A light flux diameter expanding element includes a light guiding plate with a light input face and a light output face, and with a thickness of 0.2 mm to 0.8 mm; a diffraction grating on the input side; and a diffraction grating on the output side, and is provided so as to have the same grating period as that of the diffraction grating on the input side, in which a forming region of the diffraction grating on the input side is smaller than that of the output side, and a grating period of the diffraction grating on the input side is a period in which a small diffraction angle in diffraction angles of +1-st order diffracted light and −1-st order diffracted light, which are diffracted in the diffraction grating on the input side, in the light guiding plate becomes larger than a critical angle of the light guiding plate.

A photonic integrated circuit chip includes vertical grating couplers defined in a first layer. Second insulating layers overlie the vertical grating coupler and an interconnection structure with metal levels is embedded in the second insulating layers. A cavity extends in depth through the second insulating layers all the way to an intermediate level between the couplers and the metal level closest to the couplers. The cavity has lateral dimensions such that the cavity is capable of receiving a block for holding an array of optical fibers intended to be optically coupled to the couplers.

A photonic integrated circuit chip includes vertical grating couplers defined in a first layer. Second insulating layers overlie the vertical grating coupler and an interconnection structure with metal levels is embedded in the second insulating layers. A cavity extends in depth through the second insulating layers all the way to an intermediate level between the couplers and the metal level closest to the couplers. The cavity has lateral dimensions such that the cavity is capable of receiving a block for holding an array of optical fibers intended to be optically coupled to the couplers.

An integrated optical structure for multiplexing and/or demultiplexing an optical signal comprises a main waveguide having two parallel side surfaces, a first waveguide which meets the main waveguide at a first region on one of the two side surfaces, and a plurality of second waveguides which meet the main waveguide at a second region on one of the two side surfaces. The second region is spaced at a determined distance from the first region. The two side surfaces are arranged at a first angle relative to an extension direction of the first waveguide and a second angle relative to extension directions of the plurality of second waveguides. The optical structure further comprises one or more waveguide extension structures. Each waveguide extension structure is arranged adjacent to one of the two side surfaces of the main waveguide at a region that is different to the first and the second region.

An integrated optical structure for multiplexing and/or demultiplexing an optical signal comprises a main waveguide having two parallel side surfaces, a first waveguide which meets the main waveguide at a first region on one of the two side surfaces, and a plurality of second waveguides which meet the main waveguide at a second region on one of the two side surfaces. The second region is spaced at a determined distance from the first region. The two side surfaces are arranged at a first angle relative to an extension direction of the first waveguide and a second angle relative to extension directions of the plurality of second waveguides. The optical structure further comprises one or more waveguide extension structures. Each waveguide extension structure is arranged adjacent to one of the two side surfaces of the main waveguide at a region that is different to the first and the second region.

A biochip device includes a waveguide, chromophore elements, a diffusing structure, and a sloping surface. The chromophore elements are disposed on a portion of the waveguide and are configured to emit fluorescence in response to excitation by guided light waves transmitted by the waveguide. The diffusing structure is configured to generate guided light waves in the waveguide when illuminated. The sloping surface is sloped relative to a plane of the waveguide and is configured to direct excitation light into the waveguide, and the sloping surface and the waveguide are configured to deflect the excitation light to the diffusing structure to generate guided light waves within the waveguide. The sloping surface may be a face of a prism attached to or integrated with the waveguide, or the sloping surface may be a chamfer formed at an edge of the waveguide.

A biochip device includes a waveguide, chromophore elements, a diffusing structure, and a sloping surface. The chromophore elements are disposed on a portion of the waveguide and are configured to emit fluorescence in response to excitation by guided light waves transmitted by the waveguide. The diffusing structure is configured to generate guided light waves in the waveguide when illuminated. The sloping surface is sloped relative to a plane of the waveguide and is configured to direct excitation light into the waveguide, and the sloping surface and the waveguide are configured to deflect the excitation light to the diffusing structure to generate guided light waves within the waveguide. The sloping surface may be a face of a prism attached to or integrated with the waveguide, or the sloping surface may be a chamfer formed at an edge of the waveguide.

A method for manufacturing a grating, a grating manufactured by the method, and an optical waveguide including the grating are provided. The method includes the following. A substrate is provided. A mask layer is formed on a surface of the substrate according to a target pattern structure of the grating, where the mask layer has a pattern structure complementary to the target pattern structure, and the pattern structure includes multiple protrusions and multiple recessed regions. A grating is formed by depositing a semiconductor material on the surface of the substrate. The semiconductor material is deposited in the multiple recessed regions of the pattern structure of the mask layer to form the target pattern structure. The mask layer is removed by lift-off. The method provided herein is simple in process and can enhance production efficiency. The manufactured grating has a relatively high refractive index and can reduce light scattering.

A method for manufacturing a grating, a grating manufactured by the method, and an optical waveguide including the grating are provided. The method includes the following. A substrate is provided. A mask layer is formed on a surface of the substrate according to a target pattern structure of the grating, where the mask layer has a pattern structure complementary to the target pattern structure, and the pattern structure includes multiple protrusions and multiple recessed regions. A grating is formed by depositing a semiconductor material on the surface of the substrate. The semiconductor material is deposited in the multiple recessed regions of the pattern structure of the mask layer to form the target pattern structure. The mask layer is removed by lift-off. The method provided herein is simple in process and can enhance production efficiency. The manufactured grating has a relatively high refractive index and can reduce light scattering.

A method includes forming a first photonic package, wherein forming the first photonic package includes patterning a silicon layer to form a first waveguide, wherein the silicon layer is on an oxide layer, and wherein the oxide layer is on a substrate; forming vias extending into the substrate; forming a first redistribution structure over the first waveguide and the vias, wherein the first redistribution structure is electrically connected to the vias; connecting a first semiconductor device to the first redistribution structure; removing a first portion of the substrate to form a first recess, wherein the first recess exposes the oxide layer; and filling the first recess with a first dielectric material to form a first dielectric region.