Patent classifications
G02B6/124
TECHNIQUES FOR CONTROLLING EFFECTIVE REFRACTIVE INDEX OF GRATINGS
A surface-relief structure comprises a surface-relief grating including a first material characterized by a first refractive index, a first layer of a second material having a second refractive index conformally deposited on surfaces of the surface-relief grating, and a second layer of a third material having a third refractive index conformally deposited on the first layer. The effective refractive index of the combination of the first layer and the second layer is less than, equal to, or greater than the first refractive index, thereby increasing the duty cycle and/or modifying the overall refractive index of the surface-relief structure. The first layer and the second layer are deposited using, for example, atomic layer deposition techniques.
PHOTONIC INTEGRATED CIRCUIT WITH ENCAPSULATED REFERENCE ARM
A photonic integrated circuit for an interferometric sensor includes a first waveguide called sensitive arm wherein a first portion of the light radiation is propagated, the sensitive arm being exposed to a first ambient medium and to at least one compound to be detected inducing a modification of the local refractive index perceived by the evanescent part of the electromagnetic field of the first portion of the light radiation, and a second waveguide called reference arm wherein a second portion of the light radiation is propagated, an encapsulation layer encapsulating the reference arm, the encapsulation layer being impermeable to the compound or compounds to be detected, so that the reference arm is exposed only to a second ambient medium, substantially of the same nature as the first ambient medium and without the compound to be detected and interferometric sensor comprising a photonic integrated circuit according to the invention.
MULTIPLE STAGE BRAGG GRATINGS IN MULTIPLEXING APPLICATIONS
Aspects described herein include an optical apparatus comprising at least a first Bragg grating of a first stage. The first Bragg grating is configured to transmit a first two wavelengths and to reflect a second two wavelengths of a received optical signal. The optical apparatus further comprises a second Bragg grating of a second stage. The second Bragg grating is configured to transmit one of the first two wavelengths and to reflect the other of the first two wavelengths. The optical apparatus further comprises a third Bragg grating of the second stage. The third Bragg grating is configured to transmit one of the second two wavelengths and to reflect the other of the second two wavelengths.
Optical add/drop multiplexer
An optical add/drop multiplexer (OADM) includes a drop signal separator and a drop signal reflector. The drop signal separator is coupled to a main input end and a drop end. The drop signal separator is coupled to the drop signal reflector, and the drop signal reflector is coupled to a main output end.
Optical add/drop multiplexer
An optical add/drop multiplexer (OADM) includes a drop signal separator and a drop signal reflector. The drop signal separator is coupled to a main input end and a drop end. The drop signal separator is coupled to the drop signal reflector, and the drop signal reflector is coupled to a main output end.
SLICED GRATING COUPLER WITH INCREASED BEAM ALIGNMENT SENSITIVITY
Apparatus and methods relating to coupling radiation from an incident beam into a plurality of waveguides with a grating coupler are described. A grating coupler can have offset receiving regions and grating portions with offset periodicity to improve sensitivity of the grating coupler to misalignment of the incident beam.
SLICED GRATING COUPLER WITH INCREASED BEAM ALIGNMENT SENSITIVITY
Apparatus and methods relating to coupling radiation from an incident beam into a plurality of waveguides with a grating coupler are described. A grating coupler can have offset receiving regions and grating portions with offset periodicity to improve sensitivity of the grating coupler to misalignment of the incident beam.
Low insertion loss high temperature stable fiber Bragg grating sensor and method for producing same
Provided is an optical waveguide with an inscribed Bragg grating, where the Bragg grating is stable at high temperature, has low scattering loss and high reflectivity. Also provided is a method for inscribing a Bragg grating in an optical waveguide, the method comprising irradiating the optical waveguide with electromagnetic radiation from an ultrashort pulse duration laser of sufficient intensity to cause a permanent change in an index of refraction within a core of the optical waveguide, where the irradiating step is terminated prior to erasure of a Bragg resonance, and heating the optical waveguide to a temperature and for a duration sufficient to substantially remove a non-permanent grating formed in the optical waveguide by the irradiating step.
Low insertion loss high temperature stable fiber Bragg grating sensor and method for producing same
Provided is an optical waveguide with an inscribed Bragg grating, where the Bragg grating is stable at high temperature, has low scattering loss and high reflectivity. Also provided is a method for inscribing a Bragg grating in an optical waveguide, the method comprising irradiating the optical waveguide with electromagnetic radiation from an ultrashort pulse duration laser of sufficient intensity to cause a permanent change in an index of refraction within a core of the optical waveguide, where the irradiating step is terminated prior to erasure of a Bragg resonance, and heating the optical waveguide to a temperature and for a duration sufficient to substantially remove a non-permanent grating formed in the optical waveguide by the irradiating step.
Method of making a metal grating in a waveguide and device formed
A method of making a grating in a waveguide includes forming a waveguide material over a substrate, the waveguide material having a thickness less than or equal to about 100 nanometers (nm). The method further includes forming a photoresist over the waveguide material and patterning the photoresist. The method further includes forming a first set of openings in the waveguide material through the patterned substrate and filling the first set of openings with a metal material.