Patent classifications
G06F7/505
Methods of manufacturing semiconductor devices by etching active fins using etching masks
In a method of manufacturing a semiconductor device, first to third active fins are formed on a substrate. Each of the first to third active fins extends in a first direction, and the second active fin, the first active fin, and the third active fin are disposed in this order in a second direction crossing the first direction. The second active fin is removed using a first etching mask covering the first and third active fins. The third active fin is removed using a second etching mask covering the first active fin and a portion of the substrate from which the second active fin is removed. A first gate structure is formed on the first active fin. A first source/drain layer is formed on a portion of the first active fin adjacent the first gate structure.
Surface code computations using auto-CCZ quantum states
Methods and apparatus for performing surface code computations using Auto-CCZ states. In one aspect, a method for implementing a delayed choice CZ operation on a first and second data qubit using a quantum computer includes: preparing a first and second routing qubit in a magic state; interacting the first data qubit with the first routing qubit and the second data qubit with the second routing qubit using a first and second CNOT operation, where the first and second data qubits act as controls for the CNOT operations; if a received first classical bit represents an off state: applying a first and second Hadamard gate to the first and second routing qubit; measuring the first and second routing qubit using Z basis measurements to obtain a second and third classical bit; and performing classically controlled fixup operations on the first and second data qubit using the second and third classical bits.
Surface code computations using auto-CCZ quantum states
Methods and apparatus for performing surface code computations using Auto-CCZ states. In one aspect, a method for implementing a delayed choice CZ operation on a first and second data qubit using a quantum computer includes: preparing a first and second routing qubit in a magic state; interacting the first data qubit with the first routing qubit and the second data qubit with the second routing qubit using a first and second CNOT operation, where the first and second data qubits act as controls for the CNOT operations; if a received first classical bit represents an off state: applying a first and second Hadamard gate to the first and second routing qubit; measuring the first and second routing qubit using Z basis measurements to obtain a second and third classical bit; and performing classically controlled fixup operations on the first and second data qubit using the second and third classical bits.
MULTIPLE ACCUMULATE BUSSES IN A SYSTOLIC ARRAY
Systems and methods are provided to enable parallelized multiply-accumulate operations in a systolic array. Each column of the systolic array can include multiple busses enabling independent transmission of input partial sums along the respective bus. Each processing element of a given columnar bus can receive an input partial sum from a prior element of the given columnar bus, and perform arithmetic operations on the input partial sum. Each processing element can generate an output partial sum based on the arithmetic operations, provide the output partial sum to a next processing element of the given columnar bus, without the output partial sum being processed by a processing element of the column located between the two processing elements that uses a different columnar bus. Use of columnar busses can enable parallelization to increase speed or enable increased latency at individual processing elements.
MULTIPLE ACCUMULATE BUSSES IN A SYSTOLIC ARRAY
Systems and methods are provided to enable parallelized multiply-accumulate operations in a systolic array. Each column of the systolic array can include multiple busses enabling independent transmission of input partial sums along the respective bus. Each processing element of a given columnar bus can receive an input partial sum from a prior element of the given columnar bus, and perform arithmetic operations on the input partial sum. Each processing element can generate an output partial sum based on the arithmetic operations, provide the output partial sum to a next processing element of the given columnar bus, without the output partial sum being processed by a processing element of the column located between the two processing elements that uses a different columnar bus. Use of columnar busses can enable parallelization to increase speed or enable increased latency at individual processing elements.
Oblivious carry runway registers for performing piecewise additions
Methods and apparatus for piecewise addition into an accumulation register using one or more carry runway registers, where the accumulation register includes a first plurality of qubits with each qubit representing a respective bit of a first binary number and where each carry runway register includes multiple qubits representing a respective binary number. In one aspect, a method includes inserting the one or more carry runway registers into the accumulation register at respective predetermined qubit positions, respectively, of the accumulation register; initializing each qubit of each carry runway register in a plus state; applying one or more subtraction operations to the accumulation register, where each subtraction operation subtracts a state of a respective carry runway register from a corresponding portion of the accumulation register; and adding one or more input binary numbers into the accumulation register using piecewise addition.
Oblivious carry runway registers for performing piecewise additions
Methods and apparatus for piecewise addition into an accumulation register using one or more carry runway registers, where the accumulation register includes a first plurality of qubits with each qubit representing a respective bit of a first binary number and where each carry runway register includes multiple qubits representing a respective binary number. In one aspect, a method includes inserting the one or more carry runway registers into the accumulation register at respective predetermined qubit positions, respectively, of the accumulation register; initializing each qubit of each carry runway register in a plus state; applying one or more subtraction operations to the accumulation register, where each subtraction operation subtracts a state of a respective carry runway register from a corresponding portion of the accumulation register; and adding one or more input binary numbers into the accumulation register using piecewise addition.
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES BY ETCHING ACTIVE FINS USING ETCHING MASKS
In a method of manufacturing a semiconductor device, first to third active fins are formed on a substrate. Each of the first to third active fins extends in a first direction, and the second active fin, the first active fin, and the third active fin are disposed in this order in a second direction crossing the first direction. The second active fin is removed using a first etching mask covering the first and third active fins. The third active fin is removed using a second etching mask covering the first active fin and a portion of the substrate from which the second active fin is removed. A first gate structure is formed on the first active fin. A first source/drain layer is formed on a portion of the first active fin adjacent the first gate structure.
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES BY ETCHING ACTIVE FINS USING ETCHING MASKS
In a method of manufacturing a semiconductor device, first to third active fins are formed on a substrate. Each of the first to third active fins extends in a first direction, and the second active fin, the first active fin, and the third active fin are disposed in this order in a second direction crossing the first direction. The second active fin is removed using a first etching mask covering the first and third active fins. The third active fin is removed using a second etching mask covering the first active fin and a portion of the substrate from which the second active fin is removed. A first gate structure is formed on the first active fin. A first source/drain layer is formed on a portion of the first active fin adjacent the first gate structure.
ADDER CELL AND INTEGRATED CIRCUIT INCLUDING THE SAME
A multi-height adder cell configured to receive a first input signal, a second input signal, and a carry input signal and output a sum output signal and a carry output signal, including a plurality of circuit areas, including a plurality of first gate lines to which the first input signal is applied and a plurality of second gate lines to which the second input signal is applied, wherein at least one of a first circuit area and a second circuit area is arranged in a first row, at least one of a third circuit area and a fourth circuit area is arranged in a second row parallel with the first row, and a first gate line of a circuit area arranged in the first row is aligned with a first gate line of a circuit area arranged in the second row