A chemically amplified resist composition comprising (A) a polymer adapted to increase its solubility in alkaline aqueous solution under the action of acid, (B) a photoacid generator capable of generating an acid upon exposure to KrF excimer laser, ArF excimer laser, EB or EUV, and (C) a quencher in the form of an amine compound of specific structure is provided. The resist composition has a high sensitivity and forms a pattern with a high resolution and improved LWR or CDU, independent of whether it is of positive or negative tone.

Provided are a near-infrared absorbing photosensitive composition including at least one oxocarbon compound selected from a compound represented by Formula (SQ1) or a compound represented by Formula (CR1), a polymerizable compound, a photopolymerization initiator, and a solvent; a cured film formed of the near-infrared absorbing photosensitive composition; an optical filter; a method for forming a pattern; a laminate; a solid-state imaging element; an image display device; and an infrared sensor. In Formula (SQ1), Rs.sup.1 and Rs.sup.2 each independently represent a monovalent organic group. In Formula (CR1), Rc.sup.1 and Rc.sup.2 each independently represent a monovalent organic group. ##STR00001##

A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1′); a resin including a structural unit having an acid-dissociable group; and a solvent. E.sup.A is a substituted or unsubstituted (α+β)-valent organic group having 1 to 40 carbon atoms; Z.sup.+ is a monovalent radiation-sensitive onium cation; and α and β are each independently 1 or 2.

##STR00001##

A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, and a solvent. The resin includes a structural unit A represented by formula (1) and a structural unit B having an acid-dissociable group. The structural unit represented by the formula (1) is excluded from the structural unit B. In the formula (1), A is a monovalent aromatic hydrocarbon group in which —OR.sup.Y is bonded to a carbon atom adjacent to a carbon atom to which L.sup.α is bonded, and hydrogen atoms on other carbon atoms are unsubstituted, or a part or all of the hydrogen atoms are substituted with a cyano group, a nitro group, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxycarbonyloxy group, an acyl group, or an acyloxy group.

##STR00001##

A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, and a solvent. The resin includes a structural unit A represented by formula (1) and a structural unit B having an acid-dissociable group. The structural unit represented by the formula (1) is excluded from the structural unit B. In the formula (1), A is a monovalent aromatic hydrocarbon group in which —OR.sup.Y is bonded to a carbon atom adjacent to a carbon atom to which L.sup.α is bonded, and hydrogen atoms on other carbon atoms are unsubstituted, or a part or all of the hydrogen atoms are substituted with a cyano group, a nitro group, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxycarbonyloxy group, an acyl group, or an acyloxy group.

##STR00001##

A radiation-sensitive resin composition includes a solvent and an onium salt compound having a structure represented by formula (1). R.sup.f1 and R.sup.f2 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R.sup.1 represents a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, and R.sup.7 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. n.sub.1+n.sub.2 is an integer of 2 to 8. n.sub.3 represents an integer of 0 to 5. X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom. Each * represents a bond with another structure. Z.sup.+ represents a monovalent radiation-sensitive onium cation.

##STR00001##

A radiation-sensitive resin composition includes a solvent and an onium salt compound having a structure represented by formula (1). R.sup.f1 and R.sup.f2 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R.sup.1 represents a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, and R.sup.7 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. n.sub.1+n.sub.2 is an integer of 2 to 8. n.sub.3 represents an integer of 0 to 5. X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom. Each * represents a bond with another structure. Z.sup.+ represents a monovalent radiation-sensitive onium cation.

##STR00001##

Provide are a composition with which a pattern (patterned cured film) with excellent light shielding properties and suppressed undercut can be formed; a light shielding film; a solid-state imaging element; an image display device; and a method for manufacturing a cured film.

The composition includes carbon black, barium sulfate, one or more kinds selected from the group consisting of copper phthalocyanine and a copper phthalocyanine derivative, an acid generator, and a crosslinking agent having a crosslinkable group which is crosslinked by an acid.

Provided is an on-press development type lithographic printing plate precursor having two or more maximal absorption wavelengths in a wavelength range of 760 nm to 900 nm, in which in a case where the on-press development type lithographic printing plate precursor is subjected to exposure to infrared having a wavelength of 830 nm at an energy density of 110 mJ/cm.sup.2, in a portion subjected to the exposure, a brightness change ΔL before the exposure and after storage subsequent to the exposure for 24 hours under conditions of 25° C. and 70% RH is 3.0 or more. Also provided are a method of preparing a lithographic printing plate and a lithographic printing method in which the on-press development type lithographic printing plate precursor is used.

Provided are: a water-soluble composition which has excellent storage stability and is adaptable to a wide range of light sources and capable of forming a highly fine pattern; a method of producing a cured product of the same; a cured product of the same; and an acylphosphinate. The water-soluble composition contains: an acylphosphinate (A) represented by Formula (I) below, wherein X.sup.1 represents an aryl group having 6 to 15 carbon atoms; X.sup.2 represents a linear alkyl group having 1 to 8 carbon atoms or the like; A.sup.m+ represents an alkali metal ion or the like; and m represents a number of 1 to 3; and a compound (B) having a group represented by Formula (II) below, wherein R.sup.1 represents a hydrogen atom or the like; Z.sup.1 represents an oxygen atom or the like; R.sup.2 represents a hydrogen atom or the like; Z.sup.2 represents an alkylene group having 1 to 6 carbon atoms; n represents a number of 0 to 30; * means a bond; and, when the compound (B) has plural groups represented by Formula (II), plural R.sup.1′s, Z.sup.1′s, Z.sup.2′s and n's are each optionally the same or different. ##STR00001##