A positioning apparatus includes a first object and a second object; a positioning system configured to position the first and the second objects with respect to each other; and a flexible transportation line that is connected to the first and the second objects, the flexible transportation line having a stiffness that varies along the flexible transportation line such that the flexible transportation line can be represented by a dynamic transfer function, the dynamic transfer function being adapted to a closed-loop transfer function of the positioning system.

A pump includes a collecting duct to guide a two-phase fluid provided with magnetic field responsive particles, a collecting duct magnet system arranged along the collecting duct and configured to generate a magnetic field in at least a part of the collecting duct, a pumping duct to guide the two-phase fluid, a pumping duct inlet being connected to a collecting duct outlet, and a pumping duct magnet system arranged along the pumping duct and configured to generate a magnetic field in at least a part of the pumping duct. A pump driver is configured to drive the collecting duct magnet system to generate a spatial repetition of collecting duct magnetic fields moving along a length of the collecting duct, and is configured to drive the pumping duct magnet system to generate a spatial repetition of pumping duct magnetic fields moving along a length of the pumping duct.

A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

An arrangement of a microlithographic optical imaging device includes first and supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device configured to measure the position and/or orientation of the optical element in relation to a reference in at least one degree of freedom and up to all six degrees of freedom in space. A creep compensation device compensates a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which is configured to measure the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom. A creep compensation device compensates a creep-induced change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

An active vibration isolation system with a magnetic actuator where the magnetic actuator includes a coil carrier with at least one coil which engages in a magnetic actuator without touching it so that it takes the form of a linear motor. The magnetic actuator has a magnetic shield with an opening through which the coil carrier extends into the magnet carrier.

An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.

A projection exposure apparatus for semiconductor lithography includes at least one component which is provided with a damping arrangement for dissipating mechanical vibration energy. The damping arrangement includes a ferromagnetic element, through which a magnetic field passes at least partly. The magnetic flux density is inhomogeneous at least regionally. The ferromagnetic element is mounted in such a way that it is movable with a movement component in the direction of the inhomogeneity of the magnetic field.

A flow restriction, a flow restriction assembly and methods for manufacturing the flow restriction and the flow restriction assembly. The flow restriction is for use in a pipe so as to restrict the flow of a fluid and includes a body extending along an axis and that has i) a central portion having an essentially constant cross section, ii) an upstream portion, wherein the cross-sectional area of the upstream portion monotonically increases in a downstream direction along the axis; and iii) a downstream portion, wherein the cross-sectional area of the downstream portion monotonically decreases in the downstream direction. The flow restriction also has a plurality of central portion projections for engaging the inner surface of the pipe, each of which projects from the surface of the central portion in a direction perpendicular to the surface of the central portion by a distance of less than 500 μm.