A processing chamber gas detection system is provided, including a chamber, an exhaust pipe, a connection pipe, and a gas detector. The chamber is configured to perform a chemical vapor deposition (CVD) process. The exhaust pipe is connected to the chamber and the pumping unit, and the connecting pipe communicates with the exhaust pipe. The gas detector is disposed on the connecting pipe and configured to detect the oxygen content in the air from the chamber. When the air in the chamber is pumped out via the pumping unit and the air flows through the exhaust pipe and the connecting pipe, the gas detector detects whether oxygen is contained in the air or not.

Provided is a supply-liquid producing apparatus capable of producing a supply liquid by an amount needed at a use point. A supply-liquid producing apparatus includes a mixer that mixes water and ozone gas to produce ozone water; a booster pump that increases the pressure of the water supplied to the mixer; a gas-liquid separation tank that separates the ozone water produced by the mixer into ozone water to be supplied to a use point and exhaust gas to be discharged from an exhaust port; a flowmeter that measures the flow rate of the ozone water supplied from the gas-liquid separation tank to the use point; a flow control unit that adjusts the (flow rate of the water supplied to the mixer by controlling the booster pump in response to the flow rate of the ozone water measured by the flowmeter; and an exhaust pressure control unit that controls the exhaust pressure to keep constant the water level in the gas-liquid separation tank.

The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.

A system for producing a high precision blended gas product (BGP), the system comprising: a supply of a volatile analyte in liquid form; a supply of an inert carrier gas; a supply of at least one diluent gas; an analyte gasifier (AG) subsystem for receiving the volatile analyte in liquid form, nebulizing the volatile analyte and mixing the nebulized volatile analyte with the inert carrier gas so as to form an analyte gas stream (AGS); and a gas mixer (GM) subsystem for receiving the AGS from the AG subsystem and mixing the AGS with the supply of at least one diluent gas so as to produce the BGP, wherein the GM subsystem comprises: a gas analyzer (GA) for receiving the AGS and analyzing the same; a gas proportioner for receiving the AGS from the GA, receiving the at least one diluent gas, and proportioning the AGS and the at least one diluent gas based on the results of the GA so as to provide a proportioned AGS and a proportioned at least one diluent gas; and a gas mixing chamber for receiving the proportioned AGS and the proportioned at least one diluent from the gas proportioner so as to produce the BGP.

An electronically regulatable metering pump for use in an automatic washing installation is regulated based on a desired specification of the washing installation and depending on detected sensor data and is configured to deliver a volume flow of the additive such that, when the additive is admixed with the washing fluid, a desired application concentration is provided for feeding into an operating assembly of the washing installation.

An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system and a recirculation loop to the dilution reservoir for enhanced mixing of the dilute concentrate. An electronics control module is connected to a first flow controller between the process water supply and the metallic ion supply and a second flow controller between the metallic ion supply and the reservoir for dilution control establishing a desired metallic ion concentration.

A method for controlling a system pressure within a closed system includes sending a signal to a pressure control valve corresponding to a pressure set point and actuating the pressure control valve to vary a pilot pressure of a control fluid contained within a pressure control line that is fluidly connected to a pressure regulator. A diaphragm of the pressure regulator is disposed between the pressure control line and a system line and acts on a fluid with the system line to modify the system pressure.

The method of inspecting a flow rate controller for controlling a flow rate of a fluid, the flow rate controller including a first pressure detector for detecting a first pressure that is a pressure of the fluid, and a diaphragm valve provided downstream of the first pressure detector and having a diaphragm and a piezoelectric element for driving the diaphragm, the method including: acquiring reference data including the first pressure and a control value of the piezoelectric element with respect to a set flow rate of the fluid; measuring target data including the first pressure and the control value of the piezoelectric element with respect to the set flow rate of the fluid after execution of the acquiring; and determining whether or not there is a problem in the diaphragm valve, by comparing the reference data with the target data.

Embodiments of the present invention include a method and system for blending multi-component granular compositions such as proppant used in hydraulic fracturing in well drilling. The system includes the control and management of an on-site storage system for each of the components, regulating the delivery of specified quantities of each component to a well site, and coordinating the flow of materials into and out of the blender.

Controllers and methods of bulk explosive loading systems are disclosed. A controller of a bulk explosive loading system includes a communication interface configured to communicate with a human-machine interface (HMI). The HMI is configured to execute a software program configured to enable the HMI to receive user inputs from a user. The controller also includes control outputs to output control signals to electrically controllable components. The controller further includes sensor inputs configured to receive sensor signals from sensors configured to monitor the bulk explosive loading system. The controller also includes a processor configured to process recipe information received from the HMI, generate the control signals based on the recipe information to control the electrically controllable components to blend the mixture, process the sensor signals received during blending of the mixture, and transmit blending information to the HMI device. The blending information includes information regarding the blending of the mixture.