Patent classifications
G
PHYSICS
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G03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
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7/00
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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G03F7/70
Microphotolithographic exposure; Apparatus therefor
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G03F7/708
Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
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G03F7/70908
Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
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G03F7/70941
Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
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G03F7/70941

Information processing apparatus, inspection method, storage medium, exposure apparatus, determination method, and article manufacturing method
12547068 · 2026-02-10 · ·

An information processing apparatus configured to inspect a developed state of a substrate includes an inspection unit configured to input a captured image of a developed second substrate to a learning model to acquire inspection data that include information indicating a second developed state of the second substrate. The learning model is obtained by learning using learning data that include a captured image of a developed first substrate and information indicating a first developed state of the first substrate.