With a wavelength conversion device based on a nonlinear optical effect, when arrayed waveguides including an intended nonlinear waveguide are fabricated, unwanted slab waveguides are inevitably formed. The slab waveguides can cause an erroneous measurement in the selection of a waveguide having desired characteristics from the arrayed waveguides. The erroneous measurement can lead to redoing steps for fabricating the wavelength conversion device and a decrease in the yield and inhibit the evaluation of the characteristics in selection of the waveguide and the subsequent fabrication of the wavelength conversion device from being efficiently performed. A wavelength conversion device according to the present invention includes a plurality of waveguides formed on a substrate, and a plurality of slab waveguides that are arranged substantially in parallel with and spaced apart from the plurality of waveguides, and each of the slab waveguides has a grating structure that reflects light of a particular wavelength.

An optical device includes a first mirror having a first reflecting surface and extending along a first direction, a second mirror having a second reflecting surface that faces the first reflecting surface and extending along the first direction, and an optical waveguide layer, located between the first mirror and the second mirror, that causes light to propagate along the first direction. A transmittance of the first mirror is higher than a transmittance of the second mirror. A reflection spectrum of at least either the first mirror or the second mirror with respect to light arriving from a direction normal to the reflecting surface includes, in a wavelength region in which a reflectance is higher than or equal to 90%, a local maximum point and first and second points of inflection located closer to a long-wavelength side than the local maximum point.

An optical device includes a first mirror having a first reflecting surface and extending along a first direction, a second mirror having a second reflecting surface that faces the first reflecting surface and extending along the first direction, and an optical waveguide layer, located between the first mirror and the second mirror, that causes light to propagate along the first direction. A transmittance of the first mirror is higher than a transmittance of the second mirror. A reflection spectrum of at least either the first mirror or the second mirror with respect to light arriving from a direction normal to the reflecting surface includes, in a wavelength region in which a reflectance is higher than or equal to 90%, a local maximum point and first and second points of inflection located closer to a long-wavelength side than the local maximum point.

A digital measuring device implemented on a photonic integrated circuit, the digital measuring device including a laser source implemented on the photonic integrated circuit configured to provide light, a first waveguide structure implemented on the photonic integrated circuit configured to direct a first portion of light from the laser source at a moving object and receive light reflected from the moving object, a second waveguide structure implemented on the photonic integrated circuit configured to combine a second portion of light from the laser source with the light reflected from the moving object to produce a measurement beam, a first multiplexer implemented on the photonic integrated circuit configured to split the measurement beam into a plurality of channels, and a plurality of detectors implemented on the photonic integrated circuit configured to detect an intensity value of each channel to measure a distance between the digital measuring device and the moving object.

A digital measuring device implemented on a photonic integrated circuit, the digital measuring device including a laser source implemented on the photonic integrated circuit configured to provide light, a first waveguide structure implemented on the photonic integrated circuit configured to direct a first portion of light from the laser source at a moving object and receive light reflected from the moving object, a second waveguide structure implemented on the photonic integrated circuit configured to combine a second portion of light from the laser source with the light reflected from the moving object to produce a measurement beam, a first multiplexer implemented on the photonic integrated circuit configured to split the measurement beam into a plurality of channels, and a plurality of detectors implemented on the photonic integrated circuit configured to detect an intensity value of each channel to measure a distance between the digital measuring device and the moving object.

An optical device includes a first substrate having a first surface, a second substrate having a second surface, at least one optical waveguide, and a plurality of spacers, disposed on at least either the first surface or the second surface, that include a first portion and a second portion. The first portion of the plurality of elastic spacers is at least one elastic spacer located in a region between the first substrate and the second substrate in which the first substrate and the second substrate overlap each other as seen from an angle parallel with a direction perpendicular to the first surface. The second portion of the plurality of elastic spacers is at least one elastic spacer located in a region in which the first substrate and the second substrate do not overlap each other as seen from an angle parallel with the direction perpendicular to the first surface.

An integrated wavelength division multiplexing (WDM) optical transceiver comprises the following elements: (1) a light source; (2) an array of photodiodes responsive to a plurality of optical signals and forming a plurality of electrical received information signals therefrom; and (3) a photonics integrated module (PIM) including transmission components and receiving components necessary to provide transceiver functionality. The transmission components include a demultiplexer, an electro-optic modulator array, and a multiplexer for combining a plurality of modulated optical signals onto a single output signal path as the transceiver output. The receiving components include a demultiplexer responsive to an incoming WDM signal for separating each wavelength component and creating a plurality of received optical signals.

An integrated wavelength division multiplexing (WDM) optical transceiver comprises the following elements: (1) a light source; (2) an array of photodiodes responsive to a plurality of optical signals and forming a plurality of electrical received information signals therefrom; and (3) a photonics integrated module (PIM) including transmission components and receiving components necessary to provide transceiver functionality. The transmission components include a demultiplexer, an electro-optic modulator array, and a multiplexer for combining a plurality of modulated optical signals onto a single output signal path as the transceiver output. The receiving components include a demultiplexer responsive to an incoming WDM signal for separating each wavelength component and creating a plurality of received optical signals.

A fluid detection panel is disclosed. The fluid detection panel includes a microfluidic substrate, an optical unit and a sensor. The microfluidic substrate includes a sample detection area and a comparison detection area which are arranged in parallel, and the sample detection area is configured to allow a liquid sample to arrive at the sample detection area; the optical unit is configured to provide first light and to allow the first light to be incident on both of the sample detection area and the comparison detection area; and the sensor collects the first light which passes through the sample detection area and the first light which passes through the comparison detection area.

A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of etch heights relative to the substrate. The manufacturing system performs a lithographic patterning of a photoresist deposited over the created profile in the etch-compatible film to obtain the plurality of etch heights and one or more duty cycles corresponding to the etch-compatible film deposited over the substrate.