An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field in an object plane into an image field in an image plane along an imaging light beam path. At least two of the mirrors are embodied as GI mirrors. Exactly one stop serves to predefine at least one section of an outer marginal contour of a pupil of the imaging optical unit. The stop is arranged spatially in front of a penultimate mirror in the imaging light beam path. This results in an imaging optical unit that is well defined with regard to its pupil and is optimized for projection lithography.

An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1 in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NA.sub.x measured in one plane from a numerical aperture NA.sub.y measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

An optical system that images a scene at two different fields of view, with switching between fields of view enabled by switchable mirrored surface is disclosed. A voltage change across the switchable mirror element generates a change in the reflection and transmission properties of the element, such that the element switches between a mirror state and a lens state. When nested in an annular reflective optic system of a given field of view, the switching element enables the opening of an additional optical path through the center of the reflective optics where a set of refractive optics are assembled into an imaging system for a second field of view. This dual field-of-view system changes field of view with no mechanical movement.

An optical system that images a scene at two different fields of view, with switching between fields of view enabled by switchable mirrored surface is disclosed. A voltage change across the switchable mirror element generates a change in the reflection and transmission properties of the element, such that the element switches between a mirror state and a lens state. When nested in an annular reflective optic system of a given field of view, the switching element enables the opening of an additional optical path through the center of the reflective optics where a set of refractive optics are assembled into an imaging system for a second field of view. This dual field-of-view system changes field of view with no mechanical movement.

An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1 in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NA.sub.x measured in one plane from a numerical aperture NA.sub.y measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

An optical system that images a scene at two different fields of view, with switching between fields of view enabled by switchable mirrored surface is disclosed. A voltage change across the switchable mirror element generates a change in the reflection and transmission properties of the element, such that the element switches between a mirror state and a lens state. When nested in an annular reflective optic system of a given field of view, the switching element enables the opening of an additional optical path through the center of the reflective optics where a set of refractive optics are assembled into an imaging system for a second field of view. This dual field-of-view system changes field of view with no mechanical movement.

An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1 in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NA.sub.x measured in one plane from a numerical aperture NA.sub.y measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.

An optical system that images a scene at two different fields of view, with switching between fields of view enabled by switchable mirrored surface is disclosed. The two fields of view vary in focal length by a factor of three. Both the wide field of view configuration and the narrow field of view configuration image broad-band short wave infrared radiation at an effective f/number of 1.4. A voltage change across the switchable mirror element generates a change in the reflection and transmission properties of the element, such that the element switches between a mirror state and a lens state. When nested in an annular reflective optic system of a given field of view, the switching element enables the opening of an additional optical path through the center of the reflective optics where a set of refractive optics are assembled into an imaging system for a second field of view. This dual field-of-view system changes field of view with no mechanical movement.

An imaging optics has at least six mirrors, which image an object field in an object plane in an image field in an image plane. An entry pupil of the imaging optics is arranged in the imaging beam path in front of the object field. At least one of the mirrors has a through-opening for the passage of imaging light. A mechanically accessible pupil, in which an obscuration stop is arranged for the central shading of the pupil of the imaging optics, is located in a pupil plane in the imaging beam path between the object field and a first of the through-openings. A first imaging part beam directly after a second mirror in the imaging beam path after the object field and a second imaging part beam directly after a fourth mirror in the imaging beam path after the object field intersect one another in an intersection region. The result is an imaging optics, in which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light is achieved.

An imaging optical unit for EUV projection lithography serves to image an object field into an image field. Mirrors guide imaging light from the object field to the image field. An aperture stop is tilted by at least 1 in relation to a normal plane which is perpendicular to an optical axis. The aperture stop has a circular stop contour. In mutually perpendicular planes, a deviation of a numerical aperture NA.sub.x measured in one plane from a numerical aperture NA.sub.y measured in the other plane is less than 0.003, averaged over the field points of the image field. What emerges is an imaging optical unit, in which homogenization of an image-side numerical aperture is ensured so that an unchanging high structure resolution in the image plane is made possible, independently of an orientation of a plane of incidence of the imaging light in the image field.