An integrated circuit (IC) device includes an optical IC substrate, a local trench inside the optical IC substrate, and a photoelectronic element including a photoelectric conversion layer buried inside the local trench. The photoelectric conversion layer is buried inside the local trench in the optical IC substrate to form the photoelectronic element. Thus, the IC device may inhibit warpage of the optical IC substrate.

A light splitting device includes an optical waveguide body and a dispersion grating. The optical waveguide body is configured to transmit incident light to the dispersion grating, the dispersion grating is configured to disperse the incident light transmitted by the optical waveguide body into a plurality of spectral lines, and the optical waveguide body is further configured to change propagation directions of the plurality of spectral lines and to emit the plurality of spectral lines.

A nanovoided polymer-based material may include a bulk polymer material defining a plurality of nanovoids and an interfacial film disposed at an interface between each of the plurality of nanovoids and the bulk polymer material. The interfacial film may include one or more layers of material. A method of forming a nanovoided polymer-based material may include (1) forming a bulk polymer material defining a plurality of nanovoids and (2) forming an interfacial film at an interface between each of the plurality of nanovoids and the bulk polymer material. Various other methods, systems, and materials are also disclosed.

A millimeter scale weak grating coupler comprising a silicon waveguide having bars of overlay material of length (a) disposed periodically at a period (∧) adjacent the silicon waveguide whereby a uniform grating output is achieved.

A millimeter scale weak grating coupler comprising a silicon waveguide having bars of overlay material of length (a) disposed periodically at a period (∧) adjacent the silicon waveguide whereby a uniform grating output is achieved.

A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

Provided herein are systems, devices, and methods for improved optical waveguide transmission and alignment in an analytical system. Waveguides in optical analytical systems can exhibit variable and increasing back reflection of single-wavelength illumination over time, thus limiting their effectiveness and reliability. The systems are also subject to optical interference under conditions that have been used to overcome the back reflection. Novel systems and approaches using broadband illumination light with multiple longitudinal modes have been developed to improve optical transmission and analysis in these systems. Novel systems and approaches for the alignment of a target waveguide device and an optical source are also disclosed.

Provided herein are systems, devices, and methods for improved optical waveguide transmission and alignment in an analytical system. Waveguides in optical analytical systems can exhibit variable and increasing back reflection of single-wavelength illumination over time, thus limiting their effectiveness and reliability. The systems are also subject to optical interference under conditions that have been used to overcome the back reflection. Novel systems and approaches using broadband illumination light with multiple longitudinal modes have been developed to improve optical transmission and analysis in these systems. Novel systems and approaches for the alignment of a target waveguide device and an optical source are also disclosed.

An optical waveguide 15 includes a substrate 19, a core layer 12, a support 20, and a suppressing portion. The core layer 12 includes a light propagating portion 10 and a diffraction grating portion 11. The diffraction grating portion 11 includes a fine line pattern formed therein. The support 20 is made from a material having a smaller refractive index than a refractive index of the core layer 12. The support 20 supports the core layer 12 with respect to the substrate 19. The suppressing portion suppresses deformation of fine lines 13 that form the fine line pattern. The support 20 is not provided in an entire region between the light propagating portion 10 and the substrate 19 in a cross-section perpendicular to a longitudinal direction of the core layer 12 at least at a position in the longitudinal direction.