A lithographic printing plate precursor including an image recording layer containing an infrared absorber represented by Formula I, on a support, and a method of producing a lithographic printing plate and a lithographic printing method using the lithographic printing plate precursor. ##STR00001##

The present application relates to a compound of Chemical Formula 1, a binder resin, a negative-type photosensitive resin composition, and a display apparatus including a black bank formed using the same.

Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.

Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.

A radiation-sensitive resin composition includes a polymer and a compound. The compound includes a first structural unit including an aromatic carbon ring to which no less than two hydroxy groups bond, and a second structural unit including an acid-labile group which is dissociable by an action of an acid to give a carboxy group. The compound is represented by formula (1). R.sup.1 represents a monovalent organic group having 1 to 30 carbon atoms; and X.sup.+ represents a monovalent radiation-sensitive onium cation. A weight average molecular weight of the polymer is no greater than 10,000.

R.sup.1—COO.sup.−X.sup.+  (1)

A radiation-sensitive resin composition includes a polymer and a compound. The compound includes a first structural unit including an aromatic carbon ring to which no less than two hydroxy groups bond, and a second structural unit including an acid-labile group which is dissociable by an action of an acid to give a carboxy group. The compound is represented by formula (1). R.sup.1 represents a monovalent organic group having 1 to 30 carbon atoms; and X.sup.+ represents a monovalent radiation-sensitive onium cation. A weight average molecular weight of the polymer is no greater than 10,000.

R.sup.1—COO.sup.−X.sup.+  (1)

The present invention relates to radiation curable compositions, comprising (A1) at least one water-soluble reactive diluent (A1); (A2) at least one water-soluble reactive oligomer (A2); (B) at least one reactive component selected from the group consisting of a water insoluble reactive diluent (B1a), a slightly water-soluble reactive diluent (B1b) and a water insoluble, or slightly water-soluble reactive oligomer (B2); and (C) optionally a photoinitiator (C), wherein the amount of component (A1) and (A2) is greater than 20% by weight, especially 30% by weight based on the amount of components (A1), (A2), (B1a), (B1b) and (B2) and the amount of components (B1a), (B1b) and (B2) is greater than 10% by weight, especially 20% by weight based on the amount of components (A1), (A2), (B1a), (B1b) and (B2); radiation curable composition, comprising (A1′) at least one slightly water-soluble reactive diluent (B1b); (A2) at least one water-soluble reactive oligomer (A2); (B) at least one reactive component selected from the group consisting of a water insoluble reactive diluent (B1a) and a water insoluble, or slightly water-soluble reactive oligomer (B2); and (C) optionally a photoinitiator (C), wherein the amount of component (B1b) and (A2) is greater than 40% by weight, especially 50% by weight based on the amount of components (A2), (B1a), (B1b) and (B2) and the amount of components (B1a), (B1b) and (B2) is greater than 10% by weight, especially 20% by weight based on the amount of components (A2), (B1a), (B1b) and (B2). The radiation curable compositions can be cleaned by pure water with no assistance of any solvent or detergent. The printed three-dimensional products have clean, smooth, tack-free surface after washing with water and sufficient post-curing. The fully cured three-dimensional products are high-temperature resistant and have excellent mechanical performance above glass transition temperature, e.g. 200° C.

A lithographic printing plate precursor having an image-recording layer on a hydrophilic support, in which the image-recording layer includes an organic polymer particle, and the organic polymer particle is a reaction product obtained by at least reacting an aromatic polyvalent isocyanate compound having a structure represented by Formula PO and water, a method for making a lithographic printing plate having excellent printing resistance in the case of using an ultraviolet-curable ink in printing, a new organic polymer particle, and a resin composition including the organic polymer particle. ##STR00001##

A resist composition comprising a sulfonium salt having an acid labile group of aromatic ring-containing tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.

A resist composition comprising a sulfonium salt having an acid labile group of aromatic ring-containing tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.