Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

An electrochromic element is provided that includes a first substrate and a second substrate that are arranged to oppose each other, a first transparent electrode that is formed on a surface of the first substrate facing the second substrate, a second transparent electrode that is formed on a surface of the second substrate facing the first substrate, and a coloration layer that is arranged between the first transparent electrode and the second transparent electrode. The coloration layer includes an electrochromic material and an electrolyte, and a pattern or a concentration gradient of the electrochromic material is formed in at least a part of the coloration layer.

An electrochemical device is disclosed. The electrochemical device includes a first transparent conductive layer, an electrochromic layer overlying the first transparent conductive layer, a counter electrode layer overlying the electrochromic layer, a second transparent conductive layer, and a switching speed parameter of not greater than 0.68 s/mm at 23° C.

In the electrochromic device according to an embodiment of the present application, when the first voltage is applied to the electrochromic device in a state that the electrochromic element has the first state, the electrochromic device becomes the second state, and when the first voltage is applied to the electrochromic element in a state that the electrochromic element has the fourth state, the electrochromic element becomes the third state.

The embodiments herein relate to electrochromic stacks, electrochromic devices, and methods and apparatus for making such stacks and devices. In various embodiments, an anodically coloring layer in an electrochromic stack or device is fabricated to include nickel-tungsten-tin-oxide (NiWSnO). This material is particularly beneficial in that it is very transparent in its clear state.

An electrochromic structure is disclosed, which includes a first transparent non-conductive (GLASS-I) layer, a first transparent conductor (CONDUCTOR-I) layer coupled to the GLASS-I layer, an ion storage layer coupled to the CONDUCTOR-I layer, an electrolyte layer coupled to the ion storage layer, an electrochromic layer coupled to the electrolyte layer, a second transparent conductor (CONDUCTOR-II) layer coupled to the electrochromic layer, and a second transparent non-conductive (GLASS-II) layer coupled to the CONDUCTOR-II layer, wherein the electrochromic layer includes perovskite nickelates thin films formed on a transparent conductive film substrate and which has crystalline grains of the size of about 5 nm to about 200 nm resulting in intergranular porosity of about 5% to about 25%.

An electrochromic structure is disclosed, which includes a first transparent non-conductive (GLASS-I) layer, a first transparent conductor (CONDUCTOR-I) layer coupled to the GLASS-I layer, an ion storage layer coupled to the CONDUCTOR-I layer, an electrolyte layer coupled to the ion storage layer, an electrochromic layer coupled to the electrolyte layer, a second transparent conductor (CONDUCTOR-II) layer coupled to the electrochromic layer, and a second transparent non-conductive (GLASS-II) layer coupled to the CONDUCTOR-II layer, wherein the electrochromic layer includes perovskite nickelates thin films formed on a transparent conductive film substrate and which has crystalline grains of the size of about 5 nm to about 200 nm resulting in intergranular porosity of about 5% to about 25%.

Disclosed are a method of producing an electrochromic composition capable of diversifying colors, an electrochromic composition produced thereby, and an electrochromic device including the electrochromic composition. The electrochromic composition may be produced through a solution direct reaction using an electro-spray machine including two nozzles symmetrically inclined toward a central axis. The method may include preparing, respectively, a first coating composition comprising a first electrochromic compound and a second coating composition comprising a second electrochromic compound; loading, respectively, the first coating composition and the second composition into an electro-spray machine; spraying the first coating composition and the second coating composition under application of a voltage to the electro-spray device; and forming a electrochromic composition by reacting the first electrochromic compound with the second electrochromic compound during spraying.