Provided is a precursor for lithographic printing having excellent printing durability and ink repellency as well as high reproducibility of the high definition images. The precursor for lithographic printing includes, at least a heat sensitive layer and an ink repellent layer wherein the ink repellent layer has an elastic modulus of the plate surface under the surface load of 14000 N/m2 of at least 25 MPa and up to 35 MPa.

The present invention provides a photosensitive resin composition and a cured film prepared therefrom. The photosensitive resin composition includes a mixture of two or more siloxane polymers having different dissolution rates with respect to an aqueous solution of tetramethylammonium hydroxide. The composition keeps high transparency and high sensitivity, which are advantages of a composition containing a siloxane polymer, and has excellent chemical resistance, thereby providing a cured film having excellent stability in a post-processing.

A resin composition including a polysiloxane (A) and a solvent (B), wherein the polysiloxane (A) contains at least one partial structure represented by any of the general formulae (1) to (3), and the relationship between the film thickness X and the film thickness Y, which respectively represent the thickness of a film produced by application of the resin composition and subsequent drying at 100 C. for 3 minutes and the thickness of the film after subsequent heating at 230 C. for 5 minutes, satisfies the following inequation: (XY)/x0.05. The resin composition exhibits excellent coating properties on rugged surface and has excellent planarization properties even if the resin composition is in a form of thin film.

##STR00001##

(R.sup.1 represents a single bond or a C.sub.1-4 alkyl group; R.sup.2 represents a C.sub.1-4 alkyl group; and R.sup.3 represents an organic group.)

A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.

[Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.

The present disclosure provides a light-diffusion powder, a quantum-dot-containing photoresist, and a quantum-dot-containing color film, and their preparation methods. The light-diffusion powder is obtained from an alkoxysilane having a chemical structure represented by formula (I): ##STR00001##
where R.sub.1 includes a C1C50 alkyl group, and R includes one or more of an alkyl and a substituted alkyl group.

A polymer of a polyimide precursor which includes a structural unit represented by the following general formula (7),

##STR00001##

where X.sub.1 represents a tetravalent organic group, X.sub.2 represents a divalent organic group, and R.sub.1 represents a group represented by the following general formula (2),

##STR00002##

where the dotted line represents a bonding, Y.sub.1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, k represents 1, 2 or 3, and n represents 0 or 1.

Provided is a silicone chain-containing polymer functioning as a leveling agent giving high smoothness to a coating film. Specifically, provided is a silicone chain-containing polymer containing, as a polymeric component, at least a polymerizable monomer (1) having a group represented by General Formula (A) below and a polymerizable monomer (2) having a group containing a polyester chain:

wherein R.sup.11 are each independently a C.sub.1-6 alkyl group or a group represented by OSi(R.sup.14).sub.3 (R.sup.14 are each independently a C.sub.1-3 alkyl group), R.sup.12 are each independently a C.sub.1-6 alkyl group, R.sup.13 is a C.sub.1-6 alkyl group, and x is an integer of 0 or more.

##STR00001##

Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

A planographic printing plate precursor includes: a hydrophilic support; and an image recording layer which contains an organic-inorganic hybrid particle (A) and an infrared-ray absorbent (B) on the hydrophilic support, and the organic-inorganic hybrid particle (A) is an organic-inorganic hybrid particle in which an inorganic particle (a) containing a hydroxyl group and an organic component (b) are linked to each other through a linking group (c) having a urethane bond or a urea bond.