 or higher.

An antireflection film 3 provided on an optical substrate 2 of an optical member 1 has a reflectivity adjusting film 4 including a first layer 10, a second layer 11 having a refractive index higher than a refractive index of the first layer 10, a third layer 12 having a refractive index lower than a refractive index of the second layer 11, and a photocatalyst film 5 including one or more photocatalytically active layers 14 containing titanium dioxide, in which a thickness of the reflectivity adjusting film measured from a surface 4a is equal to or greater than 20 nm and less than 150 nm, the photocatalyst film 5 is provided between the reflectivity adjusting film 4 and the optical substrate 2, an interface 5a between the photocatalyst film 5 and the reflectivity adjusting film is disposed at position spaced apart from the surface 4a by a distance equal to or shorter than 150 nm, and a total thickness of the photocatalytically active layers 14 is equal to or greater than 350 nm and equal to or smaller than 1,000 nm.

An antireflection film 3 provided on an optical substrate 2 of an optical member 1 has a reflectivity adjusting film 4 including a first layer 10, a second layer 11 having a refractive index higher than a refractive index of the first layer 10, a third layer 12 having a refractive index lower than a refractive index of the second layer 11, and a photocatalyst film 5 including one or more photocatalytically active layers 14 containing titanium dioxide, in which a thickness of the reflectivity adjusting film measured from a surface 4a is equal to or greater than 20 nm and less than 150 nm, the photocatalyst film 5 is provided between the reflectivity adjusting film 4 and the optical substrate 2, an interface 5a between the photocatalyst film 5 and the reflectivity adjusting film is disposed at position spaced apart from the surface 4a by a distance equal to or shorter than 150 nm, and a total thickness of the photocatalytically active layers 14 is equal to or greater than 350 nm and equal to or smaller than 1,000 nm.