Patent classifications
G02B2006/121
Optical device with low-loss thermally tunable closed-curve optical waveguide
Disclosed is a photonic structure and associated method. The structure includes a closed-curve waveguide having a first height, as measured from the top surface of an insulator layer, and an outer curved sidewall that extends essentially vertically the full first height (e.g., to minimize signal loss). The structure includes a closed-curve thermal coupler and a heating element. The closed-curve thermal coupler is thermally coupled to and laterally surrounded by the closed-curve waveguide and has a second height that is less than the first height. In some embodiments, the closed-curve waveguide and the closed-curve thermal coupler are continuous portions of the same semiconductor layer having different thicknesses. The heating element is thermally coupled to the closed-curve thermal coupler and thereby indirectly thermally coupled to the closed-curve waveguide. Thus, the heating element is usable for thermally tuning the closed-curve waveguide via the closed-curve thermal coupler to minimize any temperature-dependent resonance shift (TDRS).
Multilayer waveguide grating coupler
A multilayer waveguide coupler comprising a first grating and a second grating is provided. Each first copropagating waveguide of the first grating has a first periodically modulated width. Each second copropagating waveguide of the second grating has a second periodically modulated width. The second grating is positioned so that a phase offset is present between the first periodically modulated width of the first copropagating waveguides and the second periodically modulated width of the second copropagating waveguides. The grating spaced distance and phase offset are selected so that light diffracted out of the first copropagating waveguides and the second copropagating waveguides in the first direction interferes constructively to form the first light beam and light diffracted out of the first copropagating waveguides and the second copropagating waveguides in the second direction interferes destructively.
Cascaded integrated photonic wavelength demultiplexer
A photonic integrated circuit includes a photonic device. The photonic device includes an input region configured to receive an input signal including a plurality of multiplexed channels. The photonic device includes a metastructured dispersive region structured to partially demultiplex the input signal into an output signal and a throughput signal. The output signal includes a channel of the multiplexed channels. The throughput signal includes the remaining channels of the multiplexed channels. The photonic device includes an output region and a throughput region optically coupled with the metastructured dispersive region to receive the output signal and the throughput signal, respectively. The metastructured dispersive region includes a heterogeneous distribution of a first material and a second material that structures the metastructured dispersive region to partially demultiplex the input signal into the output signal and the throughput signal.
Wafer scale bonded active photonics interposer
There is set forth herein an optoelectrical system comprising: a conductive path for supplying an input voltage to a photonics device, wherein the conductive path comprises a base structure through via extending through a substrate and a photonics structure through via, the photonics structure through via extending through a photonics device dielectric stack. There is set forth herein an optoelectrical system comprising: a second structure fusion bonded to an interposer base dielectric stack of a first structure. There is set forth herein a method comprising: fabricating a second wafer built structure using a second wafer, the second wafer built structure defining a photonics structure and having a photonics device integrated into a photonics device dielectric stack of the second wafer based structure; and wafer scale bonding the second wafer built structure to a first wafer built structure.
Optical waveguide and method for manufacturing same
An optical waveguide is provided and includes: a core forming layer with a high refractive index; and a first clad layer with a low refractive index, bonded to a first main surface of the core forming layer. The core forming layer is provided in its plane direction with a core portion, lateral clad portions each having one side adjacent to a corresponding side of the core portion, and high refractive index portions each adjacent to the other side of a corresponding one of the lateral clad portions. The core portion is provided in its plane direction with a central region, and GI regions in each of which a refractive index continuously decreases from the central region toward an interface with the corresponding one of the lateral clad portions. The lateral clad portions each include a region having a constant refractive index.
A HYBRID CMOS COMPATIBLE ELECTRO-OPTIC DEVICE
A hybrid photonic chip comprising a plurality of semiconductor materials arranged to define a chip providing a function, wherein at least a first part of the chip is formed of materials which can be fabricated using a CMOS technique; and at least a second part of the chip which comprises non-linear crystal material and is not subjected to etching process; wherein the second part of the chip in conjunction with the first part is configured to support a propagating low loss single mode.
Optical integrated device and production method therefor
Included are an optical waveguide including a first cladding layer formed on a substrate; a core formed on the first cladding layer; and a second cladding layer formed on the first cladding layer so as to cover the core. At least one of the first cladding layer and the second cladding layer is composed of a cladding material of silicon oxide containing deuterium atoms. The number of hydrogen atoms contained in the cladding material is smaller than the number of the deuterium atoms contained in the cladding material.
OPTICAL WAVEGUIDE, OPTICAL WAVEGUIDE WITH ADHESIVE LAYER, OPTICAL WIRING COMPONENT AND ELECTRONIC DEVICE
According to the present invention, an optical waveguide includes a core layer having a first surface and a second surface having a front and back relationship with each other, the core layer including a core portion extending along a core axis and a side clad portion, a first cover layer provided on the first surface, the first cover layer having an adhesive surface on an opposite side of the core layer, and a second cover layer provided on the second surface, the second cover layer having an opposite surface on an opposite side of the core layer. The optical waveguide has a sheet shape and has a first recess portion that is open to the adhesive surface. When the adhesive surface is viewed in plan view, the first recess portion includes a first groove extending along a first axis that intersects with the core axis. The optical waveguide is used by being adhered to an adhesion target via an adhesive layer in contact with the adhesive surface.
Semiconductor light receiver
A semiconductor layer formed on a clad layer and a light absorbing layer formed on the semiconductor layer are provided. The semiconductor layer includes a p-type region and an n-type region. The p-type region, which is of p-type, is provided on a side of one side portion of the light absorbing layer in a direction perpendicular to a direction in which light is guided, and the n-type region, which is of n-type, is provided on a side of another side portion of the light absorbing layer in the direction perpendicular to the direction in which light is guided. A p-type contact layer, which is of p-type, is formed on the p-type region, and an n-type contact layer is formed on the n-type region.
MULTILAYER WAVEGUIDE GRATING COUPLER
A multilayer waveguide coupler comprising a first grating and a second grating is provided. Each first copropagating waveguide of the first grating has a first periodically modulated width. Each second copropagating waveguide of the second grating has a second periodically modulated width. The second grating is positioned so that a phase offset is present between the first periodically modulated width of the first copropagating waveguides and the second periodically modulated width of the second copropagating waveguides. The grating spaced distance and phase offset are selected so that light diffracted out of the first copropagating waveguides and the second copropagating waveguides in the first direction interferes constructively to form the first light beam and light diffracted out of the first copropagating waveguides and the second copropagating waveguides in the second direction interferes destructively.