A thin-film deposition system deposits a thin-film on a wafer. A radiation source irradiates the wafer with excitation light. An emissions sensor detects an emission spectrum from the wafer responsive to the excitation light. A machine learning based analysis model analyzes the spectrum and detects contamination of the thin-film based on the spectrum.

An image acquisition section of an information processing apparatus acquires, from an imaging apparatus, polarization images in a plurality of orientations. A normal acquisition section of an image analysis section detects a surface of a subject by acquiring a normal vector on the basis of orientation dependence of polarization luminance. A surface assumption section assumes the presence of an undetected surface continuing from the detected surface. A subject detection section confirms whether or not the assumed surface is present using a normal vector estimated for the assumed surface. An output data generation section generates and outputs output data using information regarding the detected surface.

An image acquisition section of an information processing apparatus acquires, from an imaging apparatus, polarization images in a plurality of orientations. A normal acquisition section of an image analysis section detects a surface of a subject by acquiring a normal vector on the basis of orientation dependence of polarization luminance. A surface assumption section assumes the presence of an undetected surface continuing from the detected surface. A subject detection section confirms whether or not the assumed surface is present using a normal vector estimated for the assumed surface. An output data generation section generates and outputs output data using information regarding the detected surface.

Methods and apparatus for specular surface mapping in which a camera detects reflections of a light source from a specular surface. The detected light sources may be projected onto a celestial sphere as virtual point sources. True positive observations should be tightly clustered on the celestial sphere; thus, false positives may be identified and removed. Specular surface information may then be determined from clusters of the virtual point sources on the celestial sphere. The clusters of virtual point sources on the celestial sphere may be identified and used to identify a surface as a specular surface. The clusters may also be used to extract other information regarding the specular surface, including but not limited to distance to and extent of the specular surface.

A biometric sensor configured to detect a biometric information is provided. The biometric sensor includes a light emitting layer and a touch detection layer; an encapsulating cover on the light emitting layer; a photo-sensing layer configured to detect at least a portion of a light totally reflected by a surface of the biometric sensor in touch with a skin of a user; a touch sensing circuit configured to determine a touch position of a touch; a processor configured to determine a scanning region based on the touch position, and configured to control the light emitting layer to form a scanning light source to scan the scanning region in a scanning pattern; and a biometric information analysis circuit configured to determine a light intensity distribution of a reflected light reflected by the surface of the biometric sensor, and configured to determine the biometric information based on the light intensity distribution.

A biometric sensor configured to detect a biometric information is provided. The biometric sensor includes a light emitting layer and a touch detection layer; an encapsulating cover on the light emitting layer; a photo-sensing layer configured to detect at least a portion of a light totally reflected by a surface of the biometric sensor in touch with a skin of a user; a touch sensing circuit configured to determine a touch position of a touch; a processor configured to determine a scanning region based on the touch position, and configured to control the light emitting layer to form a scanning light source to scan the scanning region in a scanning pattern; and a biometric information analysis circuit configured to determine a light intensity distribution of a reflected light reflected by the surface of the biometric sensor, and configured to determine the biometric information based on the light intensity distribution.

Provided are an optical device which is capable of optically implementing an activation function of an artificial neural network and an optical neural network apparatus which includes the optical device. The optical device may include: a beam splitter splitting incident light into first light and second light; an image sensor disposed to sense the first light; an optical shutter configured to transmit or block the second light; and a controller controlling operations of the optical shutter, based on an intensity of the first light measured by the image sensor.

Provided are an optical device which is capable of optically implementing an activation function of an artificial neural network and an optical neural network apparatus which includes the optical device. The optical device may include: a beam splitter splitting incident light into first light and second light; an image sensor disposed to sense the first light; an optical shutter configured to transmit or block the second light; and a controller controlling operations of the optical shutter, based on an intensity of the first light measured by the image sensor.

An optical dimensioning system includes one or more light emitting assemblies configured to project one or more predetermined patterns on an object; an imaging assembly configured to sense light scattered and/or reflected off the object, and to capture an image of the object while the patterns are projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. The light emitting assembly may include a single piece optical component configured for producing a first pattern and second pattern. The patterns may be distinguishable based on directional filtering, feature detection, feature shift detection, or the like. A method for optical dimensioning includes illuminating an object with at least two detectable patterns; and calculating dimensions of the object by analyzing pattern separate of the elements comprising the projected patterns. One or more pattern generators may produce the patterns.

An optical dimensioning system includes one or more light emitting assemblies configured to project one or more predetermined patterns on an object; an imaging assembly configured to sense light scattered and/or reflected off the object, and to capture an image of the object while the patterns are projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. The light emitting assembly may include a single piece optical component configured for producing a first pattern and second pattern. The patterns may be distinguishable based on directional filtering, feature detection, feature shift detection, or the like. A method for optical dimensioning includes illuminating an object with at least two detectable patterns; and calculating dimensions of the object by analyzing pattern separate of the elements comprising the projected patterns. One or more pattern generators may produce the patterns.