Patent classifications
G03F7/035
Photosensitive resin composition and use thereof
In order to provide (A) a photosensitive resin composition which (i) obtains an excellent tack-free property after being applied and dried, (ii) can be subjected to fine processing so as to have photosensitivity, (iii) prepares a cured film having excellent flexibility, flame retardancy, and electrical insulation reliability, and (iv) has small warpage after being cured, (B) a resin film, (C) an insulating film, and (D) an printed wiring board provided with an insulating film, the photosensitive resin composition containing at least (A) binder polymer; (B) cross-linked polymer particles, whose polymer has a urethane bond in its molecule; (C) thermosetting resin; and (D) photo-polymerization initiator is used.
Photosensitive resin composition and use thereof
In order to provide (A) a photosensitive resin composition which (i) obtains an excellent tack-free property after being applied and dried, (ii) can be subjected to fine processing so as to have photosensitivity, (iii) prepares a cured film having excellent flexibility, flame retardancy, and electrical insulation reliability, and (iv) has small warpage after being cured, (B) a resin film, (C) an insulating film, and (D) an printed wiring board provided with an insulating film, the photosensitive resin composition containing at least (A) binder polymer; (B) cross-linked polymer particles, whose polymer has a urethane bond in its molecule; (C) thermosetting resin; and (D) photo-polymerization initiator is used.
PHOTOSENSITIVE RESIN COMPOSITION AND ADHESIVES COMPOSITION
A photosensitive resin composition comprises a polymer having a repeating structural unit of the following Formula (1):
##STR00001##
(wherein R.sub.1 and R.sub.2 are each independently a single bond, a methylene group, or an ethylene group, Y is an alkylene group of Formula (2) or a combination of the alkylene group of Formula (2) with an alkylene group of Formula (3), n is an integer of 1 to 110, and X is a divalent aliphatic hydrocarbon group, a divalent alicyclic hydrocarbon group, or a divalent aromatic hydrocarbon group) and a (meth)acryloyl group at both ends, a bifunctional (meth)acrylate compound, a polyfunctional thiol compound, a photo-radical generator and an organic solvent, and then the bifunctional (meth)acrylate compound contained in an amount of 5% to 50% by mass and the polyfunctional thiol compound is contained in an amount of 0.1% to 10% by mass, relative to the content of the polymer.
Holographic media with improved light sensitivity
The present invention provides a novel photopolymer formulation comprising matrix polymers, writing monomer and a photoinitiator and further comprising a compound of formula (1) ##STR00001##
where A.sup.1, A.sup.2 and A.sup.3 are each independently hydrogen, fluorine, chlorine, bromine or iodine, R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are each independently hydrogen, halogen, cyano, nitro, amino, alkylimino, azide, isonitrile, enamino, formyl, acyl, carboxyl, carboxylate, carboxamide, orthoester, sulphonate, phosphate, organosulphonyl, organosulphoxidyl, optionally fluorinated alkoxy or an optionally substituted aromatic, heteroaromatic, aliphatic, araliphatic, olefinic or acetylenic radical while suitable radicals may be connected together via bridge of any desired substitution, or in that two or more compounds of formula (I) may be connected together via at least one of the radicals R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5, in which case these radicals therein constitute a 2- to 4-tuply functional bridge, with the proviso that at least one of the radicals R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 is not hydrogen. Further subjects of the invention are a photopolymer comprising matrix polymers, a writing monomer and photoinitiator, a holographic medium comprising a photopolymer formulation of the present invention or being obtainable by use thereof, the use of a holographic medium of the present invention and also a process for producing a holographic medium by using a photopolymer formulation of the present invention.
Holographic media with improved light sensitivity
The present invention provides a novel photopolymer formulation comprising matrix polymers, writing monomer and a photoinitiator and further comprising a compound of formula (1) ##STR00001##
where A.sup.1, A.sup.2 and A.sup.3 are each independently hydrogen, fluorine, chlorine, bromine or iodine, R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are each independently hydrogen, halogen, cyano, nitro, amino, alkylimino, azide, isonitrile, enamino, formyl, acyl, carboxyl, carboxylate, carboxamide, orthoester, sulphonate, phosphate, organosulphonyl, organosulphoxidyl, optionally fluorinated alkoxy or an optionally substituted aromatic, heteroaromatic, aliphatic, araliphatic, olefinic or acetylenic radical while suitable radicals may be connected together via bridge of any desired substitution, or in that two or more compounds of formula (I) may be connected together via at least one of the radicals R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5, in which case these radicals therein constitute a 2- to 4-tuply functional bridge, with the proviso that at least one of the radicals R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 is not hydrogen. Further subjects of the invention are a photopolymer comprising matrix polymers, a writing monomer and photoinitiator, a holographic medium comprising a photopolymer formulation of the present invention or being obtainable by use thereof, the use of a holographic medium of the present invention and also a process for producing a holographic medium by using a photopolymer formulation of the present invention.
COMPOSITION FOR FORMING INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, METHOD FOR FORMING INTERLAYER INSULATING FILM PATTERN, AND DEVICE
A composition for forming an interlayer insulating film including a polymerizable monomer, an imide compound represented by general formula (z-1), a reaction promoter which promotes the polymerization of the polymerizable monomer and the imide compound, and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R.sup.1 and R.sup.2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R.sub.Z.sup.00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, R.sub.z.sup.01 and R.sub.z.sup.02 represent an alkyl group or an alkoxy group, and n.sub.1 and n.sub.2 are 0 or 1.
##STR00001##
COMPOSITION FOR FORMING INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, METHOD FOR FORMING INTERLAYER INSULATING FILM PATTERN, AND DEVICE
A composition for forming an interlayer insulating film including a polymerizable monomer, an alkali-soluble elastomer containing a polymerizable group, an imide compound represented by general formula (z-1), and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R.sup.1 and R.sup.2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R.sub.z.sup.00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, R.sub.z.sup.01 and R.sub.z.sup.02 represent an alkyl group or an alkoxy group, and n.sub.1 and n.sub.2 are 0 or 1.
##STR00001##
Process for the manufacturing of triaryl-organo borates
The invention relates to a process for the preparation of triaryl-organo borates from boronic ester and the use of these substances in photo initiator systems, photopolymer compositions comprising such photo initiator systems, a holographic medium comprising said photopolymer composition and the respective hologram.
RESIN COMPOSITION AND USE THEREOF
A resin composition and a use thereof are provided. The resin composition includes, in parts by weight, 100 parts of an alkali-soluble resin, 5-30 parts of acrylate monomers, 0.1-10 parts of photoinitiator, 10-30 parts of a first epoxy resin and 0-15 parts of a second epoxy resin. The first epoxy resin is a low-dielectric epoxy resin with a dielectric constant of <3.5 and the second epoxy resin is different from the first epoxy resin. With the addition of the low epoxy resin with the dielectric constant of >3.5, and by adjusting the ratio of the components, the resin composition significantly reduces the dielectric constant and dielectric loss, the dielectric constant is reduced to 3.0 or less, and the dielectric loss is reduced to 0.008 or less.
Photopolymer formulations for producing holographic media having highly crosslinked matrix polymers
The invention relates to a photopolymer formulation comprising a polyol component, a polyisocyanate component, a writing monomer, and a photoinitiator, containing a coinitiator and a dye having the formula F An, where F stands for a cationic dye and An″ stands for an anion, wherein the dye having the formula F An comprises a water absorption of =5%. The invention further relates to a holographic medium, in particular in the form of a film, containing a photopolymer formulation according to the invention, to the use of such a medium for recording holograms, and to a special dye that can be used in the photopolymer formulation according to the invention.