A black positive-type photosensitive resin composition with high sensitivity is provided. The photosensitive resin composition of the invention includes (A) a binder resin, (B) a quinonediazide adduct of a phenol compound having 3 or more phenolic hydroxyl groups (hereunder also referred to as trivalent or greater phenol compound, and (C) a black coloring agent, wherein the quinonediazide adduct (B) includes (b1) a quinonediazide adduct wherein one of the hydroxyl groups of the phenolic hydroxyl groups of the trivalent or greater phenol compound is replaced by a structure represented by formula (I) or formula (II), and (b2) a quinonediazide adduct wherein two of the hydroxyl groups of the phenolic hydroxyl groups of the trivalent or greater phenol compound are replaced by structures represented by formula (I) or formula (II), and the total of (b1) and (b2) is at least 60 mol % of the entirety of (B). R.sup.a to R.sup.d and * in the formulas are as defined in the Specification.

##STR00001##

The invention relates to a radiation-curable mixture for generating relief structures, comprising a) at least one functionalized, part-hydrolyzed polyvinyl acetate comprising (i) vinyl alcohol units, (ii) vinyl acetate units, and (iii) vinyl acrylate units, where the vinyl acrylate units, which can be substituted, have the general structure

##STR00001## where R is hydrogen or a linear or branched aliphatic or heteroaliphatic radical having 1 to 12 carbon atoms, or a cycloaliphatic, heterocyclic or aromatic radical having 3 to 12 carbon atoms, as component A, b) at least one initiator as component B, c) at least one ethylenically unsaturated compound different from component A, as component C, d) one or more adjuvants as component D, wherein the amount of vinyl acrylate units (iii) in the functionalized, part-hydrolyzed polyvinyl acetate a), based on all the units (i), (ii), and (iii), is 0.1 to <3 mol %, and component D comprises an additive capable of hydrogen bonding, in an amount of 0.001 to 30 wt %, based on the sum of components A to D.

Coating compositions comprise: a curable compound comprising: a core chosen from a C.sub.6 carbocyclic aromatic ring, a C.sub.2-5 heterocyclic aromatic ring, a C.sub.9-30 fused carbocyclic aromatic ring system, a C.sub.4-30 fused heterocyclic aromatic ring system, C.sub.1-20 aliphatic, and C.sub.3-20 cycloaliphatic, and three or more substituents of formula (1) ##STR00001##
wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.

The invention relates to a radiation-curable mixture for generating relief structures, comprising a) at least one functionalized, part-hydrolyzed polyvinyl acetate comprising (i) vinyl alcohol units, (ii) vinyl acetate units, and (iii) vinyl acrylate units, where the vinyl acrylate units, which can be substituted, have the general structure ##STR00001## where R is hydrogen or a linear or branched aliphatic or heteroaliphatic radical having 1 to 12 carbon atoms, or a cycloaliphatic, heterocyclic or aromatic radical having 3 to 12 carbon atoms, as component A, b) at least one initiator as component B, c) at least one ethylenically unsaturated compound different from component A, as component C, d) one or more adjuvants as component D, wherein the amount of vinyl acrylate units (iii) in the functionalized, part-hydrolyzed polyvinyl acetate a), based on all the units (i), (ii), and (iii), is 0.1 to <3 mol %, and component D comprises an additive capable of hydrogen bonding, in an amount of 0.001 to 30 wt %, based on the sum of components A to D.

A method, a control means and an exposure apparatus for exposing a relief precursor (P) with a light source (2), the illumination area of the light source (2) covering part of the area of the precursor, wherein exposing the total area of the precursor is performed during an exposure pass by moving relatively to each other the light source and the precursor, the method comprising a step (20) of providing a mask (4) on a photosensitive layer, a first exposing step (ES1) comprising exposing during one or more exposure passes the precursor according to a first intensity profile (IP1) and a first speed profile (SP1); a second exposing step (ES2) comprising exposing during one or more exposure passes the precursor according to a second intensity profile (IP2) different from the first intensity profile (IP1) and a second speed profile (SP2) different from the first speed profile (SP1).

A resist underlayer composition and a method of forming patterns using the resist underlayer composition are provided. The resist underlayer composition may include a polymer including a structural unit represented by Chemical Formula 1, a structural unit represented by Chemical Formula 2, or a combination thereof; a compound represented by Chemical Formula 3; and a solvent.

##STR00001##

An imageable material can be used to form a mask element that in turn is useful for providing relief images such as in flexographic printing plates. The imageable material has, in order: (a) a transparent polymeric carrier sheet; (b) a non-ablatable light-to-heat converting having an average dry thickness of 1-5 m and comprising: (i) an infrared radiation absorbing material at 0.1-5 weight %; (ii) a thermally crosslinked organic polymeric binder material; and (iii) non-thermally ablatable particles having an average particle size of 0.1-20 m in an amount of 0.2-10 weight %; and (c) a non-silver halide thermally-ablatable imaging layer (IL) disposed on the LTHC layer, the IL comprising a second infrared radiation absorbing material and a UV-light absorbing material dispersed within one or more thermally-ablatable polymeric binder materials.

A relief image is prepared by: A) imaging an imageable material to form a mask element; B) exposing a relief-forming precursor through the mask element; C) removing the mask element; and D) developing the imaged relief-forming precursor. The imageable material has, in order: (a) a transparent polymeric carrier sheet; (b) a non-ablatable light-to-heat converting having an average dry thickness of 1-5 m and comprising: (i) an infrared radiation absorbing material at 0.1-5 weight %; (ii) a thermally crosslinked organic polymeric binder material; and (iii) non-thermally ablatable particles having an average particle size of 0.1-20 m in an amount of 0.2-10 weight %; and (c) a non-silver halide thermally-ablatable imaging layer (IL) disposed on the LTHC layer, the IL comprising a second infrared radiation absorbing material and a UV-light absorbing material dispersed within one or more thermally-ablatable polymeric binder materials. The imageable material can be included in a relief image-forming assembly.

A composite panel for use in the manufacture of a letterpress plate has a carrier layer, with at least one photo layer which can be structured via electromagnetic radiation in a wavelength range. The photo layer is arranged on the carrier layer. The task of proposing a composite panel use in the manufacture of a letterpress plate is achieved by the fact that a barrier layer is provided. The barrier layer is arranged on the side of the photo layer opposite to the carrier layer. The barrier layer is essentially transparent in the wavelength range in which the photo layer can be structured. The present disclosure concerns a process for manufacturing a letterpress plate using at least one composite panel and a process for manufacturing a composite plate in accordance with the invention. The invention concerns the use of a composite material in a composite panel for a letterpress plate.

A method produces a liquid crystal display. The display includes a plurality of pixels having sub-pixels that include one opening and one color layer. Some of the sub-pixels having the same color are continuously spaced in one direction. In the method, overlapping photolithographic patterns produce mask openings in which a color layer in two spaced adjacent sub-pixels is to be formed. The mask openings each have a size corresponding to two or more adjacent sub-pixels; and the number of sub-pixels of the same color that are continuously arranged in the one direction is at least twice the total number of sub-pixels of the same color included in each of the pixels.