An optical system including a unity magnification, finite conjugate, all-reflective image relay configured to receive optical radiation representing an input image and to relay the optical radiation via five reflections to an output image plane to provide an output image at the output image plane, the output image being a unity magnification copy of the input image. In certain examples the optical system includes foreoptics configured to produce the input image. The foreoptics and the image relay can be telecentric.

The present disclosure relates to an optical field and more particularly, to a multi-field of view (FOV) (zooming) optical assembly for a lens and may include an optical element provided in a form of a solid main optical element and including an integrated focal system with two mirrors and at least one integrated afocal system with two mirrors, a plurality of switching optical elements (SOEs) arranged on a front face of the optical element and configured to be switched between an open state in which light is transmitted and a closed state in which light is reflected and/or inhibited, and an image plane curvature correction element.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens

Beam guiding devices for guiding a laser beam, in particular in a direction towards a target region for producing extreme ultraviolet (EUV) radiation, include an adjustment device for adjusting a beam diameter and an aperture angle of the laser beam. The adjustment device includes a first mirror having a first curved reflecting surface, a second mirror having a second curved reflecting surface, a third mirror having a third curved reflecting surface, a fourth mirror having a fourth curved reflecting surface, and a movement device configured to adjust the beam diameter and the aperture angle of the laser beam by moving the first reflecting surface and the fourth reflecting surface relative to one another and, independently thereof, moving the second reflecting surface and the third reflecting surface together relative to the first reflecting surface and the fourth reflecting surface.

A radiation source apparatus includes a vessel, a laser source, a collector, a horizontal obscuration bar, and a reflective mirror. The vessel has an exit aperture. The laser source is configured to emit a laser beam to excite a target material to form a plasma. The collector is disposed in the vessel and configured to collect a radiation emitted by the plasma and to reflect the collected radiation to the exit aperture of the vessel. The horizontal obscuration bar extends from a sidewall of the vessel at least to a position between the laser source and the exit aperture of the vessel. The reflective mirror is in the vessel and connected to the horizontal obscuration bar.

A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.

A reflective relay spectrometer design based on reflective optical relay systems, which is more compact in physical size and superior in spectral imaging quality than previous designs, is disclosed.

A method for assembling a head mounted display includes providing a rigid structural frame, and forming an inner optical assembly by assembling optical components to the structural frame including at least one micro-display configured to generate an image, and at least one reflective optical component configured to direct the image to a user's eye. The method includes assembling an outer frame to the inner optical assembly to provide protection for the optical components and customization of the head-mounted display for the user.

A telescope system (100) comprises a steering minor (M5) arranged in a part of its optical path (L5-L6) between a first telescope stage (10) and a second telescope stage (20). The steering mirror (M5) is configured to controllably rotate over a rotation angle (θm) for controlling a view angle (θv) of the telescope system (100) from the entrance aperture (A1). The steering mirror (M5) is disposed at an intermediate pupil (Pi) of the telescope system (100), at which position an image of the aperture stop (As) is formed by one or more of the optical components (M7, M6) there between.

A projection optical unit for microlithography includes a plurality of mirrors and has a numerical aperture having a value larger than 0.5. The plurality of mirrors includes at least three grazing incidence mirrors, which deflect a chief ray of a central object field point with an angle of incidence of greater than 45°. Different polarized light beams passing the projection optical unit are rotated in their polarization direction by different angles of rotation. The projection optical unit includes first and second groups of mirrors. The second group of mirrors includes the final two mirrors of the plurality of mirrors at the image side. A linear portion in the pupil dependence of the total geometrical polarization rotation of the projection optical unit is less than 20% of a linear portion in the pupil dependence of the geometrical polarization rotation of the second group of mirrors.