A substrate processing apparatus includes a spray nozzle that allows a plurality of liquid droplets to collide with a substrate held by a spin chuck, a liquid piping that supplies a mixed liquid of water and a chemical liquid to the spray nozzle, a first flow control valve and a second flow control valve each of which changes the concentration of the chemical liquid in the mixed liquid, and a controller that causes the liquid piping to supply the mixed liquid having a concentration of the chemical liquid determined in accordance with a substrate to be processed.

The disclosure relates to a method and a device for providing zeotropic refrigerants in which the refrigerant is formed from a refrigerant blend of at least two components, the components being added to a container in the ratio of their respective mass fractions to the refrigerant, and the refrigerant blend being formed in the container, wherein the temperature and/or the pressure in the container is set by means of a control device such that the refrigerant is present exclusively in the gas phase or exclusively in the liquid phase.

A dispenser system including a source of chemical concentrate, a source of diluent, and a mix chamber in fluid communication with the source of chemical concentrate via a first line and with the source of diluent via a second line to mix chemical concentrate and diluent to form a dilution. The dispenser system also includes one or more metering devices disposed in one or both of the first line and the second line, a discharge fluidly coupled to the mix chamber to deliver the dilution to a downstream receptacle, and a control system in communication with the one or more metering devices. The control system is programmed to adjust a concentration of chemical concentrate in the dilution via control of the one or more metering devices based on an environmental factor affecting a physical environment to be cleaned using the dilution.

A process control system can include a vessel, and at least one heat transfer property sensor that measures a heat transfer property of a substance at the vessel. The process control system can also include a monitoring device that receives an output of the heat transfer property sensor, and a process control device that is adjusted in response to the heat transfer property sensor output. A method of controlling a process can include measuring a thermal conductivity of a substance at a vessel, and adjusting the process in response to the measuring.

High accuracy mixing of fluids in a disposable fluid processing system with at least two pumps is provided by a method where a calibration fluid volume is pumped through each pump via a flow meter at at least one calibration pump speed while registering the flow rate using data output from the flow meter, a pump calibration function is calculated from the calibration pump speed and flow rate data and two or more operation fluids are mixed to a predetermined mixture ratio and predetermined flow rate by controlling the pump speed of the respective pumps in accordance with the pump calibration functions.

A method includes mixing a first deionized water (DI) water from a first pipe and a second DI water from a second pipe in a merging pipe that is in fluid communication with the first pipe and the second pipe. An electrical resistivity of the first DI water is different from an electrical resistivity of the second DI water. A mixture of the first DI water and the second DI water is applied from the merging pipe onto a wafer.

An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

In embodiments, a process gas supply provides a carrier gas and one or more process gases to a distribution manifold. A back pressure sensor senses back pressure in the distribution manifold and provides a signal to the first controller based at least in part on the back pressure. The first controller determines a back pressure set point based at least in part on the signal. One or more mass flow controllers control the flow of the gas mixture comprising the carrier gas and the one or more process gases into one or more zones of the process chamber. An upstream pressure controller fluidly and operatively connected to the distribution manifold controls flow of the carrier gas based on the back pressure set point.

A method for controlling a system pressure within a closed system includes sending a signal to a pressure control valve corresponding to a pressure set point and actuating the pressure control valve to vary a pilot pressure of a control fluid contained within a pressure control line that is fluidly connected to a pressure regulator. A diaphragm of the pressure regulator is disposed between the pressure control line and a system line and acts on a fluid with the system line to modify the system pressure.

Methods for simultaneously determining the concentrations of transition metal compounds in solutions containing two or more transition metal compounds are described. Polymerization reactor systems providing real-time monitoring and control of the concentrations of the transition metal components of a multicomponent catalyst system are disclosed, as well as methods for operating such polymerization reactor systems.