There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).

An coronagraph optical system and method for continuously imaging a wide field of view that includes the Sun. Examples of the coronagraph optical system include an all-reflective foreoptics assembly that receives light rays from a viewed scene and a direct solar image of the Sun, a sensor assembly configured to produce an image of the viewed scene, an all-reflective relay optics assembly configured to receive the light rays from the foreoptics assembly and to reflect the light rays to the sensor assembly, and a solar rejection optical component positioned between the foreoptics assembly and the relay optics assembly and dynamically configurable such that the direct solar image of the Sun is reflected away from the relay optics assembly and the light rays are reflected to the relay optics assembly while an entrance aperture of the foreoptics assembly is continuously positioned towards the Sun.

An illumination optical system is used with a reflective imaging optical system configured to form an image of a pattern arranged on a first plane onto a second plane, and is configured to illuminate an illumination area on the first plane with a light from a light source. The illumination optical system includes one or more reflecting mirrors configured to reflect the light from the light source to the first plane such that the reflected light reaches the first plane after crossing an optical path of a light which travels in the reflective imaging optical system.

An illumination optical system which is used with a reflective imaging optical system configured to form an image of a pattern arranged on a first plane onto a second plane, and which illuminates an illumination area on the first plane with a light from a light source. The illumination optical system includes one or more reflecting mirrors configured to reflect the light from the light source such that the light from the light source passes between first and second mirrors of a plurality of mirrors provided in the reflective imaging optical system, the first mirror being configured to reflect the light from the pattern first, and the second mirror being configured to reflect the light from the pattern second.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided in which an illumination field of the mask is illuminated by illumination radiation with an operating wavelength that was provided by an illumination system.

An image offsetting apparatus for producing an offset image pathway and presenting the offset image pathway to an optic, including at least some of a mirror assembly wherein the mirror assembly comprises a first component mirror and a second component mirror, wherein the mirror assembly is attached or coupled so as to provide the offset image pathway that is offset from a direct image pathway between a target object and the optic.

An optical relay system includes four or more reflective optical elements oriented in a tilted configuration. Each of the four or more reflective optical elements is tilted about one of four or more tilt axes. Further, the four or more tilt axes are oriented to correct for aberrations induced by the tilted configuration.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided in which an illumination field of the mask is illuminated by illumination radiation with an operating wavelength that was provided by an illumination system.

An coronagraph optical system and method for continuously imaging a wide field of view that includes the Sun. Examples of the coronagraph optical system include an all-reflective foreoptics assembly that receives light rays from a viewed scene and a direct solar image of the Sun, a sensor assembly configured to produce an image of the viewed scene, an all-reflective relay optics assembly configured to receive the light rays from the foreoptics assembly and to reflect the light rays to the sensor assembly, and a solar rejection optical component positioned between the foreoptics assembly and the relay optics assembly and dynamically configurable such that the direct solar image of the Sun is reflected away from the relay optics assembly and the light rays are reflected to the relay optics assembly while an entrance aperture of the foreoptics assembly is continuously positioned towards the Sun.

An imaging apparatus includes a first reflection optical system and a second reflection optical system having mutually different optical axes, each of the first and second reflection optical systems includes a plurality of reflecting surfaces, a first imaging portion configured to receive an imaging light reflected by the first reflection optical system, a second imaging portion configured to receive an imaging light reflected by the second reflection optical system, a first member, a second member, and a frame. A part of the plurality of reflecting surfaces of the first reflection optical system are reflecting surfaces provided on the frame. Among the plurality of reflecting surfaces of the first reflection optical system, a final-stage reflecting surface configured to reflect the imaging light toward the first imaging portion is a first reflecting surface formed on a surface of the first member.