The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.

A display substrate, a method for preparing the same and a display device are provided. The method for preparing the display substrate includes: providing a base substrate, in which the base substrate includes a first region and a second region; forming a first structure in the first region using a first mask and a first photoresist; forming a functional material layer at a side, which is away from the base substrate, of the first structure; and patterning the functional material layer using a second mask and the first mask to form a functional layer in the second region.

The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.

The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.

Coating compositions comprise: a curable compound comprising: a core chosen from a C.sub.6 carbocyclic aromatic ring, a C.sub.2-5 heterocyclic aromatic ring, a C.sub.9-30 fused carbocyclic aromatic ring system, a C.sub.4-30 fused heterocyclic aromatic ring system, C.sub.1-20 aliphatic, and C.sub.3-20 cycloaliphatic, and three or more substituents of formula (1)

##STR00001##

wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein: Ar.sup.1 is chosen from a C.sub.6 carbocyclic aromatic ring, a C.sub.2-5 heterocyclic aromatic ring, a C.sub.9-30 fused carbocyclic aromatic ring system, and a C.sub.4-30 fused heteroocyclic aromatic ring system; Z is a substituent independently chosen from OR.sup.1, protected hydroxyl, carboxyl, protected carboxyl, SR.sup.1, protected thiol, —O—C(═O)—C.sub.1-6 alkyl, halogen, and NHR.sup.2; wherein each R.sup.1 is independently chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, and C.sub.5-30 aryl; each R.sup.2 is independently chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, C.sub.5-30 aryl, C(═O)—R.sup.1, and S(═O).sub.2—R.sup.1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar.sup.1; and * denotes the point of attachment to the core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

A protective film formation composition contains a polymer having a unit structure represented by formula (1-1), a compound or a polymer having phenolic hydroxy group other than catechol, (C) a thermal acid generator, and (D) a solvent.

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(Ar represents a benzene, naphthalene, or an anthracene ring; R1 represents a hydroxy, mercapto,amino, halogeno, or an alkyl group that has 1-10 carbon atoms and that may be substituted or interrupted by a hetero atom and may be substituted by a hydroxy group; n1 represents an integer of 0-3; L1 represents a single bond or an alkylene group having 1-10 carbon atoms; E represents an epoxy group; when n2=1, T1 represents a single bond or an alkylene group having 1-10 carbon atoms and may be interrupted by an ether bond, an ester bond, or an amide bond; and when n2=2, T1 represents a nitrogen atom or an amide bond.)

Method and apparatus for improved and efficient spacer assisted lithography-etch-lithography etch (SALELE) processes that utilize a spin-on-material layer, where the spin-on-material layer fills gaps between spacers to protect line-end to line-end spaces created by a cut shape. The method and structures also include a final resist layer with varying critical dimensions (CDs). The use of the spin-on-material enables back end of line (BEOL) metal designs with continuous line-end to line-end spacing above a minimum that can be patterned with a cut mask and spacer only process.

Flexographic printing members amenable to aqueous (or organic) development do not exhibit the deleterious effects on printing performance characteristic of some conventional alternatives. Embodiments of the invention utilize a photopolymerizable layer comprising, consisting of, or consisting essentially of a photopolymerization initiator and a water-dilutable (but not water-soluble) monomer.

A composition for forming an organic film, including: a compound represented by the following general formula (1); and an organic solvent, wherein in the general formula (1), X represents any one group of X1 to X3 represented by the following general formulae (2), (3), and (5), and two or more kinds of X are optionally used in combination, wherein in the general formula (3), W represents a carbon atom or a nitrogen atom; “n1” represents 0 or 1; “n2” represents an integer of 1 to 3; and R.sub.1 independently represents any one of groups represented by the following general formula (4), and wherein in the general formula (5), R.sub.2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and R.sub.3 represents any one of the following groups.

##STR00001## ##STR00002##

A method for exposing a photopolymerization layer comprising photopolymers includes: providing a printed circuit board, with a photopolymerization layer disposed on the top side of the printed circuit board; performing first-instance exposure on the photopolymerization layer, using a UV source and a digital micro-lens device, wherein the UV source is of a power less than 0.2 kW; stopping the first-instance exposure; covering the photopolymerization layer with a mask, with the mask having a bottom side in contact with the photopolymerization layer; and performing second-instance exposure on the photopolymerization layer, using a mercury lamp and the mask, wherein the mercury lamp is of a power greater than 5 kW.