A method is used to provide electrically-conductive silver metal from a photosensitive thin film or photosensitive thin film pattern on a substrate using a non-hydroxylic-solvent soluble silver complex represented by the following formula (I):

(Ag.sup.+).sub.a(L).sub.b(P).sub.c(I)

wherein L represents an -oxy carboxylate; P represents a primary alkylamine; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. A photosensitizer can also be present with the complex. The reducible silver ions in the photosensitive thin film or photosensitive thin film pattern photochemically can be reduced to provide electrically-conductive silver metal by irradiation with UV-visible electromagnetic radiation.

A spacer wafer for a wafer-level camera, a wafer-level camera including the spacer wafer and a method of manufacturing a spacer wafer include a layer of photoresist being formed over a substrate, the layer of photoresist being exposed to radiation through a mask that defines a spacer geometry for at least one wafer-level camera element. The layer photoresist is developed, such that the layer of photoresist is the spacer wafer for the wafer-level camera.

An object of the invention is to provide a photosensitive laminate in which two or more layers can be collectively patterned, a transfer material, a patterned photosensitive laminate, a method for manufacturing the patterned photosensitive laminate, a touch panel, and an image display device. According to the invention, there are provided a photosensitive laminate in which a first resin layer, an interlayer, and a second resin layer are laminated on a support in this order, at least one of the first resin layer or the second resin layer includes 20 mass % or greater of inorganic particles, and exposure sensitivity of the second resin layer is higher than that of the first resin layer, a transfer material, a patterned photosensitive laminate, a method for manufacturing the patterned photosensitive laminate, a touch panel, and an image display device.

The present invention relates to a photosensitive multilayer resin film including: a first resin composition layer; and a second resin composition layer. The first resin composition layer and the second resin composition layer each contain a compound (A) having an ethylenically unsaturated group, a thermosetting resin (B), a photopolymerization initiator (C), and an inorganic filler (D). The second resin composition layer further contains a fluorine-containing resin (E). A fluorine atom concentration in the first resin composition layer is lower than a fluorine atom concentration in the second resin composition layer.

The invention relates to a method and a device for the exposure of a photosensitive coating.