The invention provides a waterless offset lithographic printing plate precursor that is mountable on a magnet type printing cylinder and has high durability and halftone dot reproducibility. The waterless offset lithographic printing plate precursor contains at least a heat-sensitive layer and a silicone rubber layer disposed on a substrate, the substrate being of a ferromagnet material.

Provided are a treatment device and a treatment method capable of easily reusing a used rinsing liquid, and reducing the amount of waste liquid. A treatment device has: a developing portion which is provided with a developing unit which performs development by removing a non-exposed portion of a flexographic printing plate precursor after imagewise exposure using a developer containing a washing solution; a rinsing portion which is provided with a rinsing liquid supply portion which supplies a rinsing liquid containing substantially only water as a component to at least a surface of the flexographic printing plate precursor after development, from which the non-exposed portion of the flexographic printing plate precursor has been removed; a developer storage portion which has a developer storage tank which stores the developer which is used for the development in the developing portion; a first liquid feeding path through which the developer after development is fed to the developer storage tank of the developer storage portion; and a second liquid feeding path different from the first liquid feeding path, through which the rinsing liquid supplied by the rinsing portion is fed to the developer storage tank of the developer storage portion, and the developing portion repeatedly uses the developer stored in the developer storage tank of the developer storage portion to perform the development.

A layer is formed over a wafer. The layer contains a material that is sensitive to an extreme ultraviolet (EUV) radiation. A first baking process is performed to the layer. The first baking process is performed with a first humidity level that is greater than about 44%. After the first baking process, the layer is exposed to EUV radiation. A second baking process is performed to the layer. The second baking process is performed with a second humidity level that is greater than about 44%. The layer is rinsed with a liquid that contains water before the second baking process or after the second baking process. After the exposing, the layer is developed with a developer solution that contains water.

The developing device comprises: a development chamber that is provided with an air extraction pipeline for extracting air inside the development chamber to outside the development chamber; a carrier that is disposed in the development chamber for supporting a wafer; a plurality of temperature sensors that are disposed on the carrier for detecting temperatures of a plurality of target regions; a plurality of mutually independent air supply pipelines for supplying air to the development chamber, each of the target regions corresponding to at least one air supply pipeline; and a control unit for acquiring measured temperatures of the temperature sensors and calculating current temperatures of the corresponding target regions, and basing on the current temperatures of the target regions to adjust air parameters of the corresponding air supply pipelines, so that the temperatures of the corresponding target regions rest within a preset temperature range.

Provided is a washing device that has a small device configuration, is excellent in maintainability, and further has a high productivity. The washing device performs development using a washing solution while transporting an imagewise exposed flexographic printing plate precursor. The washing device has a transporting unit that transports the flexographic printing plate precursor along a transport path having a curved transport passage and a linear transport passage, using a leader and a developing portion that performs development by removing an unexposed portion of the flexographic printing plate precursor. The transporting unit transports the flexographic printing plate precursor using a winding transmission method or transports the flexographic printing plate precursor using a method of winding a traction member provided at the leader.

Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having one or more radiation-sensitive imageable layers, followed by contacting with a processing solution that contains up to 10 weight % of one or more compounds represented by Structure (I) shown as follows:

R.sup.1—C(═O)—N(R.sup.2)—R.sup.3   (I)

wherein R.sup.1, R.sup.2, and R.sup.3 independently represent hydrogen or a substituted or unsubstituted hydrocarbon group, or two or three of R.sup.1, R.sup.2, and R.sup.3 are combined to form one or more cyclic rings, and the total number of carbon atoms in the Structure (I) molecule is at least 7 and up to and including 33. Both negative-working and positive-working lithographic precursors can be imaged and processed using this processing solution using one or more successive applications of the same or different processing solution. The processing solution can be derived from a corresponding processing solution concentrate that can also be used for replenishment.

Provided is a conveying type washing device capable of achieving both maintainability and productivity. This conveying type washing device develops a flexographic printing plate precursor after imagewise exposure using a washing solution. The conveying type washing device has a conveying unit that conveys the flexographic printing plate precursor through a conveying path including a curved conveying path, and a development unit that develops the flexographic printing plate precursor in a state in which the flexographic printing plate precursor is immersed in the washing solution by the conveying unit and conveyed.

It is proposed to provide a photopolymer developing solution for providing a flexographic relief printing plate. This photopolymer developing solution comprises butylal alone or butylal and one or more organic cosolvents that are liquid at room temperature; or it comprises DPnB and one or more cosolvents and no butylal.

A photoresist layer is coated over a wafer. The photoresist layer includes a metal-containing material. An extreme ultraviolet (EUV) lithography process is performed to the photoresist layer to form a patterned photoresist. The wafer is cleaned with a cleaning fluid to remove the metal-containing material. The cleaning fluid includes a solvent having Hansen solubility parameters of delta D in a range between 13 and 25, delta P in a range between 3 and 25, and delta H in a range between 4 and 30. The solvent contains an acid with an acid dissociation constant less than 4 or a base with an acid dissociation constant greater than 9.

A processing system includes a processing unit that processes the flexographic printing plate with a processing liquid. The processing unit includes a hollow tube having a length extending across a cross-track dimension of the flexographic printing plate. A processing liquid supply system supplies pressurized processing liquid into an interior of the hollow tube. A plurality of pressure-compensating emitters is distributed along the length of the tube which deliver processing liquid onto a surface of the flexographic printing plate, wherein processing liquid flows from the interior of the hollow tube through the pressure-compensating emitters at a controlled flow rate.