The abnormality detection method of the flow rate control device 10 is performed in the gas supply system 100 including the flow rate control device 10 having the restriction part 12, the control valve 14, the flow rate control pressure sensor 16 for measuring the upstream pressure P1, and the control circuit 19, the inflow pressure sensor 20 for measuring the supply pressure P0, and the upstream on-off valve 2 provided upstream of the inflow pressure sensor, and includes a step of closing the upstream on-off valve in a state in which the gas flows at the controlled flow rate at the downstream of the restriction part by controlling the opening degree of the control valve based on the output of the flow rate control pressure sensor, a step of measuring the drop in the supply pressure P0 on the upstream side of the control valve after closing the upstream on-off valve while keeping the control valve open, and a step of detecting the presence or absence of abnormality in the flow rate control device based on the measured supply pressure drop.

A flow sensor includes a fluid chamber configured to receive a fluid. A diaphragm assembly is configured to be displaced whenever the fluid within the fluid chamber is displaced. A transducer assembly is configured to monitor the displacement of the diaphragm assembly and generate a signal based, at least in part, upon the quantity of fluid displaced within the fluid chamber.

In a method of monitoring fluid usage in a fluid system, a proportional control valve is provided, including a valve element operable to control fluid flow from a fluid source to the fluid system. A first pressure upstream of the valve element and a second pressure downstream of the valve element are measured to identify a pressure differential across the valve element. In response to the identified pressure differential, the valve element is adjusted to one of a plurality of flow positions to adjust the pressure differential across the valve element to substantially match a predetermined pressure differential. A flow rate through the proportional control valve is determined based on the first pressure, the second pressure, and the adjusted flow position of the valve element. Based on the determined flow rate over time, an amount of fluid usage in the fluid system is determined.

Fluid flow control valve comprising a tubular body extending in a longitudinal direction with a fluid inlet and a fluid outlet situated respectively at the two longitudinal ends of the body, the valve comprising a nozzle and a piston connected to the body, the piston being housed in the body, the nozzle being made up of a part provided with a fluid passage having a calibrated dimension, the passage emerging at one end of the nozzle and forming a seat, said seat being situated against a terminal end of the piston forming a shutter preventing the flow of fluid in the closed position of the valve, the piston comprising a body defining a passage for the fluid in the body for the flow of the fluid between the inlet and the outlet, the body of the valve consisting of a material having a different expansion coefficient from the piston or the nozzle, the valve comprising a heating member which, depending on the heating power delivered, makes it possible to separate the end of the nozzle and the piston by differential expansion, to allow the flow of fluid between the inlet and the outlet in an open position of the valve, characterized in that the terminal end of the piston comprises a ball that is crimped into the body of the piston.

An inflation control system for an inflatable may comprise a compressed fluid source, a valve module, a temperature sensor, and a controller. The valve module is connected to the compressed fluid source and configured to control a flow of gas to the inflatable. The temperature sensor measures an ambient temperature and outputs the ambient temperature measurement. The controller is operably coupled to the valve module and configured to receive the ambient temperature measurement and determine an open-valve time based on the ambient temperature measurement, the open-valve time being a duration of time the valve module is in an open position.

A valve device is capable of precisely adjusting a flow rate variation with time, aging, or the like without using an external sensor or using as few external sensors as possible. The apparatus includes an adjusting actuator for adjusting the position of the operating member positioned at the open position, a communication unit for receiving adjustment information relating to the adjustment of the opening degree of the flow path by the valve element from the outside of the apparatus, and a control unit for adjusting the position of the operating member by driving the adjusting actuator based on the adjustment information.

A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.

The method for inspecting the flow rate controller for controlling a flow rate of a fluid includes creating and recording a three-dimensional database in which a first pressure, a set flow rate or a second pressure, and a control value of a piezoelectric element are associated with each other, based on reference data, measuring, as target data, control values of the piezoelectric element corresponding to the first pressure detected by a first pressure detector and the set flow rate specified in a recipe of a substrate processing process or the second pressure detected by a second pressure detector, at the time of the execution of the substrate processing process, and determining whether or not there is a problem in a diaphragm valve, by comparing the target data with the reference data included in the three-dimensional database.

Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.

A plumbing system may comprise: a fluid conduit configured to receive waste water; a first ultrasonic flow sensor coupled to the fluid conduit; a valve in fluid communication with a drain conduit, the valve configured to impede a fluid path of the plumbing system in response to being in a closed state; and a controller electronically coupled to the first ultrasonic flow sensor and the valve, the controller configured to: determine fluid is flowing through the fluid conduit in response to receiving a sensor data from the first ultrasonic flow sensor, and activate the valve based on the sensor.