An optical device includes a plurality of optical waveguide units arranged in a first direction. Each of the optical waveguide units includes a first mirror having a first reflecting surface, a second mirror having a second reflecting surface facing the first reflecting surface, and at least one optical waveguide region located between the first mirror and the second mirror. The distance between the first reflecting surface and the second reflecting surface is different for each of the optical waveguide units.

A device includes an optical isolator disposed between adjacent optical waveguides along a direction. The optical isolator has vertical or horizontal dimensions that are different than at least one of the optical waveguides. The vertical and horizontal dimensions are greater than vertical and horizontal dimensions of at least one of the waveguides. In various embodiments, the structure of the optical isolator can be a planar structure, a columnar periodic structure, or a grating structure. The material of the optical isolator can be a metallic material or a dielectric material. In some embodiments, the optical isolator and the optical waveguides are used to enhance the performance of an optical multiplexing device.

A device includes an optical isolator disposed between adjacent optical waveguides along a direction. The optical isolator has vertical or horizontal dimensions that are different than at least one of the optical waveguides. The vertical and horizontal dimensions are greater than vertical and horizontal dimensions of at least one of the waveguides. In various embodiments, the structure of the optical isolator can be a planar structure, a columnar periodic structure, or a grating structure. The material of the optical isolator can be a metallic material or a dielectric material. In some embodiments, the optical isolator and the optical waveguides are used to enhance the performance of an optical multiplexing device.

An electro-optical chip includes a plurality of transmit macros, each of which includes an optical waveguide and a plurality of ring resonators positioned along the optical waveguide. An optical distribution network is implemented onboard the electro-optical chip and includes a plurality of optical inputs and a plurality of optical outputs. The optical distribution network conveys a portion of light received at a subset of the plurality of optical inputs to one or more of the plurality of optical outputs, such that light conveyed to said one or more of the plurality of optical outputs includes wavelengths of light conveyed to said subset of the plurality of optical inputs. The subset of the plurality of optical inputs includes at least two of the plurality of optical inputs. Each of the plurality of optical outputs is optically connected to the optical waveguide in a corresponding one of the plurality of transmit macros.

An optical switch includes a first bus waveguide supported by a substrate, an optical antenna suspended over the first bus waveguide via a spring, and interdigitated electrodes coupling the substrate with optical antenna and configured to control a position of the optical antenna relative to the first bus waveguide. When a voltage difference applied to the interdigitated electrodes is less than a lower threshold, the optical antenna is at a first position offset from the first bus waveguide, when the voltage difference applied to the interdigitated electrodes is greater than an upper threshold, the optical antenna is at a second position offset from the first bus waveguide, and the offset at the second position is greater than at the first position.

A photonic integrated circuit chip includes vertical grating couplers defined in a first layer. Second insulating layers overlie the vertical grating coupler and an interconnection structure with metal levels is embedded in the second insulating layers. A cavity extends in depth through the second insulating layers all the way to an intermediate level between the couplers and the metal level closest to the couplers. The cavity has lateral dimensions such that the cavity is capable of receiving a block for holding an array of optical fibers intended to be optically coupled to the couplers.

A photonic integrated circuit chip includes vertical grating couplers defined in a first layer. Second insulating layers overlie the vertical grating coupler and an interconnection structure with metal levels is embedded in the second insulating layers. A cavity extends in depth through the second insulating layers all the way to an intermediate level between the couplers and the metal level closest to the couplers. The cavity has lateral dimensions such that the cavity is capable of receiving a block for holding an array of optical fibers intended to be optically coupled to the couplers.

A display device with a transparent illuminator and an liquid crystal (LC) display panel is disclosed. The transparent illuminator includes a light source and a transparent lightguide, which may be based on a slab of transparent material with zigzag light propagation of the illuminating light in the slab and/or a transparent photonic integrated circuit with singlemode ridge waveguides for spreading the illuminating light in a plane parallel to the plane of LC display panel. The lightguide includes a plurality of grating out-couplers whose position is coordinated with positions of LC pixels for higher throughput. A reflective offset-to-angle optical element may be provided to form an image in angular domain through the LC panel and through the transparent illuminator, resulting in an overall compact and efficient display configuration.

Disclosed herein are systems and architecture for sending and receiving collimated beams directly from a photonic chip via on-chip mirror beamforming device to reduce manufacturing difficulties and optical aberrations. More specifically, an elliptical or parabolic mirror may be used in the photonic chip to collimate beams emitted from a waveguide port and to further enable techniques, such as wavefront error correction and beam steering, without moving parts.

An optical structure may be provided by forming a silicon grating structure over a dielectric material layer, depositing at least one dielectric material layer over the silicon grating structure, and depositing at least one dielectric etch stop layer over the at least one dielectric material layer. The at least one dielectric etch stop layer includes at least one dielectric material selected from silicon nitride and silicon oxynitride. A passivation dielectric layer may be formed over the at least one dielectric etch stop layer, and a patterned etch mask layer may be formed over the passivation dielectric layer. An opening may be formed through an unmasked portion of the passivation dielectric layer by performing an anisotropic etch process that etches the dielectric material selective to a silicon nitride or silicon oxynitride using the patterned etch mask layer as a masking structure. The at least one etch mask layer minimizes overetching.