Narrowband light filters, and methods of manufacturing such light filters, are provided. A narrowband light filter may include at least two electrically conductive bodies, an electrically conductive thin film layer disposed between the at least two electrically conductive bodies, at least one protective oxide layer disposed on the thin film layer and electrically conductive bodies, and at least one slit disposed through the electrically conductive thin layer. In various embodiments, the electrically conductive bodies give the narrowband light filter a mirrored structure in exemplary embodiments of the invention. The narrowband filters may also include one or more slits. Multiple slits may be configured to make the narrowband filtration polarization-independent. A plurality of narrowband light filters may be configured into pixel arrays. Pixel arrays may also be used in multispectral or hyperspectral imaging apparatus and techniques.

Narrowband light filters, and methods of manufacturing such light filters, are provided. A narrowband light filter may include at least two electrically conductive bodies, an electrically conductive thin film layer disposed between the at least two electrically conductive bodies, at least one protective oxide layer disposed on the thin film layer and electrically conductive bodies, and at least one slit disposed through the electrically conductive thin layer. In various embodiments, the electrically conductive bodies give the narrowband light filter a mirrored structure in exemplary embodiments of the invention. The narrowband filters may also include one or more slits. Multiple slits may be configured to make the narrowband filtration polarization-independent. A plurality of narrowband light filters may be configured into pixel arrays. Pixel arrays may also be used in multispectral or hyperspectral imaging apparatus and techniques.

Provided is a method for manufacturing a color filter substrate including a base substrate, a black matrix layer and a plurality of color pixel units, and the color pixel unit including sub-pixel units of at least three colors. The method for manufacturing a color filter substrate includes: providing a base substrate; and forming a black matrix layer and the plurality of color pixel units on the base substrate, wherein the forming of the plurality of color pixel units includes: depositing an irreversible temperature-change material on the base substrate; and heating the irreversible temperature-change material to form sub-pixel units of at least two colors in the color pixel unit.

Provided is a method for manufacturing a color filter substrate including a base substrate, a black matrix layer and a plurality of color pixel units, and the color pixel unit including sub-pixel units of at least three colors. The method for manufacturing a color filter substrate includes: providing a base substrate; and forming a black matrix layer and the plurality of color pixel units on the base substrate, wherein the forming of the plurality of color pixel units includes: depositing an irreversible temperature-change material on the base substrate; and heating the irreversible temperature-change material to form sub-pixel units of at least two colors in the color pixel unit.

A method of fabricating a color filter array including providing substrate, forming a multilevel structure that is attached to the substrate, etching the multilevel structure to expose first wells in the multilevel structure, filling at least the first wells in the multilevel structure with the first color component, curing the first color component, etching the multilevel structure to expose second wells in the multilevel structure, filling at least the second wells in the multilevel structure with a second color component, and curing the second color component.

A method of fabricating a color filter array including providing substrate, forming a multilevel structure that is attached to the substrate, etching the multilevel structure to expose first wells in the multilevel structure, filling at least the first wells in the multilevel structure with the first color component, curing the first color component, etching the multilevel structure to expose second wells in the multilevel structure, filling at least the second wells in the multilevel structure with a second color component, and curing the second color component.

Provided is a method for manufacturing a color filter substrate including a base substrate, a black matrix layer and a plurality of color pixel units, and the color pixel unit including sub-pixel units of at least three colors. The method for manufacturing a color filter substrate includes: providing a base substrate; and forming a black matrix layer and the plurality of color pixel units on the base substrate, wherein the forming of the plurality of color pixel units includes: depositing an irreversible temperature-change material on the base substrate; and heating the irreversible temperature-change material to form sub-pixel units of at least two colors in the color pixel unit.

Provided is a method for manufacturing a color filter substrate including a base substrate, a black matrix layer and a plurality of color pixel units, and the color pixel unit including sub-pixel units of at least three colors. The method for manufacturing a color filter substrate includes: providing a base substrate; and forming a black matrix layer and the plurality of color pixel units on the base substrate, wherein the forming of the plurality of color pixel units includes: depositing an irreversible temperature-change material on the base substrate; and heating the irreversible temperature-change material to form sub-pixel units of at least two colors in the color pixel unit.

Narrowband light filters, and methods of manufacturing such light filters, are provided. A narrowband light filter may include at least two electrically conductive bodies, an electrically conductive thin film layer disposed between the at least two electrically conductive bodies, at least one protective oxide layer disposed on the thin film layer and electrically conductive bodies, and at least one slit disposed through the electrically conductive thin layer. In various embodiments, the electrically conductive bodies give the narrowband light filter a mirrored structure in exemplary embodiments of the invention. The narrowband filters may also include one or more slits. Multiple slits may be configured to make the narrowband filtration polarization-independent. A plurality of narrowband light filters may be configured into pixel arrays. Pixel arrays may also be used in multispectral or hyperspectral imaging apparatus and techniques.

Narrowband light filters, and methods of manufacturing such light filters, are provided. A narrowband light filter may include at least two electrically conductive bodies, an electrically conductive thin film layer disposed between the at least two electrically conductive bodies, at least one protective oxide layer disposed on the thin film layer and electrically conductive bodies, and at least one slit disposed through the electrically conductive thin layer. In various embodiments, the electrically conductive bodies give the narrowband light filter a mirrored structure in exemplary embodiments of the invention. The narrowband filters may also include one or more slits. Multiple slits may be configured to make the narrowband filtration polarization-independent. A plurality of narrowband light filters may be configured into pixel arrays. Pixel arrays may also be used in multispectral or hyperspectral imaging apparatus and techniques.