An exhaust stream monitoring system for a photolithography track of an IC fabrication process comprises a reaction chamber including a housing, an inflow port and an outflow port, the housing containing a thermal plate for heating a semiconductor process wafer for a predetermined amount of time. An influent pipe coupled to the inflow port supplies a photoresist adhesion promoter in a gaseous form to the reaction chamber. An effluent pipe coupled to the outflow port is operative to remove byproducts from the reaction chamber as an exhaust stream. At least one gas sensor manifold assembly is coupled to the effluent pipe for monitoring the exhaust stream from the reaction chamber to detect presence of one or more byproducts of a reaction between the photoresist adhesion promoter and the semiconductor process wafer.

A sealing device seals a first component part of a lithography apparatus vis-à-vis a multiplicity of second component parts of the lithography apparatus. The sealing device includes a multiplicity of sealing rings and a multiplicity of connection locations. The sealing rings are connected to one another with the aid of the connection locations.

There is provided that an imprint apparatus that forms a pattern on a substrate by curing an imprint material in a state in which a mold and the imprint material on the substrate are in contact with each other, the apparatus including a control unit configured to control a movement of a stage configured to hold the substrate and the supplying of a gas by a gas supplying unit, wherein the control unit removes charges from the mold by starting the supplying of the gas by the gas supplying unit before starting to move the stage below a dispenser after the mold and the cured imprint material are separated, and making a peripheral member face the mold via the gas during the movement of the stage.

An exposure apparatus comprising a holding part for holding an electric discharge lamp, the electric discharge lamp includes an electric discharge tube which covers an electric discharge space in which a pair of electrodes are disposed to face each other, a socket provided on one end of the electric discharge tube, a metal member which guides one of the pair of electrodes into the socket, wherein an opening for ventilation is provided in a bottom of the socket, the holding part includes a ventilation pipe to form a path for ventilation through the opening in the bottom of the socket, and a cooling part for cooling the metal member by supplying a cooling medium to the metal member through the ventilation pipe.

An actuator device for aligning an element includes at least one first actuator unit, which is secured to a support structure, for a first setting range and a second actuator unit, which is able to be secured to the element, for a second setting range. The second actuator unit is connected to an output element of the first actuator unit so that the positioning of the second actuator unit is adjustable by an adjustment of the output element. The first actuator unit has an adjusting element and a fixing element, which is able to be secured to the support structure. The fixing element secures the output element in a force-locking manner in an operating state of the element. The fixing element is furthermore configured to release the force-locking connection in a setting state of the element to enable an adjustment of the output element via the adjusting element.

An optical arrangement for use in an optical imaging device includes an optical element unit and a detection device and/or an actuating device. The optical element unit includes at least one optical element. The detection device determines in a plurality of M degrees of freedom in each case a detection value which is representative of a relative position or orientation of an element reference of the optical element in relation to a primary reference of the detection device in the respective degree of freedom. The detection device includes a plurality of N detection units, each of which outputs a detection signal which is representative of a distance and/or a displacement of the detection unit in relation to a secondary reference assigned to the optical element and the respective detection unit.

Method and device for producing an adhesive bond between a first component and a second component (optical element) for microlithography. The method involves: introducing the first and second components into a positioning device for changing the relative position between the first and second components, calibrating a first relative position, in which a distance between the first and second components has a first value defining a predefined adhesive gap, calibrating a second relative position, in which a distance between the first and second components has a second value greater than the first value, applying adhesive to the first component while the first and second components are at a distance greater than the first value, and setting the first relative position while forming the adhesive bond between the first and second components. Calibrating the first and second relative positions are carried out before the adhesive is applied to the first component.

A clamping apparatus of a soft film and a mounting fixture thereof are described. The clamping apparatus includes a first bar, a second bar, a third bar, and at least one elastic element. The first bar and second bar are respectively configured to fix a first side portion and a second side portion of a soft film. The third bar is adjacent and connected to the second bar. The third bar and the first bar are respectively located on two opposite sides of the second bar. The third bar is configured to pull the soft film from the second side portion of the soft film through the second bar. The elastic element has a first end and a second end opposite to each other and respectively disposed on the second bar and the third bar. The elastic element is configured to provide the soft film with pull buffer.

An exposure apparatus comprising a holding part for holding an electric discharge lamp, the electric discharge lamp includes an electric discharge tube which covers an electric discharge space in which a pair of electrodes are disposed to face each other, a socket provided on one end of the electric discharge tube, a metal member which guides one of the pair of electrodes into the socket, wherein an opening for ventilation is provided in a bottom of the socket, the holding part includes a ventilation pipe to form a path for ventilation through the opening in the bottom of the socket, and a cooling part for cooling the metal member by supplying a cooling medium to the metal member through the ventilation pipe.

A sealing device seals a first component part of a lithography apparatus vis-à-vis a multiplicity of second component parts of the lithography apparatus. The sealing device includes a multiplicity of sealing rings and a multiplicity of connection locations. The sealing rings are connected to one another with the aid of the connection locations.