G03F7/3071

Lithography Patterning with Flexible Solution Adjustment
20180335699 · 2018-11-22 ·

A system for lithography patterning includes a first supply pipe for supplying a first solution; a second supply pipe for supplying a second solution; a third supply pipe coupled to the first and second supply pipes for receiving the first and second solutions respectively and mixing the first and second solutions into a mixture; a substrate stage for holding a substrate; a supply nozzle coupled to the third supply pipe for dispensing the mixture to the substrate; a first control unit coupled to the first supply pipe and configured to control a flow rate of the first solution going to the third supply pipe; and a second control unit coupled to the second supply pipe and configured to control a flow rate of the second solution going to the third supply pipe.

WASHOUT PROCESSOR AND METHOD FOR MANUFACTURING FLEXOGRAPHIC PRINTING PLATE PRECURSOR

Provided are a washout processor and a method for manufacturing a flexographic printing plate precursor, which have good productivity and work efficiency. A washout processor that develops a flexographic printing plate precursor after imagewise exposure using a developer includes a station for attaching the flexographic printing plate precursor, and a measurement unit that measures at least one of a size or a thickness of the flexographic printing plate precursor and a position of the flexographic printing plate precursor on the station.