A photosensitive conductive paste includes a quaternary ammonium salt compound (A), a carboxyl group-containing resin (B), a photopolymerization initiator (C), a reactive monomer having an unsaturated double bond (D) and conductive particles (E). The photosensitive conductive paste exhibits conductivity at low temperature within a short time and is capable of forming fine wiring with excellent adhesion to ITO and bending resistance after being exposed to high-temperature and high-humidity environments by a photolithography method; and a film forms a conductive pattern.

A photosensitive conductive paste includes a quaternary ammonium salt compound (A), a carboxyl group-containing resin (B), a photopolymerization initiator (C), a reactive monomer having an unsaturated double bond (D) and conductive particles (E). The photosensitive conductive paste exhibits conductivity at low temperature within a short time and is capable of forming fine wiring with excellent adhesion to ITO and bending resistance after being exposed to high-temperature and high-humidity environments by a photolithography method; and a film forms a conductive pattern.

The present invention relates to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the hologram recording medium.

The present invention relates to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the hologram recording medium.

Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent. Further, provided are a method of producing the positive type lithographic printing plate precursor and a method of preparing a lithographic printing plate using the positive type lithographic printing plate precursor.

Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent. Further, provided are a method of producing the positive type lithographic printing plate precursor and a method of preparing a lithographic printing plate using the positive type lithographic printing plate precursor.

A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.

A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.

The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which contain at least one softener which are selected according to the claimed method. The invention also relates to the use of photopolymer formulations for producing holographic media.

The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which contain at least one softener which are selected according to the claimed method. The invention also relates to the use of photopolymer formulations for producing holographic media.