A mirror array, at least some of the mirrors of the array comprising a reflective surface and an arm which extends from a surface opposite to the reflective surface, wherein the mirror array further comprises a support structure provided with a plurality of sensing apparatuses, the sensing apparatuses being configured to measure gaps between the sensing apparatuses and the arms which extend from the mirrors.

An optical apparatus includes a rotatable reflecting member including a first reflecting surface and a second reflecting surface, an optical system including a plurality of reflecting surfaces and configured to sequentially reflect light having been reflected at the first reflecting surface at the plurality of reflecting surfaces to make the light incident on the second reflecting surface, a driving part configured to change an angle of the reflecting member, a control unit configured to control the driving part to change a path of light emitted from the reflecting member after being reflected at the second reflecting surface, and a light incident portion configured to recognize a position of the light having been reflected at the first reflecting surface.

An exposure apparatus is provided. An illumination optical system in the apparatus includes a diffraction optical element, a condensing optical system a detector that detects a light beam that exited from the condensing optical system, and a first diaphragm that can be inserted/removed in/from a position near a predetermined plane in an optical path where the condensing optical system condenses a light beam. The first diaphragm has an opening diameter such that an output of the detector decreases when an incident angle of light from a light source on the diffraction optical element deviates from a target angle. Based on an output of the detector when the first diaphragm is inserted in the position and an output of the detector when the first diaphragm is retracted from the position, a controller performs a process of adjusting the incident angle.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided in which an illumination field of the mask is illuminated by illumination radiation with an operating wavelength that was provided by an illumination system.

A mirror array, at least some of the mirrors of the array comprising a reflective surface and an arm which extends from a surface opposite to the reflective surface, wherein the mirror array further comprises a support structure provided with a plurality of sensing apparatuses, the sensing apparatuses being configured to measure gaps between the sensing apparatuses and the arms which extend from the mirrors.

The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical system; and a phase modulating member which is arranged in the optical path on the illumination target surface side with respect to the polarization converting member and which transmits light from the pupil intensity distribution so as to convert linearly polarized light thereof polarized in a first direction, into required elliptically polarized light and maintain a polarization state of linearly polarized light polarized in a second direction (X-direction or Y-direction) obliquely intersecting with the first direction, in order to reduce influence of retardation caused by a subsequent optical system between the polarization converting member and the illumination target surface.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided in which an illumination field of the mask is illuminated by illumination radiation with an operating wavelength that was provided by an illumination system.

A projection optical system for an immersion exposure apparatus which exposes a substrate with an illumination light through the projection optical system and a liquid, the projection optical system includes: a plurality of reflective and refractive optical elements through which the illumination light passes, the plurality of reflective and refractive optical elements having a final lens, through which the illumination light passes, the final lens having a light emitting surface through a part of which the illumination light passes, the part of the light emitting surface being in contact with the liquid, wherein the image is projected in a projection region, a center of the projection region is away from an optical axis of the projection optical system with respect to a first direction perpendicular to the optical axis, and a center of the light emitting surface is away from the optical axis with respect to the first direction.

In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.

A device includes a light source and a light guide. The light source is configured to emit photoresist-curative electromagnetic radiation. The light guide is arranged to receive the photoresist-curative electromagnetic radiation from the light source and to guide the received radiation by total internal reflection, the light guide including a pattern of emission points on at least one surface of the light guide, the emission points emitting the photoresist-curative electromagnetic radiation out of the light guide by frustration of total internal reflection caused by the emission points.