The present disclosure provides a method for forming a masking layer, including spinning a wafer, dispensing a first liquid at a first location on the wafer, and dispensing a second liquid at a second location on the wafer simultaneously with dispensing the first liquid at the first location, wherein the second liquid is a remover of the first liquid, and the first location is different from the second location.

A solution including an organic solvent (S), and an antioxidant (A), in which an antioxidant (A) includes a tocopherol compound (A1).

Embodiments of the invention include methods and structures for controlling developer critical dimension (DCD) variations across a wafer surface. Aspects of the invention include an apparatus having developer tubing and an internal cam. The internal cam is coupled to a fixed axis. A flexible divider is positioned between the developer tubing and the internal cam. The flexible divider is coupled to the internal cam such that rotation of the internal cam about the fixed axis is operable to change an inner diameter of the developer tubing.

A method of producing a substrate including a resist film includes a coating step of coating a resist film on a substrate, an exposing step of exposing selectively the resist film formed in the coating step, and a developing step of developing the resist film that is selectively exposed in the exposing step and adjusting process time for development based on transition time for shifting to the developing step after the coating step.

The method includes a step of executing a rotation treatment in a rotation treatment apparatus; a step of imaging a substrate on which the rotation treatment has been executed, in an inspection apparatus; a step of acquiring change amount information stored in advance, being information on an amount of change in orientation of the substrate while the substrate is moved from the rotation treatment apparatus to the inspection apparatus; a step of acquiring, as an execution result information, information on an execution result of the rotation treatment along a circumferential direction of the substrate, based on an imaging result in the inspection apparatus; and a step of correcting a position of the substrate at a time of the rotation treatment, based on the change amount information and the execution result information.

The present disclosure is directed to a method and system for monitoring a distance between a shutter and a reference point in a processing module. For example, the method includes moving a shutter relative to a substrate support in a wafer processing module and determining a distance between the shutter and a wall of the wafer processing module with a measurement device. In response to the distance being greater than a value, the method further includes transferring a substrate to the substrate support, and in response to the distance being equal to or less than the value, the method includes resetting the shutter.

Disclosed is a developing device for developing a substrate, comprising: a developing tank, a recovery box and a conveying unit provided right above the developing tank and configured to convey the substrate; wherein the developing tank comprises a first tank, a second tank and a third tank, which are spaced and are sequentially arranged; the recovery box comprises a first box and a second box; the first tank is communicated with the first box; as the substrate is arranged in the second tank, the second tank is communicated with the first box; as the substrate is arranged in the third tank, the third tank is communicated with the second box. The developing device can solve the technical problems of separately recovering the developers doped with different photoresist concentrations during the development of the substrate to reduce the cost of diluting the developer concentration in the recovery box.

Embodiments of the invention include methods and structures for controlling developer critical dimension (DCD) variations across a wafer surface. Aspects of the invention include an apparatus having developer tubing and an internal cam. The internal cam is coupled to a fixed axis. A flexible divider is positioned between the developer tubing and the internal cam. The flexible divider is coupled to the internal cam such that rotation of the internal cam about the fixed axis is operable to change an inner diameter of the developer tubing.

Disclosed is a developing device for developing a substrate, comprising: a developing tank, a recovery box and a conveying unit provided right above the developing tank and configured to convey the substrate; wherein the developing tank comprises a first tank, a second tank and a third tank, which are spaced and are sequentially arranged; the recovery box comprises a first box and a second box; the first tank is communicated with the first box; as the substrate is arranged in the second tank, the second tank is communicated with the first box; as the substrate is arranged in the third tank, the third tank is communicated with the second box. The developing device can solve the technical problems of separately recovering the developers doped with different photoresist concentrations during the development of the substrate to reduce the cost of diluting the developer concentration in the recovery box.

Provided are a method for testing a photosensitive composition and a method for producing a photosensitive composition that can easily test whether or not the photosensitive composition exhibits a predetermined LWR. A method for testing a photosensitive composition according to the present invention has a step 1 of using a reference photosensitive composition to form a resist film, bringing the resist film into contact with a treatment liquid, and measuring a dissolution rate of the resist film to obtain reference data; a step 2 of using a photosensitive composition for measurement to form a resist film, bringing the resist film into contact with a treatment liquid, and measuring a dissolution rate of the resist film to obtain measurement data; and a step 3 of performing comparison between the reference data and the measurement data to determine whether or not an allowable range is satisfied, wherein the treatment liquid includes an organic solvent and a metal X, the organic solvent does not include an aromatic hydrocarbon and includes an aliphatic hydrocarbon, and a mass ratio of a content of the aromatic hydrocarbon to a content of the metal X is 5.0?10.sup.2 to 5.0?10.sup.12.